Impact on the Gas Barrier Property of Silicon Oxide Films Prepared by Tetramethylsilane-Based PECVD Incorporating with Ammonia

High Performance Multilayered Organosilicon/Silicon Oxynitride Water Barrier Structure Consecutively Deposited by Plasma-Enhanced Chemical Vapor Deposition at a Low-Temperature

In this study, pairs of the organosilicon/silicon oxynitride (SiOxNy) barrier structures with an ultralow water vapor transmittance rate (WVTR) were consecutively prepared by the plasma-enhanced chemical vapor deposition at a low temperature of 70 °C using the tetramethylsilane (TMS) monomer and the TMS-oxygen-ammonia gas mixture, respectively. The thickness of the SiOxNy film in the barrier structure was firstly designed by optimizing its effective permeability. The WVTR was further decreased by inserting an adequate thickness of the organosilicon layer as the stress residing in the barrier structure was released accordingly. By prolonging the diffusion pathway for water vapor permeation, three-paired organosilicon/SiOxNy multilayered barrier structure with a WVTR of about 10−5 g/m2/day was achievable for meeting the requirement of the thin film encapsulation on the organic light emitting diode.

Pre-grafted Group on PE Surface by DBD Plasma and Its Influence on the Oxygen Permeation with Coated SiOx

In this paper, we report on polyethylene (PE) film modified by atmospheric dielectric barrier discharge (DBD) plasma prior to the deposition of SiOx coating to improve its barrier properties. Three kinds of monomers: allylamine, acrylic acid, and ethanol, are used to modify the PE surface. For comparison, Ar and O₂ plasma pre-treatments are also performed. It is found that with the addition of a monomer in the Ar DBD plasma, the grafted active groups on PE surfaces lead to dense, pinhole-free growth of the SiOx film. The oxygen transmission rate (OTR) decreases from 700 cc/m²·day·atm. for the pristine to ca. 70 cc/m²·day·atm. for the pretreatment-coated PE, which is more than a 10-fold reduction. The relationship between the grafted monomer and the great decrease of OTR is then explored via chemical composition by attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR) and via morphology observation by atomic force microscopy (AFM) and scanning electron microscopy (SEM). The results show that the grafted functional groups of -NH₂, -COOH and -OH increase the surface energy and promote the nucleation of Si–O radicals on polymeric surfaces, and the formation of network and cage structures in SiOx film contributes to the significant improvement of OTR.