Deposition of Iridium Thin Films Using New IrI CVD Precursors

High-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors

Thin films of iridium can be utilized in a wide range of applications and are particularly interesting for catalytic transformations. For the scalable deposition of functional Ir thin films, metalorganic chemical vapor deposition (MOCVD) is the method of choice, for which organometallic precursors that embody a high volatility and thermal stability need to be specifically tailored. Herein, we report the synthesis, analysis, and evaluation of new volatile Ir(I)-1,5-cyclooctadiene complexes bearing all-nitrogen coordinating guanidinate (N,N'-diisopropyl-2-dimethylamido-guanidinate (DPDMG)), amidinate (N,N'-diisopropyl-amidinate (DPAMD)), and formamidinate (N,N'-diisopropyl-formamidinate (DPfAMD)) ligands. The amidinate-based Ir complex [Ir(COD)(DPAMD)] together with O₂ was implemented in MOCVD experiments resulting in highly crystalline, dense, and conductive Ir films on a variety of substrate materials. The Ir deposits achieved outstanding electrochemical performance with overpotentials in the range of 50 mV at -10 mA·cm^-2 for catalytic hydrogen evolution reaction (HER) in acidic solution. The ability to deposit Ir layers via MOCVD exhibiting promising functional properties is a significant step toward large-scale applications.

Nanostructured IrOx Coatings for Efficient Oxygen Evolution Reactions in PV-EC Setup

New heteroleptic iridium compounds exhibiting high volatility and defined thermal decomposition behavior were developed and tested in plasma-enhanced chemical vapor deposition (PECVD). The iridium precursor [(COD)Ir(TFB-TFEA)] (COD = 1,5-cyclooctadiene; TFB-TFEA = N-(4,4,4-Trifluorobut-1-en-3-on)-6,6,6-trifluoroethylamin) unifies both reactivity and sufficient stability through its heteroleptic constitution to offer a step-by-step elimination of ligands to provide high compositional purity in CVD deposits. The substitution of neutral COD ligands against CO groups further increased the volatility of the precursor. PECVD experiments with unambiguously characterized Ir compounds (single crystal X-ray diffraction analysis) demonstrated their suitability for an atom-efficient (high molecule-to-precursor yield) gas phase deposition of amorphous iridium oxide (IrOx) phases. Thin films of IrOx were well suited as electrocatalyst in oxygen evolution reaction so that an efficient coupled system in combination with solar cells is viable to perform water-splitting reaction without external bias.

Bimetallic Pt,Ir-containing coatings formed by MOCVD for medical applications

Biocompatible Pt_xIr_(1-x) layers combining high mechanical strength of the iridium component and outstanding corrosion resistance of the platinum component providing reversible charge transfer reactions in the living tissue are one of the important materials required for implantable medical electrodes. The modern trend to complicate the shape and reduce the electrode dimensions includes the challenge to develop precise methods to obtain such bimetallic coatings with enhanced surface area and advanced electrochemical characteristics. Herein, Pt_xIr_(1-x) coatings were firstly obtained on cathode and anode pole tips of endocardial electrodes for pacemakers using chemical vapor deposition technique. To deposit Pt_xIr_(1-x) coatings with a wide range of metal ratios (x = 0.5-0.9) the combination of acetylacetonate-based volatile precursors with compatible thermal characteristics was used for the first time. The expected metal ratio in the coatings was regulated by a partial pressure of the precursor vapors in the reaction zone and was in the good agreement with its real value measured by various methods, including energy-dispersive and wavelength dispersive spectroscopy, X-ray photoelectron spectroscopy. According to the X-ray powder diffraction analysis, Pt_xIr_(1-x) coatings consisted of fcc-Pt_xIr_(1-x) solid solution phases. The microscopy data confirmed the formation of Pt_xIr_1-x coatings with the enhanced surface areas. The effect of electrochemical activation on the surface composition and morphology of the samples was studied. The electrochemical characteristics of samples were estimated from cyclic voltammetry and electrochemical impedance spectroscopy data. The charge storage capacity (CSC) values of activated samples were in the range of 19-108 mCcm^-2 (phosphate buffer saline solution, 100 mV/s).

Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications

Iridium-based film precursor chemistry, nucleation and growth at CVD/ALD are reviewed with numerical characterization of the growth features in 3D objects.

Ruthenium complexes as precursors for chemical vapor-deposition (CVD)

The progress in precursor chemistry for the chemical vapor deposition of ruthenium containing thin films is reviewed.