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For: Forsgren K, Westlinder J, Lu J, Olsson J, Hårsta A. Iodide-Based Atomic Layer Deposition of ZrO2: Aspects of Phase Stability and Dielectric Properties. ACTA ACUST UNITED AC 2002. [DOI: 10.1002/1521-3862(20020503)8:3<105::aid-cvde105>3.0.co;2-e] [Citation(s) in RCA: 13] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Number Cited by Other Article(s)
1
Devi A. ‘Old Chemistries’ for new applications: Perspectives for development of precursors for MOCVD and ALD applications. Coord Chem Rev 2013. [DOI: 10.1016/j.ccr.2013.07.025] [Citation(s) in RCA: 110] [Impact Index Per Article: 10.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
2
Dezelah CL, Niinistö J, Kukli K, Munnik F, Lu J, Ritala M, Leskelä M, Niinistö L. The Atomic Layer Deposition of HfO2and ZrO2using Advanced Metallocene Precursors and H2O as the Oxygen Source. ACTA ACUST UNITED AC 2008. [DOI: 10.1002/cvde.200806716] [Citation(s) in RCA: 45] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/10/2022]
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