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For: Reiche M, Gösele U, Wiegand M. Modification of Si(100)-Surfaces by SF6 Plasma Etching — Application to Wafer Direct Bonding. Cryst Res Technol 2000. [DOI: 10.1002/1521-4079(200007)35:6/7<807::aid-crat807>3.0.co;2-j] [Citation(s) in RCA: 20] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]

For:	Reiche M, Gösele U, Wiegand M. Modification of Si(100)-Surfaces by SF6 Plasma Etching — Application to Wafer Direct Bonding. Cryst Res Technol 2000. [DOI: 10.1002/1521-4079(200007)35:6/7<807::aid-crat807>3.0.co;2-j] [Citation(s) in RCA: 20] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]

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Xiong X, Jaberansari L, Hahm MG, Busnaina A, Jung YJ. Building highly organized single-walled-carbon-nanotube networks using template-guided fluidic assembly. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2007;3:2006-10. [PMID: 18008295 DOI: 10.1002/smll.200700292] [Citation(s) in RCA: 13] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/23/2023]