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For: Ngo TD, Choi MS, Lee M, Ali F, Hassan Y, Ali N, Liu S, Lee C, Hone J, Yoo WJ. Selective Electron Beam Patterning of Oxygen-Doped WSe₂ for Seamless Lateral Junction Transistors. Adv Sci (Weinh) 2022;9:e2202465. [PMID: 35853245 PMCID: PMC9475546 DOI: 10.1002/advs.202202465] [Citation(s) in RCA: 15] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/28/2022] [Revised: 06/01/2022] [Indexed: 05/22/2023]

For:	Ngo TD, Choi MS, Lee M, Ali F, Hassan Y, Ali N, Liu S, Lee C, Hone J, Yoo WJ. Selective Electron Beam Patterning of Oxygen-Doped WSe₂ for Seamless Lateral Junction Transistors. Adv Sci (Weinh) 2022;9:e2202465. [PMID: 35853245 PMCID: PMC9475546 DOI: 10.1002/advs.202202465] [Citation(s) in RCA: 15] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/28/2022] [Revised: 06/01/2022] [Indexed: 05/22/2023]

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(The first 100,000 artilces are displayed in RCA.)