Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition

The Chemistry of Selenosilanes: A Topic Overview

Selenium-containing molecules represent a valuable class of compounds with a variety of applications in chemical and biological fields. Selenated reagents are used as intermediates to introduce functional groups (e.g., double bonds) onto different substrates or in the synthesis of various selenated derivatives. Among the variety of selenium-containing reagents, silyl selenides are frequently used to transfer a selenated moiety due to the smooth functionalization of the Se-Si bond, which allows for the generation of selenium nucleophilic species under mild conditions. While the use of the analogous sulfur nucleophiles, namely silyl sulfides, has been widely explored, a relatively limited number of reports on selenosilanes have been provided. This contribution will focus on the application of selenosilanes as nucleophiles in a variety of organic transformations, as well as under radical and redox conditions. The use of silyl selenides to prepare metal complexes and as selenium precursors of materials for atomic layer deposition will also be discussed.

Organoselenium Precursors for Atomic Layer Deposition

Organoselenium compounds with perspective application as Se precursors for atomic layer deposition have been reviewed. The originally limited portfolio of available Se precursors such as H2Se and diethyl(di)selenide has recently been extended by bis(trialkylsilyl)selenides, bis(trialkylstannyl)selenides, cyclic selenides, and tetrakis(N,N-dimethyldithiocarbamate)selenium. Their structural aspects, property tuning, fundamental properties, and preparations are discussed. It turned out that symmetric four- and six-membered cyclic silyl selenides possess well-balanced reactivity/stability, facile and cost-effective synthesis starting from inexpensive and readily available chlorosilanes, improved resistance toward air and moisture, easy handling, sufficient volatility, thermal resistance, and complete gas-to-solid phase exchange reaction with MoCl5, affording MoSe2 nanostructures. These properties make them the most promising Se precursor developed for atomic layer deposition so far.

Deposition of MoSe2 flakes using cyclic selenides

The currently limited portfolio of volatile organoselenium compounds used for atomic layer deposition (ALD) has been extended by designing and preparing a series of four-, five- and six-membered cyclic silylselenides. Their fundamental properties were tailored by alternating the ring size, the number of embedded Se atoms and the used peripheral alkyl chains. In contrast to former preparations based on formation of sodium or lithium selenides, the newly developed synthetic method utilizes a direct and easy reaction of elemental selenium with chlorosilanes. Novel 2,2,4,4-tetraisopropyl-1,3,2,4-diselenadisiletane, which features good trade-off between chemical/thermal stability and reactivity, has been successfully used for gas-to-solid phase reaction with MoCl₅ affording MoSe₂. A thorough characterization of the as-deposited 2D MoSe₂ flakes revealed its out-of-plane orientation and high purity. Hence, the developed four-membered cyclic silylselenide turned out to be well-suited Se-precursor for ALD of MoSe₂.

Diselenadisiletanes possess easy preparation, tailored stability, reactivity, volatility and fast exchange ALD reaction to afford MoSe₂ flakes of high quality.

Towards Volatile Organoselenium Compounds with Cost-Effective Synthesis

The current portfolio of organoselenium compounds applicable as volatile precursors for atomic layer deposition can be denoted as very limited. Hence, we report herein facile and cost-effective preparation of two bis(trialkylstannyl)selenides as well as one selenole and three bis(trialkylsilyl)selenides. Their syntheses have been optimized to: (i) use readily available and inexpensive starting materials, (ii) involve operationally simple methodology (heating in a pressure vessel), (iii) use a minimum amount of additives and catalysts, and (iv) either exclude additional purification or involve only simple distillation. The chemical structure of prepared Se derivatives was confirmed by multinuclear NMR and GC/MS. Their fundamental thermal properties were investigated by differential scanning calorimetry (DSC) and TGA methods that revealed thermal stability within the range of 160-300 °C.