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Strain Relaxation Effect on the Peak Wavelength of Blue InGaN/GaN Multi-Quantum Well Micro-LEDs. APPLIED SCIENCES-BASEL 2022. [DOI: 10.3390/app12157431] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
Abstract
In this paper, the edge strain relaxation of InGaN/GaN MQW micro-pillars is studied. Micro-pillar arrays with a diameter of 3–20 μm were prepared on a blue GaN LED wafer by inductively coupled plasma (ICP) etching. The peak wavelength shift caused by edge strain relaxation was tested using micro-LED pillar array room temperature photoluminescence (PL) spectrum measurements. The results show that there is a nearly 3 nm peak wavelength shift between the micro-pillar arrays, caused by a high range of the strain relaxation region in the small size LED pillar. Furthermore, a 19 μm micro-LED pillar’s Raman spectrum was employed to observe the pillar strain relaxation. It was found that the Raman E2H mode at the edge of the micro-LED pillar moved to high frequency, which verified an edge strain relaxation of = 0.1%. Then, the exact strain and peak wavelength distribution of the InGaN quantum wells were simulated by the finite element method, which provides effective verification of our PL and Raman strain relaxation analysis. The results and methods in this paper provide good references for the design and analysis of small-size micro-LED devices.
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Sha W, Hua Q, Wang J, Cong Z, Cui X, Ji K, Dai X, Wang B, Guo W, Hu W. Enhanced Photoluminescence of Flexible InGaN/GaN Multiple Quantum Wells on Fabric by Piezo-Phototronic Effect. ACS APPLIED MATERIALS & INTERFACES 2022; 14:3000-3007. [PMID: 34990111 DOI: 10.1021/acsami.1c12835] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Fabric-based wearable electronics are showing advantages in emerging applications in wearable devices, Internet of everything, and artificial intelligence. Compared to the one with organic materials, devices based on inorganic semiconductors (e.g., GaN) commonly show advantages of superior characteristics and high stability. Upon the transfer of GaN-based heterogeneous films from their rigid substrates onto flexible/fabric substrates, changes in strain would influence the device performance. Here, we demonstrate the transfer of InGaN/GaN multiple quantum well (MQW) films onto flexible/fabric substrates with an effective lift-off technique. The physical properties of the InGaN/GaN MQWs film are characterized by atomic force microscopy and high-resolution X-ray diffraction, indicating that the transferred film does not suffer from huge damage. Excellent flexible properties are observed in the film transferred on fabric, and the photoluminescence (PL) intensity is enhanced by the piezo-phototronic effect, which shows an increase of about 10% by applying an external strain with increasing the film curvature to 6.25 mm-1. Moreover, energy band diagrams of the GaN/InGaN/GaN heterojunction at different strains are illustrated to clarify the internal modulation mechanism by the piezo-phototronic effect. This work would facilitate the guidance of constructing high-performance devices on fabrics and also push forward the rapid development of flexible and wearable electronics.
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Affiliation(s)
- Wei Sha
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, P. R. China
| | - Qilin Hua
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, P. R. China
| | - Jiangwen Wang
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, P. R. China
| | - Zifeng Cong
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, P. R. China
| | - Xiao Cui
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, P. R. China
| | - Keyu Ji
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- Center on Nanoenergy Research, School of Physical Science and Technology, Guangxi University, Nanning 530004, Guangxi, P. R. China
| | - Xinhuan Dai
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, P. R. China
| | - Bingjun Wang
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- Center on Nanoenergy Research, School of Physical Science and Technology, Guangxi University, Nanning 530004, Guangxi, P. R. China
| | - Wenbin Guo
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, P. R. China
| | - Weiguo Hu
- CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-Nano Energy and Sensor, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, P. R. China
- Center on Nanoenergy Research, School of Physical Science and Technology, Guangxi University, Nanning 530004, Guangxi, P. R. China
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Feng Y, Saravade V, Chung TF, Dong Y, Zhou H, Kucukgok B, Ferguson IT, Lu N. Strain-stress study of Al xGa 1-xN/AlN heterostructures on c-plane sapphire and related optical properties. Sci Rep 2019; 9:10172. [PMID: 31308418 PMCID: PMC6629664 DOI: 10.1038/s41598-019-46628-4] [Citation(s) in RCA: 12] [Impact Index Per Article: 2.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/22/2019] [Accepted: 06/25/2019] [Indexed: 12/03/2022] Open
Abstract
This work presents a systematic study of stress and strain of AlxGa1−xN/AlN with composition ranging from GaN to AlN, grown on a c-plane sapphire by metal-organic chemical vapor deposition, using synchrotron radiation high-resolution X-ray diffraction and reciprocal space mapping. The c-plane of the AlxGa1−xN epitaxial layers exhibits compressive strain, while the a-plane exhibits tensile strain. The biaxial stress and strain are found to increase with increasing Al composition, although the lattice mismatch between the AlxGa1−xN and the buffer layer AlN gets smaller. A reduction in the lateral coherence lengths and an increase in the edge and screw dislocations are seen as the AlxGa1−xN composition is varied from GaN to AlN, exhibiting a clear dependence of the crystal properties of AlxGa1−xN on the Al content. The bandgap of the epitaxial layers is slightly lower than predicted value due to a larger tensile strain effect on the a-axis compared to the compressive strain on the c-axis. Raman characteristics of the AlxGa1−xN samples exhibit a shift in the phonon peaks with the Al composition. The effect of strain on the optical phonon energies of the epitaxial layers is also discussed.
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Affiliation(s)
- Yining Feng
- Lyles School of Civil Engineering, Birck Nanotechnology Center, Purdue University, West Lafayette, IN, 47907, USA.,Applied Materials Division, Argonne National Laboratory, 9700 South Cass Ave, Lemont, IL, 60439, USA
| | - Vishal Saravade
- Electrical and Computer Engineering, Missouri University of Science and Technology, Rolla, MO, 65409, USA
| | - Ting-Fung Chung
- Lyles School of Civil Engineering, Birck Nanotechnology Center, Purdue University, West Lafayette, IN, 47907, USA
| | - Yongqi Dong
- National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, Anhui, 230026, China.,Advanced Photon Source, Argonne National Laboratory, 9700 South Cass Ave, Lemont, IL, 60439, USA
| | - Hua Zhou
- Advanced Photon Source, Argonne National Laboratory, 9700 South Cass Ave, Lemont, IL, 60439, USA
| | - Bahadir Kucukgok
- Lyles School of Civil Engineering, Birck Nanotechnology Center, Purdue University, West Lafayette, IN, 47907, USA.,Applied Materials Division, Argonne National Laboratory, 9700 South Cass Ave, Lemont, IL, 60439, USA
| | - Ian T Ferguson
- Electrical and Computer Engineering, Missouri University of Science and Technology, Rolla, MO, 65409, USA. .,Southern Polytechnic College of Engineering and Engineering Technology, Kennesaw State University, Marietta, GA, 30060, USA.
| | - Na Lu
- Lyles School of Civil Engineering, Birck Nanotechnology Center, Purdue University, West Lafayette, IN, 47907, USA. .,School of Materials Engineering, Purdue University, West Lafayette, IN, 47907, USA.
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