Coinage-Metal-Based Cyclic Trinuclear Complexes with Metal-Metal Interactions: Theories to Experiments and Structures to Functions

Among the d¹⁰ coinage metal complexes, cyclic trinuclear complexes (CTCs) or trinuclear metallocycles with intratrimer metal-metal interactions are fascinating and important metal-organic or organometallic π-acids/bases. Each CTC of characteristic planar or near-planar trimetal nine-membered rings consists of Au(I)/Ag(I)/Cu(I) cations that linearly coordinate with N and/or C atoms in ditopic anionic bridging ligands. Since the first discovery of Au(I) CTC in the 1970s, research of CTCs has involved several fundamental areas, including noncovalent and metallophilic interaction, excimer/exciplex, acid-base chemistry, metalloaromaticity, supramolecular assemblies, and host/guest chemistry. These allow CTCs to be embraced in a wide range of innovative potential applications that include chemical sensing, semiconducting, gas and liquid adsorption/separation, catalysis, full-color display, and solid-state lighting. This review aims to provide a historic and comprehensive summary on CTCs and their extension to higher nuclearity complexes and coordination polymers from the perspectives of synthesis, structure, theoretical insight, and potential applications.

Mixed ligand complexes of silver(i) supported by highly fluorinated pyrazolates, and chelating and bridging N-heterocycles

A range of silver complexes featuring all nitrogen coordination environments involving pyrazolates and chelating and non-chelating bidentate N-heterocycles are reported.

Coinage metal metallacycles involving a fluorinated 3,5-diarylpyrazolate

Photoluminescent, trinuclear, coinage metal pyrazolates have been isolated using a fluorinated diaryl-pyrazolate.

Phenomenological Model of the Growth of Ultrasmooth Silver Thin Films Deposited with a Germanium Nucleation Layer

The structural properties of optically thin (15 nm) silver (Ag) films deposited on SiO2/Si(100) substrates with a germanium (Ge) nucleation layer were studied. The morphological and crystallographical characteristics of Ag thin films with different Ge nucleation layer thicknesses were assessed by cross-sectional transmission electron microscopy (XTEM), reflection high-energy electron diffraction (RHEED), X-ray diffractometry (XRD), grazing incidence X-ray diffractometry (GIXRD), X-ray reflection (XRR), and Fourier transform infrared spectroscopy (FTIR). The surface roughness of Ag thin films was found to decrease significantly by inserting a Ge nucleation layer with a thickness in the range of 1 to 2 nm (i.e., smoothing mode). However, as the Ge nucleation layer thickness increased beyond 2 nm, the surface roughness increased concomitantly (i.e., roughing mode). For the smoothing mode, the role of the Ge nucleation layer in the Ag film deposition is discussed by invoking the surface energy of Ge, the bond dissociation energy of Ag-Ge, and the deposition mechanisms of Ag thin films on a given characteristic Ge nucleation layer. Additionally, Ge island formation, the precipitation of Ge from Ag-Ge alloys, and the penetration of Ge into SiO2 are suggested for the roughing mode. This demonstration of ultrasmooth Ag thin films would offer an advantageous material platform with scalability for applications such as optics, plasmonics, and photonics.

Sub-30 nm thick plasmonic films and structures with ultralow loss

We report an alternative method of producing sub-30 nm thick silver films and structures with ultralow loss using gas cluster ion beam irradiation (GCIB). We have direct evidence showing that scattering from grain boundaries and voids rather than surface roughness are the main mechanisms for the increase in loss with reducing thickness. Using GCIB irradiation, we demonstrate the ability to reduce these scattering effects simultaneously through nanoscale surface smoothing, increase in grain width and lower percolation threshold. Significant improvement in electrical and optical properties by up to 4 times is obtained, before deviation from bulk silver properties starts to occur at 12 nm. We show that this is an enabling technology that can be applied post fabrication to metallic films or lithographically patterned nanostructures for enhanced plasmonic performance, especially in the ultrathin regime.

Trinuclear copper(I) and silver(I) adducts of 4-chloro-3,5-bis(trifluoromethyl)pyrazolate and 4-bromo-3,5-bis(trifluoromethyl)pyrazolate

Syntheses, structural, and photoluminescence properties of {[4-X-3,5-(CF3)2Pz]M}3 (X = Cl or Br, M = Cu or Ag) containing a heavier halide at the pyrazolyl ring 4-positions are reported. The Cu2O and Ag2O react with [4-Cl-3,5-(CF3)2Pz]H or [4-Br-3,5-(CF3)2Pz]H to form the corresponding metal pyrazolates, which are trinuclear adducts of the type {[4-X-3,5-(CF3)2Pz]M}3 with a nine-membered M3N6 metallacyclic core. They also feature relatively short M···Cl or M···Br intertrimer separations (∼ 3.6 Å) leading to supramolecular aggregates in the solid state. Distinct from the 4-H analogues {[3,5-(CF3)2Pz]M}3, none of the four complexes described herein exhibits short intertrimer metal-metal interactions (as closest such M···M separations are at a distance greater than 5.0 Å). The {[4-X-3,5-(CF3)2Pz]M}3 adducts exhibit bright photoluminescence even at room temperature. The photophysical data suggest that the {[4-X-3,5-(CF3)2Pz]Cu}3 complexes emit from an associative excited state, and the drastic Stokes shift suggests a significant change to the ground state structure of the trinuclear moiety and/or intermolecular interactions upon photoexcitation. The {[4-X-3,5-(CF3)2Pz]Ag}3 complexes emit from a ligand-centered excited state affected by silver and the heavier halogens. Thin films of {[4-X-3,5-(CF3)2Pz]Cu}3 trimers are promising for volatile organic compound (VOC) sensor applications as they exhibit luminescence color change upon exposure to vapors of benzene and its alkylated derivatives.

Ultrastable and atomically smooth ultrathin silver films grown on a copper seed layer

An effective method to deposit atomically smooth ultrathin silver (Ag) films by employing a 1 nm copper (Cu) seed layer is reported. The inclusion of the Cu seed layer leads to the deposition of films with extremely low surface roughness (<0.5 nm), while it also reduces the minimum thickness required to obtain a continuous Ag film (percolation thickness) to 3 nm compared to 6 nm without the seed layer. Moreover, the Cu seed layer alters the growth mechanism of the Ag film by providing energetically favorable nucleation sites for the incoming Ag atoms leading to an improved surface morphology and concomitant lower electrical sheet resistance. Optical measurements together with X-ray diffraction and electrical resistivity measurements confirmed that the Ag film undergoes a layer-by-layer growth mode resulting in a smaller grain size. The Cu seeded Ag growth method provides a feasible way to deposit ultrathin Ag films for nanoscale electronic, plasmonic and photonic applications. In addition, as a result of the improved uniformity, the oxidation of the Ag layer is strongly reduced to negligible values.

Ultrasmooth silver thin film on PEDOT:PSS nucleation layer for extended surface plasmon propagation

Poly(3,4-ethylene dioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) layers are used as the nucleation (seed) layer to reduce surface roughness of the overlying silver (Ag). The technique leads to ultrasmooth Ag thin films with a minimum surface roughness of 0.8 nm. The mechanism contributing to the improvement is explained on the basis of better wetting of Ag on PEDOT:PSS, and properties of the nucleation layer on the aspects of surface energy, surface adhesive force, and surface morphology influencing Ag wetting and growth pattern are being discussed. The surface plasmon resonance (SPR) shows significant improvement, in terms of the Figure of Merits (FOM), as the surface roughness on Ag films is reduced. A lower light scattering and longer plasmon propagation of maximum 15.3 μm are also realized on a smoother Ag surface. The results indicate great potential on the application of combined PEDOT:PSS/Ag structure as an effective and economically feasible design solution for plasmonic and optical metamaterials devices.

Optimizing silver film for surface plasmon-coupled emission induced two-photon excited fluorescence imaging

In this study, the optimal condition of a silver (Ag) film deposited on a cover slip for surface plasmon-coupled emission (SPCE) induced two-photon excited fluorescence (TPEF) based on an objective-based, total internal reflection (TIR) microscope was investigated. According to the theoretical simulations of local electric field enhancement and fluorescence coupled emission efficiency, the thickness of the Ag film should be about 40 nm in order to maximize the TPEF collection efficiency by the objective. The deposited Ag film with a germanium seed layer on a cover slip exhibits additional improvement in surface smoothness by reducing variations in surface roughness to below 1.0 nm, thereby reduces local hot spots which degrade the image uniformity. Moreover, an Ag film with a 20 nm-thick SiO2 spacer not only prevents damage caused through interaction with the aqueous solution under high laser power irradiance, but also reduces the fluorescence quenching effect by the Ag film. By optimizing the Ag film thickness, surface smoothness, and a protective dielectric spacer, efficient TIR TPEF imaging can be achieved through SPCE.

Enhanced surface plasmon resonance on a smooth silver film with a seed growth layer

This paper reports an effective method to enhance the surface plasmon resonance (SPR) on Ag films by using a thin Ni seed layer assisted deposition. Ag films with a thickness of about 50 nm were deposited by electron beam evaporation above an ultrathin Ni seed layer of approximately 2 nm on both silicon and quartz substrates. The root-mean-square (rms) surface roughness and the correlation length have been reduced from >4 nm and 28 nm for a pure Ag film to approximately 1.3 and 19 nm for Ag/Ni films, respectively. Both experimental and simulation results show that the Ag/Ni films exhibit an enhanced SPR over the pure Ag film with a narrower full width at half-maximum. Ag films with a Ge seed layer have also been prepared under the same conditions. The surface roughness can be reduced to less than 0.7 nm, but narrowing of the SPR curve is not observed due to increased absorptive damping in the Ge seed layer. Our results show that Ni acts as a roughness-diminishing growth layer for the Ag film while at the same time maintaining and enhancing the plasmonic properties of the combined structures. This points toward its use for low-loss plasmonic devices and optical metamaterials applications.

Synthesis, structural characterization, and properties of chromium(iii) complexes containing amidinato ligands and η2-pyrazolato, η2-1,2,4-triazolato, or η1-tetrazolato ligands

Treatment of anhydrous chromium(III) chloride with 2 or 3 equivalents of 1,3-di-tert-butylacetamidinatolithium or 1,3-diisopropylacetamidinatolithium in tetrahydrofuran at ambient temperature afforded Cr(tBuNC(CH3)NtBu)2(Cl)(THF) and Cr(iPrNC(CH3)NiPr)3 in 78% and 65% yields, respectively. Treatment of Cr(tBuNC(CH3)NtBu)2(Cl)(THF) with the potassium salts derived from pyrazoles and 1,2,4-triazoles afforded Cr(tBuNC(CH3)NtBu)2(X), where X=3,5-disubstituted pyrazolato or 3,5-disubstituted 1,2,4-triazolato ligands, in 65-70% yields. X-Ray crystal structure analyses of Cr(tBuNC(CH3)NtBu)2(Me2pz) (Me2pz=3,5-dimethylpyrazolato) and Cr(tBuNC(CH3)NtBu)2(Me2trz) (Me2trz=3,5-dimethyl-1,2,4-triazolato) revealed eta2-coordination of the Me2pz and Me2trz ligands. Treatment of Cr(tBuNC(CH3)NtBu)2(Cl)(THF) with trifluoromethyltetrazolatosodium (NaCF3tetz) in the presence of 4-tert-butylpyridine afforded Cr(tBuNC(CH3)NtBu)2(CF3tetz)(4-tBupy) in 30% yield. An X-ray crystal structure determination showed eta1-coordination of the tetrazolato ligand through the 2-nitrogen atom. The complexes Cr(iPrNC(CH3)NiPr)3 and Cr(tBuNC(CH3)NtBu)2(X) are volatile and sublime with <1% residue between 120 and 165 degrees C at 0.05 Torr. In addition, these complexes are thermally stable at >300 degrees C under an inert atmosphere such as nitrogen or argon. Due to the good volatility and high thermal stability, these new compounds are promising precursors for the growth of chromium-containing thin films using atomic layer deposition.