Directed assembly of copolymer materials on patterned substrates: Balance of simple symmetries in complex structures

Diblock and triblock copolymer thin films on a substrate with controlled selectivity

Using self-consistent field theory (SCFT), morphology development in symmetric linear ABC triblock copolymer films on neutral and selective substrates has been studied, and it is compared with the triblock copolymer morphologies in bulk. In particular, the effects of the substrate preferable to B (interior) block on nanopattern formation of the copolymer films are of our central interest. Here, we report various nanopatterns with tunable square morphologies. The domain patterns are much more diverse than those parallel to the substrate with substrate selectivity for end-block or those vertical to the substrate without substrate selectivity. Furthermore, in order to figure out an economical and efficient way to fabricate useful passive pattern transfer layers, which have potential applications in microelectronic processes and ultrahigh density storage media, we propose a two-step strategy and scrutinize the conditions for generating square symmetries using cylinder-forming or lamella-forming AB diblock copolymers deposited on substrates created from ABC triblock copolymer films. It is found that a thinner film with weak incompatibility can produce square patterns.

Geometry-controlled interface localization-delocalization transition in block copolymers

Lamellar copolymers confined into a film of thickness D by two stripe-patterned surfaces, which are rotated against each other by a twist angle α, form lamellar domains that register and align with the respective chemical surface patterns. The two domains of thickness x and D-x are separated by an interface that resembles a twist grain boundary. At small twist angles α or strong selectivity of the surface patterns, this interface fluctuates around the middle of the film, x≈D/2, while the interface is localized at one of the surfaces, x≈0 or x≈D, in the opposite limit. These two morphologies are separated by an interface localization-delocalization transition (ILDT) that can be controlled by the twist angle α. For thin films, we find a second-order ILDT while the ILDT is first-order for large D values. A phenomenological interface Hamiltonian is used to relate the findings to the ILDT of symmetric mixtures, and the predictions are confirmed by molecular simulation.

Directed assembly of non-equilibrium ABA triblock copolymer morphologies on nanopatterned substrates

The majority of past work on directed assembly of block copolymers on chemically nanopatterned surfaces (or chemical patterns) has focused on AB diblock copolymers, and the resulting morphologies have generally corresponded to equilibrium states. Here we report a study on directed assembly of ABA triblock copolymers. Directed assembly of thin films of symmetric poly(methyl methacrylate-b-styrene-b-methyl methacrylate) (PMMA-b-PS-b-PMMA) triblock copolymers is shown to be capable of achieving a high degree of perfection, registration, and accuracy on striped patterns having periods, L(s), commensurate with the bulk period of the copolymer, L(o). When L(s) is incommensurate with L(o), the triblock copolymer domains can reach dimensions up to 55% larger or 13% smaller than L(o). The range over which triblock copolymers tolerate departures from a commensurate L(s) is significantly larger than that accessible with the corresponding diblock copolymer material on analogous directed assembly systems. The assembly kinetics of the triblock copolymer is approximately 3 orders of magnitude slower than observed in the diblock system. Theoretically informed simulations are used to interpret our experimental observations; a thermodynamic analysis reveals that triblocks can form highly ordered, non-equilibrium metastable structures that do not arise in the diblock.

Polymer brushes on periodically nanopatterned surfaces

Structural properties of polymer brushes tethered on a periodically nanopatterned substrate are investigated by computer simulations. The substrate consists of an alternating succession of two different types of equal-width parallel stripes, and the polymers are end-tethered selectively on every second stripe. Three distinct morphologies of the nanopatterned brush have been identified, and their range of stability has been determined in terms of a single universal parameter that combines the grafting density, the polymer length, and the stripe width. We propose scaling relations for the average brush height and for the architectural properties of the outer surface of the nanopatterned brush under good solvent conditions. Our analysis provides guidelines for fabricating well-defined and tunable nanopatterned polymeric films.