Abd Rahman MN, Yusuf Y, Anuar A, Mahat MR, Chanlek N, Talik NA, Abdul Khudus MIM, Zainal N, Abd Majid WH, Shuhaimi A. Agglomeration enhancement of AlN surface diffusion fluxes on a (0 0 0 1)-sapphire substrate grown by pulsed atomic-layer epitaxy techniques
via MOCVD.
CrystEngComm 2020;
22:3309-3321. [DOI:
10.1039/d0ce00113a]
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Abstract
An atomically flat covering with a dense and crack-free surface of aluminium nitride films was successfully deposited on a sapphire-(0 0 0 1) substrate through a pulsed atomic-layer epitaxy technique via horizontal metalorganic chemical vapour deposition.
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