THE RELATIONSHIP BETWEEN GENE-CONTROLLED RADIATION RESISTANCE AND FILAMENT FORMATION IN ESCHERICHIA COLI

High-efficiency transformation of bacterial cells by electroporation

We have developed a method for efficiently generating transient pores in the outer membranes of Escherichia coli K-12 derivatives by using a new type of electroporation apparatus. The pores are large enough and persist long enough to facilitate the equilibration of plasmid molecules between the intracellular and extracellular spaces. The method has been used to transform bacterial cells with an efficiency greater than 10(9) transformants per microgram of plasmid. It has also been used to extract intact plasmid from transformed cells with efficiencies comparable to those of the traditional alkaline lysis or CsCl equilibrium density gradient techniques. The technique is simple and rapid, allowing a transformation or the preparation of microgram quantities of plasmid to be accomplished in minutes.

Isolation and characterization of an Escherichia coli ruv mutant which forms nonseptate filaments after low doses of ultraviolet light irradiation

Two ultraviolet light (UV)-sensitive mutants have been isolated from Escherichia coli K-12. These mutants, designated RuvA(-) and RuvB(-), were controlled by a gene located close to the his gene on the chromosome map. They were sensitive to UV (10- to 20-fold increase) and slightly sensitive to gamma rays (3-fold increase). Host cell reactivation, UV reactivation and genetic recombination were normal in these mutants. Irradiation of the mutants with UV resulted in the production of single-strand breaks in deoxyribonucleic acid, which was repaired upon incubation in a growth medium. After UV irradiation, these mutants resumed deoxyribonucleic acid synthesis at a normal rate, as did the parent wild-type bacteria, and formed nonseptate, multinucleate filaments. From these results we concluded that the mutants have some defect in cell division after low doses of UV irradiation, similar to the lon(-) or fil(+) mutant of E. coli. The ruv locus was divided further into ruvA and ruvB with respect to nalidixic acid sensitivity and the effect of minimal agar or pantoyl lactone on survival of the UV-irradiated cell. The ruvB(-)mutant was more sensitive to nalidixic acid than were ruvA(-) and the parent strain. There was a great increase in the surviving fraction of the UV-irradiated ruvB(-) mutant when it was plated on minimal agar or L agar containing pantoyl lactone. No such increase in survival was observed in the ruvA(-) mutant.

Cell division and prophage induction in Escherichia coli: effects of pantoyl lactone and various furan derivatives

Strain T-44 is a thermosensitive mutant of Escherichia coli in which both cell division and prophage repression are altered at elevated temperatures. The effects of various ribosides, pantoyl lactone, and the furfural derivatives nitrofurazone and 5-methyl furfural suggest that some low-molecular-weight compound is important in the control of cell division and prophage repression in this strain. This low-molecular-weight compound may have a five-membered oxygen-containing ring as part of its structure.

Deoxyribonucleic acid synthesis and cell division in a lon- mutant of Escherichia coli

The lon(-) mutants of Escherichia coli form long filamentous cells after temporary inhibition of deoxyribonucleic acid (DNA) synthesis by ultraviolet irradiation, treatment with nalidixic acid, or thymine starvation. The kinetics of DNA synthesis and cell division after a period of thymine starvation have been compared in lon(+) and lon(-) cells. After this treatment, both kinds of cells recover their normal DNA to mass ratio with the same kinetics. In contrast to previous reports, cell division is found to recommence in both lon(+) and in lon(-) cells after such a temporary period of inhibition of DNA synthesis. However, the delay separating the recommencement of DNA synthesis and of cell division is approximately three times as long in lon(-) as in lon(+) cells. Low concentrations of penicillin inhibit cell division in both lon(+) and lon(-) cells. In this case, cell division recommences with the same kinetics in both strains after the removal of penicillin. This suggests that different steps in the cell division process are blocked by inhibition of DNA synthesis and by penicillin treatment. The lon(-) mutation appears to affect the former of these steps.

Thymineless death in Escherichia coli: inactivation and recovery

The effects of chloramphenicol (CAP) on the progress of thymineless death (TLD), nalidixic acid (NA) inactivation, ultraviolet (UV) irradiation, and mitomycin C (MC) inactivation were studied in Escherichia coli B, B(s-1), B(s-3), B(s-12), and B/r. This was done before, during, and after inactivation. During the progress of inactivation, it was found that at 10 to 20 mug of CAP per ml, up to 50% of the UV-sensitive bacteria survived TLD and about 10% survived NA. In E. coli B/r, at these concentrations of CAP, about 10 to 15% of the cells survived TLD and about 20 to 25% survived NA. Concentrations of CAP greater than 25 mug/ml actually increased the sensitivity of E. coli B, B(s-1), B(s-3), and B(s-12) to inactivation by either TLD or NA; at 150 mug of CAP per ml, the sensitivity of E. coli B/r to inactivation also increased. When E. coli B cells were incubated in CAP prior to inactivation, the longer the preincubation the longer onset of TLD was delayed; NA inactivation was also affected in that the rate of inactivation after CAP incubation was greatly decreased. Preincubation of E. coli B/r with CAP had much less effect on the progress of inactivation. After thymineless death, incubation in CAP plus thymine led to a rapid and almost complete recovery of E. coli B and B(s-12). Lesser recoveries were observed after inactivation due to UV, NA, or MC inactivation. E. coli B(s-1) and B/r did not recover viability after any mode of inactivation, and E. coli B(s-3) and B(s-12) recovered from UV to about 20% of the initial titer. It was suggested that protein synthesis, in particular proteins involved in deoxyribonucleic synthesis, was a determining factor in these inactivating and recovery events.

Interaction of the exr and lon genes in Escherichia coli

Strains of Escherichia coli carrying the gene lon typically produced excess capsular polysaccharide, and were sensitive to ultraviolet light (UV) irradiation, thymine starvation, and nalidixic acid, forming long filaments after these treatments. Sensitivity was reduced by a number of posttreatments. In the presence of a second UV sensitivity gene, exr, some of these properties were suppressed: long filaments were not formed, the effect of lon on UV and nalidixic acid sensitivity was greatly reduced, and irradiation posttreatments gave an enhancement of survival characteristic of exr rather than lon strains. Production of capsular polysaccharide was not affected by the exr gene.

Effect of nalidixic acid and hydroxyurea on division ability of Escherichia coli fil+ and lon- strains

Short periods of incubation in medium containing nalidixic acid or hydroxyurea, followed by a return to normal growth conditions, induced filament formation in Escherichia coli B (fil(+)) and AB1899NM (lon(-)) but not in B/r (fil(-)) and AB1157 (lon(+)). These drugs reversibly stopped deoxyribonucleic acid (DNA) synthesis with little or no effect on ribonucleic acid (RNA) synthesis or mass increase. The initial imbalance caused by incubation in these drugs was the same for B and B/r as was macromolecular synthesis following a return to normal growth conditions. DNA degradation caused by nalidixic acid was measured and found to be the same for B and B/r. Hydroxyurea caused no DNA degradation in these two strains. Survival curves as determined under various conditions by colony formation suggested that the property of filament formation was responsible for the extrasensitivity of fil(+) and lon(-) strains to either nalidixic acid or hydroxyurea. E. coli B was more sensitive to either drug than was B/r or B(s-1). Pantoyl lactone or liquid holding treatment aided division and colony formation of nalidixic acid-treated B but had no effect on B/r. Likewise, the filament-former AB1899NM was more sensitive to nalidixic acid than was the non-filament-former AB1157. The sensitivity of B/r and B(s-1) to nalidixic acid was nearly the same except at longer times in nalidixic acid, when B(s-1) appeared more resistant. Even though nalidixic acid, hydroxyurea, and ultraviolet light may produce quite different molecular alterations in E. coli, they all cause a metabolic imbalance resulting in a lowered ratio of DNA to RNA and protein. We propose that it is this imbalance per se rather than any specific primary chemical or photochemical alterations which leads to filament formation by some genetically susceptible bacterial strains such as lon(-) and fil(+).

Recovery of division ability in ultraviolet-irradiated Escherichia coli induced by photoreactivation, photoprotection, and liquid holding treatment

Small doses of ultraviolet light (UV, 265 mmu) cause Escherichia coli B to grow into long, multinucleate, nonseptate, filamentous cells. This UV-induced filament formation can be prevented by irradiating with photoprotecting light (335 mmu) prior to UV irradiation, and by irradiating with photoreactivating light (406 mmu), or by liquid holding treatment, after UV irradiation. It is concluded that UV-induced division inhibition in E. coli B is initially induced by repairable lesions in the deoxyribonucleic acid, probably pyrimidine dimers.

Postirradiation cell division in 5-fluorouracil-pre-treated Escherichia coli

The correlation between 5-fluorouracil-induced resistance to ultraviolet (UV) light and the ability of bacterial cells to repair irradiation damage was investigated in various strains of Escherichia coli. Preincubation with 5-fluorouracil did not influence the dark-repair mechanism. It affected, however, the UV light-induced damage of cell division in filament-forming strains. It is suggested that the delay in postirradiation macromolecular synthesis of 5-fluorouracil-pretreated bacteria plays a decisive role in the recovery process leading to cross cell wall-forming ability in the damaged strains.

Ultraviolet radiation studies of filamentous Escherichia coli B

Kantor, George J. (The Pennsylvania State University, University Park), and R. A. Deering. Ultraviolet radiation studies of filamentous Escherichia coli B. J. Bacteriol. 92:1062-1069. 1966.-Small ultraviolet (UV) doses cause Escherichia coli B to grow into long filamentous single cells. A large fraction of these filaments can recover their division ability and can form colonies under appropriate conditions. Preformed filaments can be irradiated with UV, and their ability to still produce colonies can be compared with that of irradiated normal cells. In this regard, filaments are more sensitive to UV than normal cells. Filaments can still host-cell reactivate UV-irradiated T1 phage and can regain their own deoxyribonucleic acid (DNA) synthetic ability after it has been blocked by UV. This indicates that these filaments still retain mechanisms for repairing UV-damaged DNA. Pantoyl lactone, an agent that stimulates cell-division recovery in UV-irradiated E. coli B, causes increased UV resistance for both normal and filamentous cells, with the filaments becoming more resistant than normal cells. In the absence of pantoyl lactone, irradiated filaments grow to a length of about 50 times normal and then stop growing. These long filaments cannot subsequently divide and give colonies. We conclude that the UV dose given to the preformed filaments causes an additional division lag beyond that of unirradiated filaments, and that some critical length is reached after which division recovery and colony formation is impossible. Irradiated normal cells recover before reaching this critical length.