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For: Joutsuka T, Yamauchi S. Low-pressure chemical vapor deposition of Cu on Ru substrate using CuI:Abinitiocalculations. Chem Phys Lett 2020. [DOI: 10.1016/j.cplett.2020.137108] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/25/2022]
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