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Radhakrishnan H, Rangarajan R, Pandian R, Dhara SK. Template-assisted growth of Ga-based nanoparticle clusters on Si: effect of post-annealing process on the Ga ion beam exposed 2D arrays fabricated by focused ion beam nanolithography. NANOTECHNOLOGY 2024; 35:375302. [PMID: 38865970 DOI: 10.1088/1361-6528/ad5729] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/12/2024] [Accepted: 06/12/2024] [Indexed: 06/14/2024]
Abstract
We demonstrate template-assisted growth of gallium-based nanoparticle clusters on silicon substrate using a focused ion beam (FIB) nanolithography technique. The nanolithography counterpart of the technique steers a focussed 30 kV accelerated gallium ion beam on the surface of Si to create template patterns of two-dimensional dot arrays. Growth of the nanoparticles is governed by two vital steps namely implantation of gallium into the substrate via gallium beam exposure and formation of the stable nanoparticles on the surface of the substrate by subsequent annealing at elevated temperature in ammonia atmosphere. The growth primarily depends on the dose of implanted gallium which is in the order of 107atoms per spot and it is also critically influenced by the temperature and duration of the post-annealing treatment. By controlling the growth parameters, it is possible to obtain one particle per spot and particle densities as high as 109particles per square centimetre could be achieved in this case. The demonstrated growth process, utilizing the advantages of FIB nanolithography, is categorized under the guided organization approach as it combines both the classical top-down and bottom-up approaches. Patterned growth of the particles could be utilized as templates or nucleation sites for the growth of an organized array of nanostructures or quantum dot structures.
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Affiliation(s)
- Hrudya Radhakrishnan
- Surface and Sensors Studies Division, Materials Science Group, Indira Gandhi Centre for Atomic Research, A CI of Homi Bhabha National Institute, Kalpakkam 603102, Tamilnadu, India
| | | | - Ramanathaswamy Pandian
- Surface and Sensors Studies Division, Materials Science Group, Indira Gandhi Centre for Atomic Research, A CI of Homi Bhabha National Institute, Kalpakkam 603102, Tamilnadu, India
| | - Sandip Kumar Dhara
- Surface and Sensors Studies Division, Materials Science Group, Indira Gandhi Centre for Atomic Research, A CI of Homi Bhabha National Institute, Kalpakkam 603102, Tamilnadu, India
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Nashim A, Mohanty R, Ray PK, Parida KM. Gallium-based nascent electrode materials towards promising supercapacitor applications: a review. RSC Adv 2023; 13:24536-24553. [PMID: 37588976 PMCID: PMC10426392 DOI: 10.1039/d3ra04537d] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/07/2023] [Accepted: 07/30/2023] [Indexed: 08/18/2023] Open
Abstract
To meet the energy requirement of the modern era, supercapacitors are promising candidates for energy storage devices, which possess the potential to compete with the future battery technology. To accomplish this pivotal task, it is vital to choose electrode materials that have high power and energy density as well as superb electrochemical stability. For the past few years, the use of gallium-based materials for energy storage applications has attracted attention because of their excellent activity towards electrochemical energy storage applications despite the single oxidation state (i.e., +3 which is redox inactive and does not contribute towards pseudo capacitance). Recently, research on gallium-based materials has started and will be continued further owing to the fact that gallium-based materials possess numerous excellent properties such as fast charge and discharge rate, high power density, long cycle life, stability over a wide range of temperatures, excellent electron velocity, superior chemical and physical stabilities and high voltage application capability, which make them a potential class of electrode materials for supercapacitors. The enhancement in the electrochemical performance upon the introduction of gallium into the system can make it a futuristic candidate for electrochemical energy storage devices. Herein, we systematically outline the synthesis and characterization of gallium-based materials and their composites as explored by esteemed researchers focusing only on their supercapacitive performance via electrochemical techniques. For a better understanding, the underlying charge storage mechanism and identified characteristics are presented to give a crystal-clear idea about the field. In addition, the key challenges and impending perspectives of gallium-based electrodes for supercapacitor applications are debated.
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Affiliation(s)
- Amtul Nashim
- Centre for Nano Science and Nano Technology, Institute of Technical Education and Research, Siksha 'O' Anusandhan (Deemed to be University) Bhubaneswar 751019 India
| | - Ritik Mohanty
- Centre for Nano Science and Nano Technology, Institute of Technical Education and Research, Siksha 'O' Anusandhan (Deemed to be University) Bhubaneswar 751019 India
| | - Priyadarshi K Ray
- Centre for Nano Science and Nano Technology, Institute of Technical Education and Research, Siksha 'O' Anusandhan (Deemed to be University) Bhubaneswar 751019 India
| | - K M Parida
- Centre for Nano Science and Nano Technology, Institute of Technical Education and Research, Siksha 'O' Anusandhan (Deemed to be University) Bhubaneswar 751019 India
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Lv S, Wang S, Li L, Xie S, Yu J, Zhong Y, Wang G, Liang C, Xu X, Zhang L. Gallium Nitride Based Electrode for High-Temperature Supercapacitors. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2023; 10:e2300780. [PMID: 36965081 DOI: 10.1002/advs.202300780] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/07/2023] [Revised: 03/03/2023] [Indexed: 05/27/2023]
Abstract
Gallium nitride (GaN) single crystal, as the representative of wide-band semiconductors, has great prospects for high-temperature energy storage, of its splendid power output, robust temperature stability, and superior carrier mobility. Nonetheless, it is an essential challenge for GaN-based devices to improve energy storage. Herein, an innovative strategy is proposed by constructing GaN/Nickel cobalt oxygen (NiCoO2 )heterostructure for enhanced supercapacitors (SCs). Benefiting from the synergy effect between the porous GaN network as a highly conductive skeleton and the NiCoO2 with massive active sites. The GaN/NiCoO2 heterostructure-based SCs with ion liquids electrolyte are assembled and delivered an impressive energy density of 15.2 µWh cm-2 and power density, as well as superior service life at 130 °C. The theoretical calculation further explains that the reason for the energy storage enhancement of the GaN/NiCoO2 is due to the presence of the built-in electric fields. This work offers a novel perspective for meeting the practical application of GaN-based energy storage devices with exceptional performance capable of operation under high-temperature environments.
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Affiliation(s)
- Songyang Lv
- Institute of Novel Semiconductors, State Key Lab of Crystal Materials, Shandong University, Jinan, 250100, P. R. China
| | - Shouzhi Wang
- Institute of Novel Semiconductors, State Key Lab of Crystal Materials, Shandong University, Jinan, 250100, P. R. China
- Shenzhen Research Institute, Shandong University, Shenzhen, 518000, P. R. China
| | - Lili Li
- Institute of Crystal Materials, State Key Lab of Crystal Materials, Shandong University, Jinan, 250100, P. R. China
| | - Shoutian Xie
- School of Public Administration, Shandong Normal University, Jinan, 250100, P. R. China
| | - Jiaoxian Yu
- Key Laboratory of Processing and Testing Technology of Glass & Functional Ceramics of Shandong Province, School of Materials Science and Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, P. R. China
| | - Yueyao Zhong
- School of Materials Science and Engineering, Shandong Jianzhu University, Jinan, 250100, P. R. China
| | - Guodong Wang
- Institute of Novel Semiconductors, State Key Lab of Crystal Materials, Shandong University, Jinan, 250100, P. R. China
| | - Chang Liang
- Institute of Novel Semiconductors, State Key Lab of Crystal Materials, Shandong University, Jinan, 250100, P. R. China
| | - Xiangang Xu
- Institute of Novel Semiconductors, State Key Lab of Crystal Materials, Shandong University, Jinan, 250100, P. R. China
| | - Lei Zhang
- Institute of Novel Semiconductors, State Key Lab of Crystal Materials, Shandong University, Jinan, 250100, P. R. China
- Shenzhen Research Institute, Shandong University, Shenzhen, 518000, P. R. China
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Joseph A, Thomas T. Recent advances and prospects of metal oxynitrides for supercapacitor. PROG SOLID STATE CH 2022. [DOI: 10.1016/j.progsolidstchem.2022.100381] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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Hu YL, Wang Z, Yuan R, Xu Z, Dai Y, Wang B, Fu Y, Ye M, Yang Y, Zou Z, Jiang C. A hybrid GaN/Ga 2O 3 structure anchored on carbon cloth as a high-performance electrode of supercapacitors. Dalton Trans 2022; 51:16945-16956. [DOI: 10.1039/d2dt02904a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
GaN/Ga2O3/carbon cloth exhibited high performance as a supercapacitor electrode, with α-Ga2O3 as an absorption/reaction site for H+ and GaN as an electron channel.
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Affiliation(s)
- Yan-Ling Hu
- Fujian Provincial Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, P.R. China
| | - Zihan Wang
- Fujian Provincial Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, P.R. China
| | - Ronghuo Yuan
- Fujian Provincial Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, P.R. China
| | - Zhihan Xu
- Fujian Provincial Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, P.R. China
| | - Yan Dai
- Fujian Provincial Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, P.R. China
| | - Bing Wang
- Fujian Provincial Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, P.R. China
| | - Yao Fu
- Fujian Provincial Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, P.R. China
| | - Meidan Ye
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen 361005, China
| | - Yun Yang
- Research Institute for Biomimetics and Soft Matter, Fujian Provincial Key Laboratory for Soft Functional Materials Research, Department of Physics, Xiamen University, Xiamen 361005, China
| | - Zhimin Zou
- Fujian Provincial Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, P.R. China
| | - Chunhai Jiang
- Fujian Provincial Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, P.R. China
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