Polystyrene-poly(2-ethylhexylmethacrylate) block copolymers: Synthesis, bulk phase behavior, and thin film structure

Stability and Elasticity of Ultrathin Sphere-Patterned Block Copolymer Films

Sphere-patterned ultrathin block copolymer films are potentially interesting for a variety of applications in nanotechnology. We use self-consistent field theory to investigate the elastic response of sphere monolayer films with respect to in-plane shear, in-plane extension, compression deformations, and bending. The relations between the in-plane elastic moduli are roughly compatible with the expectations for two-dimensional elastic systems with hexagonal symmetry, with one notable exception: The pure shear and the simple shear moduli differ from each other by roughly 20%. Even more importantly, the bending constants are found to be negative, indicating that free-standing block copolymer membranes made of only a sphere monolayer are inherently unstable above the glass transition. Our results are discussed in view of the experimental findings.

SAXS signature of the lamellar ordering of ionic domains of perfluorinated sulfonic-acid ionomers by electric and magnetic field-assisted casting

The origins of the matrix and ionomer peaks of Nafion SAXS pattern are revisited.

Direct Measurement of the Local Glass Transition in Self-Assembled Copolymers with Nanometer Resolution

Nanoscale compositional heterogeneity in block copolymers can impart synergistic property combinations, such as stiffness and toughness. However, until now, there has been no experimental method to locally probe the dynamics at a specific location within these structured materials. Here, this was achieved by incorporating pyrene-bearing monomers at specific locations along the polymer chain, allowing the labeled monomers' local environment to be interrogated via fluorescence. In lamellar-forming poly(butyl methacrylate-b-methyl methacrylate) diblock copolymers, a strong gradient in glass transition temperature, T_g, of the higher-T_g block, 42 K over 4 nm, was mapped with nanometer resolution. These measurements also revealed a strongly asymmetric influence of the domain interface on T_g, with a much smaller dynamic gradient being observed for the lower-T_g block.

Large-area nanosquare arrays from shear-aligned block copolymer thin films

While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated.

Mixed-morphology and mixed-orientation block copolymer bilayers

Three-dimensional block copolymer structures with long-range order and mixed symmetries.