Imaging cobalt nanoparticles by amplitude modulation atomic force microscopy: comparison between low and high amplitude solutions

Two dynamic modes to streamline challenging atomic force microscopy measurements

The quality of topographic images obtained using atomic force microscopy strongly depends on the accuracy of the choice of scanning parameters. When using the most common scanning method - semicontact amplitude modulation (tapping) mode, the choice of scanning parameters is quite complicated, since it requires taking into account many factors and finding the optimal balance between them. A researcher's task can be significantly simplified by introducing new scanning techniques. Two such techniques are described: vertical and dissipation modes. Significantly simplified and formalized choice of the imaging parameters in these modes allows addressing a wide range of formerly challenging tasks - from scanning rough samples with high aspect ratio features to molecular resolution imaging.

Quantification of the dielectric constant of single non-spherical nanoparticles from polarization forces: eccentricity effects

We analyze by means of finite-element numerical calculations the polarization force between a sharp conducting tip and a non-spherical uncharged dielectric nanoparticle with the objective of quantifying its dielectric constant from electrostatic force microscopy (EFM) measurements. We show that for an oblate spheroid nanoparticle of given height the strength of the polarization force acting on the tip depends linearly on the eccentricity, e, of the nanoparticle in the small eccentricity and low dielectric constant regimes (1 < e < 2 and 1 < ε(r) < 10), while for higher eccentricities (e > 2) the dependence is sub-linear and finally becomes independent of e for very large eccentricities (e > 30). These results imply that a precise account of the nanoparticle shape is required to quantify EFM data and obtain the dielectric constants of non-spherical dielectric nanoparticles. Experimental results obtained on polystyrene, silicon dioxide and aluminum oxide nanoparticles and on single viruses are used to illustrate the main findings.

Practical method to limit tip-sample contact stress and prevent wear in amplitude modulation atomic force microscopy

Amplitude modulation atomic force microscopy (AM-AFM) is one of the most popular AFM modes because of the reduced tip-sample interaction, compared to contact mode AFM, and the ability to acquire high-resolution images while interrogating the sample's material composition through phase imaging. Despite the reduced tip-sample interaction, tip and sample wear can occur through gradual atomic scale processes that can significantly accumulate due to the high frequency of the tip-sample interaction and through high intermittent contact stresses. Starting from existing analytical formulations, we introduce a method for selecting an appropriate probe and free oscillation amplitude that avoids exceeding a critical contact stress to minimize tip/sample damage. The approach is presented for the case of both a Hertzian- and a Derjaguin-Müller-Toporov-like tip-sample contact. Stress maps and related simplified formulas are provided that enable one to determine allowable free oscillation amplitudes to stay below a target contact stress for given cantilever and sample parameters (combined into a single "cantilever-sample constant" that we introduce). Experimental results show how sharp silicon tips, either uncoated or coated with diamond-like carbon and silicon nitride, interacting with a hard and wear-resistant sample (ultrananocrystalline diamond) can be preserved while attaining high-quality AM-AFM images by using our proposed scheme. We also show that using our analysis to select parameters that exceed the target contact stress indeed leads to significant tip wear. This method provides AM-AFM users with a better understanding of contact stresses and enables selection of AM-AFM cantilevers and experimental parameters that preserve the tip for long periods of use and prevents the sample from damage.

Atomic force microscopy analysis of nanoparticles in non-ideal conditions

Nanoparticles are often measured using atomic force microscopy or other scanning probe microscopy methods. For isolated nanoparticles on flat substrates, this is a relatively easy task. However, in real situations, we often need to analyze nanoparticles on rough substrates or nanoparticles that are not isolated. In this article, we present a simple model for realistic simulations of nanoparticle deposition and we employ this model for modeling nanoparticles on rough substrates. Different modeling conditions (coverage, relaxation after deposition) and convolution with different tip shapes are used to obtain a wide spectrum of virtual AFM nanoparticle images similar to those known from practice. Statistical parameters of nanoparticles are then analyzed using different data processing algorithms in order to show their systematic errors and to estimate uncertainties for atomic force microscopy analysis of nanoparticles under non-ideal conditions. It is shown that the elimination of user influence on the data processing algorithm is a key step for obtaining accurate results while analyzing nanoparticles measured in non-ideal conditions.

Past, present and future of atomic force microscopy in life sciences and medicine

To introduce this special issue of the Journal of Molecular Recognition dedicated to the applications of atomic force microscopy (AFM) in life sciences, this paper presents a short summary of the history of AFM in biology. Based on contributions from the first international conference of AFM in biological sciences and medicine (AFM BioMed Barcelona, 19-21 April 2007), we present and discuss recent progress made using AFM for studying cells and cellular interactions, probing single molecules, imaging biosurfaces at high resolution and investigating model membranes and their interactions. Future prospects in these different fields are also highlighted.