Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering

A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

Titanium dioxide (TiO2) thin films are used for a broad range of applications such as wastewater treatment, photocatalytic degradation activity, water splitting, antibacterial and also in biomedical applications. There is a wide range of synthesis techniques for the deposition of TiO2 thin films, such as chemical vapor deposition (CVD) and physical vapor deposition (PVD), both of which are well known deposition methods. Layer by layer deposition with good homogeneity, even thickness and good adhesive nature is possible by using the PVD technique, with the products being used for photocatalytic applications. This review studies the effects of magnetron sputtering conditions on TiO2 films. This innovative technique can enhance the photocatalytic activity by increasing the thickness of the film higher than any other methods. The main purpose of this article is to review the effects of DC and RF magnetron sputtering conditions on the preparation of TiO2 thin films for photocatalysis. The characteristics of TiO2 films (i.e., structure, composition, and crystallinity) are affected significantly by the substrate type, the sputtering power, the distance between substrate and target, working pressure, argon/oxygen ratio, deposition time, substrate temperature, dopant types, and finally the annealing treatment. The photocatalytic activity and optical properties, including the degree of crystallinity, band gap (Eg), refractive index (n), transmittance (T), and extinction coefficient (k), of TiO2 films are dependent on the above- mentioned film characteristics. Optimal TiO2 films should have a small particle size, a strong degree of crystallinity, a low band gap, a low contact angle, a high refractive index, transmittance, and extinction coefficient. Finally, metallic and nonmetallic dopants can be added to enhance the photocatalytic activity of TiO2 films by narrowing the band gap.

In-situ synthesis of TiO2 rutile/anatase heterostructure by DC magnetron sputtering at room temperature and thickness effect of outermost rutile layer on photocatalysis

TiO₂ rutile/anatase heterostructure thin films with varying rutile thickness have been in-situ synthesized via DC magnetron sputtering with Ar gas at room temperature. The crystal texture, surface morphology, energy gap and optical properties of the films have been investigated by X-ray diffraction meter, grazing incidence X-ray diffraction meter, Raman spectroscopy, scanning electron microscopy, and UV-visible spectrophotometer, which indicates that the rutile/anatase heterostructure films are successfully fabricated. The further degradation experiments display that the photocatalytic activity can be dramatically affected by the thickness of the outmost rutile layer and the 100nm thickness exhibits the best performance in all of the TiO₂ thin films. With the increase of the outmost rutile layer, the optical band gap of TiO₂ film displays a systematic decrease slightly. However, the change in photocatalytic activity does not coincide with that in the band gap. The photoresponse and electrochemical properties of the thin films have been characterized to understand the mechanism of the varied photocatalytic activity.

Study on the optical property and surface morphology of N doped TiO₂ film deposited with different N₂ flow rates by DCPMS

N doped TiO2 films were deposited by direct current pulse magnetron sputtering system at room temperature. By using UV-Vis spectrophotometer and atomic force microscope, we studied the influence of N2 flow rate on the optical property and surface morphology of films. The results indicate that the optical property and surface morphology of N doped TiO2 film was dominated by the N2 flow rate. The mean absorbency in visible range of pure TiO2 films is near to 0%, which means that the pure TiO2 could hardly display the photocatalytic property in visible range. When N2 flow rate is 2 sccm, the mean absorbency in visible range of N doped TiO2 film could reach at 24%. In this case, the film could be used as photocatalyst induced by visible light. While with increasing N2 flow rate, the mean absorbency in visible range of N doped TiO2 film decreased abruptly. Especially when N2 flow rate exceeded 8 sccm, the mean absorbency in visible range of N doped TiO2 film decreased to about 0%, which is like pure TiO2 fimls.

An overview of photocatalysis phenomena applied to NOx abatement

This review provides a short introduction to photocatalysis technology in terms of the present environmental remediation paradigm and, in particular, NOx photoabatement. The fundamentals of photoelectrochemical devices and the photocatalysis phenomena are reviewed, highlighting the main reaction mechanisms. The critical historical developments on heterogeneous photocatalysis are briefly discussed, giving particular emphasis to the pioneer works in this field. The third part of this work focus mainly on NOx removal technology considering topics such as: TiO2 photochemistry; effect of the operating conditions on the photocatalysis process; Langmuir-Hinshelwood modeling; TiO2 photocatalytic immobilization approaches; and their applications. The last section of the paper presents the main conclusions and perspectives on the opportunities related to this technology.

Composition and crystal structure of N doped TiO2 film deposited at different O2 flow rate by direct current sputtering

N doped Ti02 films were deposited by direct current pulse magnetron sputtering system at room temperature. The influence of 02 flow rate on the crystal structure of deposited films was studied by Stylus profilometer, X-ray photoelectron spectroscopy, and X-ray diffractometer. The results indicate that the 02 flow rate strongly controls the growth behavior and crystal structure of N doped Ti02 film. It is found that N element mainly exists as substitutional doped state and the chemical stiochiometry is near to TiO1.68±0.06N0.11±0.01 for all film samples. N doped Ti02 film deposited with 2 sccm (standard-state cubic centimeter per minute) 02 flow rate is amorphous structure with high growth rate, which contains both anatase phase and rutile phase crystal nucleuses. In this case, the film displays the mix-phase of anatase and rutile after annealing treatment. While N doped Ti02 film deposited with 12 cm(3)/min 02 flow rate displays anatase phase before and after annealing treatment. And it should be noticed that no TiN phase appears for all samples before and after annealing treatment.

Effects of UV/Ag-TiO2/O3 advanced oxidation on unicellular green alga Dunaliella salina: implications for removal of invasive species from ballast water

The UV/Ag-TiO2/O3 process was investigated for ballast water treatment using Dunaliella salina as an indicator. Inactivation curves were obtained, and the toxicity of effluent was determined. Compared with individual unit processes using ozone or UV/Ag-TiO2, the inactivation efficiency of D. salina by the combined UV/Ag-TiO2/O3 process was enhanced. The presence of ozone caused an immediate decrease in chlorophyll a (chl-a) concentration. Inactivation efficiency and ch1-a removal efficiency were positively correlated with ozone dose and ultraviolet intensity. The initial total residual oxidant (TRO) concentration of effluent increased with increasing ozone dose, and persistence of TRO resulted in an extended period of toxicity. The results suggest that UV/Ag-TiO2/O3 has potential for ballast water treatment.