Silver Deposition onto Modified Silicon Substrates

Tuning Physical Properties and Chemical Reactivity of the MgO Surface by Chemical Modification with Hexafluoroacetylacetone

Magnesium oxide, MgO, has excellent physical properties and a wide range of practical applications. It is an alkaline metal oxide, meaning that it is susceptible to reactions with any acidic functional groups. This work examines the modification of the MgO film surface with 1,1,1,5,5,5-hexafluoro-2,4-pentanedione (hfacH). This investigation addresses the changes in hydrophobicity of the MgO surface upon hfacH modification by gas-phase exposure and evaluates the effect of this modification on a model atomic layer deposition system using tetrakis(dimethylamido)titanium (TDMAT) and water producing a MgO/TiO2 interface.

Relaxation of Photoexcited Electron-Hole Pairs at Si(111) Surfaces with Adsorbed Ag Monolayered Clusters of Increasing Size

The efficiency of silicon solar cells is affected by the light absorption and recombination losses of photoexcited charge carries. One possible way to improve the efficiency is through the deposition of transition metal nanoparticles on Si surfaces. Here, we first carry out density functional theory (DFT) calculations to obtain electronic structures for Agn (n = 1-7) monolayered clusters adsorbed on Si(111)/H surfaces. Results are presented in the form of the density of states, band gaps, and light absorption, which allow for the investigation of the interaction of Ag clusters with Si. Different behaviors can be expected depending on the size of the deposited Ag clusters. Overall, the deposition of Ag clusters leads to smaller band gaps, red-shifts, and large increases in light absorption compared to the pristine Si slab. We then study the relaxation dynamics of electron-hole pairs for slabs based on nonadiabatic couplings using the reduced density matrix approach within the Redfield formalism. Nonradiative relaxation rates are noticeably different for various structures and transitions. One observes higher relaxation rates for surfaces with adsorbates than for the pristine Si surface due to charge transfer events involving Ag orbitals. We also compute emission spectra from excited-state relaxation dynamics. The band gap emission is dark for the pristine Si due to the indirect nature of its band gap. The addition of larger Ag clusters breaks the symmetry of Si slabs, enabling indirect gap transitions. These slabs thus exhibit bright band gap emission. The introduction of adsorbates is advantageous for applications in photovoltaics and photocatalysis.

Silver CVD and ALD Precursors: Synthesis, Properties, and Application in Deposition Processes

This review summarized the developments in the field of volatile silver complexes, which can serve as precursors in gas-transport reactions for the production of thin films and metal nanoparticles via chemical vapor deposition (CVD) and atomic layer deposition (ALD). Silver-based films and nanoparticles are widely used in various high-tech fields, including medicine. For effective use in CVD and ALD processes, the properties of silver precursors must be balanced in terms of volatility, thermal stability, and reactivity. In this review, we focus on the synthesis and comprehensive analysis of structural and thermal characteristics for the most promising classes of volatile silver complexes, as well as organometallic compounds. Following the specifics of silver chemistry, some features of the use of precursors and their selection, as well as several key directions to improving the efficiency of silver material deposition processes, are also discussed.

Antibiofouling performance and mechanisms of a modified polyvinylidene fluoride membrane in an MBR for wastewater treatment: Role of silver@silica nanopollens

Biofouling remains to be one of major obstacles in membrane bioreactors (MBRs), calling for the development of antibiofouling membranes. Silver nanoparticles (AgNPs), being a kind of broad spectrum bactericidal agent, have been widely used for modifying membrane; however, uncontrollable release of AgNPs and thus a short lifetime of modified membranes are thorny issues for the AgNPs-modified membranes. In this study, silica nanopollens were used as AgNPs nanocarriers for membrane modification (ASNP-M), which could improve silver delivery efficacy, avoid agglomeration and control Ag⁺ release towards bacteria. At a silver loading of 107.7 ± 10.9 μg Ag/cm², ASNP-M effectively inhibited growth of Escherichia coli and Staphylococcus aureus, with an Ag⁺ release rate of 0.5 μg/(cm² d). Long-term MBR tests showed that ASNP-M exhibited a significantly reduced transmembrane pressure increase rate of 0.88 ± 0.34 kPa/d which was much lower than that of two control membranes, i.e., pristine membrane (M0) (2.32 ± 0.86 kPa/d) and Ag@silica nanospheres (without spikes) modified membrane (ASNS-M) (2.25 ± 1.28 kPa/d). No significant adverse influences on the pollutant removal were also observed in the reactor. Foulants analysis revealed that biofilm of ASNP-M was thinner and comprised of mainly dead cells, and only organic matter with strong adhesion properties was allowed to attach onto the membrane surface. Bacterial community analysis suggested that the incorporation of Ag@silica nanopollens inhibited colonization of bacteria which are capable of causing membrane biofouling (e.g., Proteobacteria and Actinobacteria). These findings highlight the potential of the antibiofouling membrane to be used in MBRs for wastewater treatment and reclamation.

The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces

The deposition of thin solid films is central to many industrial applications, and chemical vapor deposition (CVD) methods are particularly useful for this task. For one, the isotropic nature of the adsorption of chemical species affords even coverages on surfaces with rough topographies, an increasingly common requirement in microelectronics. Furthermore, by splitting the overall film-depositing reactions into two or more complementary and self-limiting steps, as it is done in atomic layer depositions (ALD), film thicknesses can be controlled down to the sub-monolayer level. Thanks to the availability of a vast array of inorganic and metalorganic precursors, CVD and ALD are quite versatile and can be engineered to deposit virtually any type of solid material. On the negative side, the surface chemistry that takes place in these processes is often complex, and can include undesirable side reactions leading to the incorporation of impurities in the growing films. Appropriate precursors and deposition conditions need to be chosen to minimize these problems, and that requires a proper understanding of the underlying surface chemistry. The precursors for CVD and ALD are often designed and chosen based on their known thermal chemistry from inorganic chemistry studies, taking advantage of the vast knowledge developed in that field over the years. Although a good first approximation, however, this approach can lead to wrong choices, because the reactions of these precursors at gas-solid interfaces can be quite different from what is seen in solution. For one, solvents often aid in the displacement of ligands in metalorganic compounds, providing the right dielectric environment, temporarily coordinating to the metal, or facilitating multiple ligand-complex interactions to increase reaction probabilities; these options are not available in the gas-solid reactions associated with CVD and ALD. Moreover, solid surfaces act as unique "ligands", if these reactions are to be viewed from the point of view of the metalorganic complexes used as precursors: they are bulky and rigid, can provide multiple binding sites for a single reaction, and can promote unique bonding modes, especially on metals, which have delocalized electronic structures. The differences between the molecular and surface chemistry of CVD and ALD precursors can result in significant variations in their reactivity, ultimately leading to unpredictable properties in the newly grown films. In this Account, we discuss some of the main similarities and differences in chemistry that CVD/ALD precursors follow on surfaces when contrasted against their known behavior in solution, with emphasis on our own work but also referencing other key contributions. Our approach is unique in that it combines expertise from the inorganic, surface science, and quantum-mechanics fields to better understand the mechanistic details of the chemistry of CVD and ALD processes and to identify new criteria to consider when designing CVD/ALD precursors.

Investigation of the influence of oxygen plasma on supported silver nanoparticles

Silver deposition precursor molecule trimethylphosphine(hexafluoroacetylacetonato)silver(I) [(hfac)AgP(CH3)3] was used to deposit silver onto water-modified (hydroxyl-terminated) solid substrates. A silicon wafer was used as a model flat surface, and water-predosed ZnO nanopowder was investigated to expand the findings to a common substrate material for possible practical applications. Following the deposition, oxygen plasma was used to remove the remaining organic ligands on a surface and to investigate its effect on the morphology of chemically deposited silver nanoparticles and films. A combination of microscopic and spectroscopic techniques including electron microscopy and x-ray photoelectron spectroscopy was used to confirm the change in the morphology of the deposited material consistent with Ostwald ripening as a result of plasma treatment. Particle agglomeration was observed on the surfaces, and the deposited metallic silver was oxidized to Ag2O following plasma treatment. The fluorine-containing ligands were completely removed. This result suggests that chemical vapor deposition can be used to deposit silver in a very controlled manner onto a variety of substrates using different topography methods and that the post-treatment with oxygen plasma is effective in preparing materials deposited for potential practical applications.