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Zhang C, Cui H, Guo R, Chen S, Li W, Han Y, Wang S, Jiang Z, Zeng X, Sun R. Adhesion Energy-Assisted Low Contact Thermal Resistance Epoxy Resin-Based Composite. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2024; 40:8108-8114. [PMID: 38568421 DOI: 10.1021/acs.langmuir.4c00111] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/17/2024]
Abstract
Although intense efforts have been devoted to the development of thermally conductive epoxy resin composites, most previous works ignore the importance of the contact thermal resistance between epoxy resin composites and mating surfaces. Here, we report on epoxy resin/hexagonal boron nitride (h-BN) composites, which show low contact thermal resistance with the contacting surface by tuning adhesion energy. We found that adhesion energy increases with increasing the ratio of soybean-based epoxy resin/amino silicone oil and h-BN contents. The adhesion energy has a negative correlation with the contact thermal resistance; that is, enhancing the adhesion energy will lead to reduced contact thermal resistance. The contact thermal conductance increases with the h-BN contents and is low to 0.025 mm2·K/W for the epoxy resin/60 wt % h-BN composites, which is consistent with the theoretically calculated value. By investigating the wettability and chain dynamics of the epoxy resin/h-BN composites, we confirm that the low contact thermal resistance stems from the increased intermolecular interaction between the epoxy resin chains. The present study provides a practical approach for the development of epoxy resin composites with enhanced thermal conductivity and reduced contact thermal resistance, aiming for effective thermal management of electronics.
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Affiliation(s)
- Chong Zhang
- State Key Laboratory of Advanced Power Transmission Technology, Beijing 102209, China
| | - Huize Cui
- State Key Laboratory of Advanced Power Transmission Technology, Beijing 102209, China
| | - Ruilu Guo
- State Key Laboratory of Advanced Power Transmission Technology, Beijing 102209, China
| | - Shuo Chen
- State Key Laboratory of Advanced Power Transmission Technology, Beijing 102209, China
| | - Wenpeng Li
- State Key Laboratory of Advanced Power Transmission Technology, Beijing 102209, China
| | - Yu Han
- State Key Laboratory of Advanced Power Transmission Technology, Beijing 102209, China
| | - Shuting Wang
- Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China
| | - Zhenghong Jiang
- Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China
| | - Xiaoliang Zeng
- Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China
| | - Rong Sun
- Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China
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Perez C, McLeod AJ, Chen ME, Yi SI, Vaziri S, Hood R, Ueda ST, Bao X, Asheghi M, Park W, Talin AA, Kumar S, Pop E, Kummel AC, Goodson KE. High Thermal Conductivity of Submicrometer Aluminum Nitride Thin Films Sputter-Deposited at Low Temperature. ACS NANO 2023; 17:21240-21250. [PMID: 37796248 DOI: 10.1021/acsnano.3c05485] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/06/2023]
Abstract
Aluminum nitride (AlN) is one of the few electrically insulating materials with excellent thermal conductivity, but high-quality films typically require exceedingly hot deposition temperatures (>1000 °C). For thermal management applications in dense or high-power integrated circuits, it is important to deposit heat spreaders at low temperatures (<500 °C), without affecting the underlying electronics. Here, we demonstrate 100 nm to 1.7 μm thick AlN films achieved by low-temperature (<100 °C) sputtering, correlating their thermal properties with their grain size and interfacial quality, which we analyze by X-ray diffraction, transmission X-ray microscopy, as well as Raman and Auger spectroscopy. Controlling the deposition conditions through the partial pressure of reactive N2, we achieve an ∼3× variation in thermal conductivity (∼36-104 W m-1 K-1) of ∼600 nm films, with the upper range representing one of the highest values for such film thicknesses at room temperature, especially at deposition temperatures below 100 °C. Defect densities are also estimated from the thermal conductivity measurements, providing insight into the thermal engineering of AlN that can be optimized for application-specific heat spreading or thermal confinement.
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Affiliation(s)
- Christopher Perez
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
- Materials Physics, Sandia National Laboratories, Livermore, California 94550, United States
| | - Aaron J McLeod
- Department of Chemistry and Biochemistry, University of California San Diego, La Jolla, California 92093, United States
| | - Michelle E Chen
- Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States
| | - Su-In Yi
- Department of Electrical and Computer Engineering, Texas A&M University, College Station, Texas 77843, United States
| | - Sam Vaziri
- Taiwan Semiconductor Manufacturing Company, San Jose, California 95134, United States
| | - Ryan Hood
- Materials Physics, Sandia National Laboratories, Livermore, California 94550, United States
| | - Scott T Ueda
- Materials Science and Engineering Program, University of California San Diego, La Jolla, California 92093, United States
| | - Xinyu Bao
- Taiwan Semiconductor Manufacturing Company, San Jose, California 95134, United States
| | - Mehdi Asheghi
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Woosung Park
- Division of Mechanical Systems Engineering, Sookmyung Women's University, Seoul 04310, South Korea
| | - A Alec Talin
- Materials Physics, Sandia National Laboratories, Livermore, California 94550, United States
| | - Suhas Kumar
- Materials Physics, Sandia National Laboratories, Livermore, California 94550, United States
| | - Eric Pop
- Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States
- Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States
| | - Andrew C Kummel
- Department of Chemistry and Biochemistry, University of California San Diego, La Jolla, California 92093, United States
| | - Kenneth E Goodson
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
- Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States
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Kwon H, Khan AI, Perez C, Asheghi M, Pop E, Goodson KE. Uncovering Thermal and Electrical Properties of Sb 2Te 3/GeTe Superlattice Films. NANO LETTERS 2021; 21:5984-5990. [PMID: 34270270 DOI: 10.1021/acs.nanolett.1c00947] [Citation(s) in RCA: 9] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Superlattice-like phase change memory (SL-PCM) promises lower switching current than conventional PCM based on Ge2Sb2Te5 (GST); however, a fundamental understanding of SL-PCM requires detailed characterization of the interfaces within such an SL. Here we explore the electrical and thermal transport of SLs with deposited Sb2Te3 and GeTe alternating layers of various thicknesses. We find up to an approximately four-fold reduction of the effective cross-plane thermal conductivity of the SL stack (as-deposited polycrystalline) compared with polycrystalline GST (as-deposited amorphous and later annealed) due to the thermal interface resistances within the SL. Thermal measurements with varying periods of our SLs show a signature of phonon coherence with a transition from wave-like to particle-like phonon transport, further described by our modeling. Electrical resistivity measurements of such SLs reveal strong anisotropy (∼2000×) between the in-plane and cross-plane directions due to the weakly interacting van der Waals-like gaps. This work uncovers electrothermal transport in SLs based on Sb2Te3 and GeTe for the improved design of low-power PCM.
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Affiliation(s)
- Heungdong Kwon
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Asir Intisar Khan
- Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States
| | - Christopher Perez
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Mehdi Asheghi
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Eric Pop
- Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States
- Department of Materials Science & Engineering, Stanford University, Stanford, California 94305, United States
| | - Kenneth E Goodson
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
- Department of Materials Science & Engineering, Stanford University, Stanford, California 94305, United States
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