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Warzoha RJ, Wilson AA, Donovan BF, Clark A, Cheng X, An L, Feng G. Measurements of Thermal Resistance Across Buried Interfaces with Frequency-Domain Thermoreflectance and Microscale Confinement. ACS APPLIED MATERIALS & INTERFACES 2024; 16:41633-41641. [PMID: 39047150 PMCID: PMC11310922 DOI: 10.1021/acsami.4c05258] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/31/2024] [Revised: 07/10/2024] [Accepted: 07/15/2024] [Indexed: 07/27/2024]
Abstract
Confined geometries are used to increase measurement sensitivity to thermal boundary resistance at buried SiO2 interfaces with frequency-domain thermoreflectance (FDTR). We show that radial confinement of the transducer film and additional underlying material layers prevents heat from spreading and increases the thermal penetration depth of the thermal wave. Parametric analyses are performed with finite element methods and used to examine the extent to which the thermal penetration depth increases as a function of a material's effective thermal resistance and the degree of material confinement relative to the pump beam diameter. To our surprise, results suggest that the measurement technique is not always the most sensitive to the largest thermal resistor in a multilayer material. We also find that increasing the degree to which a material is confined improves measurement sensitivity to the thermal resistance across material interfaces that are buried 10s of μm to mm below the surface. These results are used to design experimental measurements of etched, 200 nm thick SiO2 films deposited on Al2O3 substrates, and offer an opportunity for thermal scientists and engineers to characterize the thermal resistance across a broader range of material interfaces within electronic device architectures that have historically been difficult to access via experiment.
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Affiliation(s)
- Ronald J. Warzoha
- Department
of Mechanical and Nuclear Engineering, United
States Naval Academy, Annapolis, Maryland 21402, United States
| | - Adam A. Wilson
- United
States Army DEVCOM Army Research Laboratory, Energy Sciences Division, Adelphi, Maryland 20783, United States
| | - Brian F. Donovan
- Department
of Physics, United States Naval Academy, Annapolis, Maryland 21402, United States
| | - Andy Clark
- Department
of Physics, Bryn Mawr College, Bryn Mawr, Pennsylvania 19085, United States
| | - Xuemei Cheng
- Department
of Physics, Bryn Mawr College, Bryn Mawr, Pennsylvania 19085, United States
| | - Lu An
- Department
of Mechanical Engineering, Villanova University, Villanova, Pennsylvania 19085, United States
| | - Gang Feng
- Department
of Mechanical Engineering, Villanova University, Villanova, Pennsylvania 19085, United States
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2
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Zhang T, Khomane SB, Singh I, Crudden CM, McBreen PH. N-heterocyclic carbene adsorption states on Pt(111) and Ru(0001). Phys Chem Chem Phys 2024; 26:4083-4090. [PMID: 38226886 DOI: 10.1039/d3cp03539e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/17/2024]
Abstract
N-heterocyclic carbene ligands (NHCs) are increasingly used to tune the properties of metal surfaces. The generally greater chemical and thermal robustness of NHCs on gold, as compared to thiolate surface ligands, underscores their potential for a range of applications. While much is now known about the adsorption geometry, overlayer structure, dynamics, and stability of NHCs on coinage elements, especially gold and copper, much less is known about their interaction with the surfaces of Pt-group metals, despite the importance of such metals in catalysis and electrochemistry. In this study, reflection absorption infrared spectroscopy (RAIRS) is used to probe the structure of benzimidazolylidene NHC ligands on Pt(111) and Ru(0001). The experiments exploit the intense absorption peaks of a CF3 substituent on the phenyl ring of the NHC backbone to provide unprecedented insight into adsorption geometry and chemical stability. The results also permit comparison with literature data for NHC ligands on Au(111) and to DFT predictions for NHCs on Pt(111) and Ru(0001), thereby greatly extending the known surface chemistry of NHCs and providing much needed molecular information for the design of metal-organic hybrid materials involving strongly reactive metals.
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Affiliation(s)
- Tianchi Zhang
- Département de chimie et CCVC, Université Laval, Québec (Que), Canada, G1K OA6.
| | - Sonali B Khomane
- Département de chimie et CCVC, Université Laval, Québec (Que), Canada, G1K OA6.
| | - Ishwar Singh
- Department of Chemistry, Queen's University, 90 Bader Lane, Kingston, Ontario, Canada, K7L 3N6.
| | - Cathleen M Crudden
- Department of Chemistry, Queen's University, 90 Bader Lane, Kingston, Ontario, Canada, K7L 3N6.
| | - Peter H McBreen
- Département de chimie et CCVC, Université Laval, Québec (Que), Canada, G1K OA6.
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3
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Zhan T, Xu M, Cao Z, Zheng C, Kurita H, Narita F, Wu YJ, Xu Y, Wang H, Song M, Wang W, Zhou Y, Liu X, Shi Y, Jia Y, Guan S, Hanajiri T, Maekawa T, Okino A, Watanabe T. Effects of Thermal Boundary Resistance on Thermal Management of Gallium-Nitride-Based Semiconductor Devices: A Review. MICROMACHINES 2023; 14:2076. [PMID: 38004933 PMCID: PMC10673006 DOI: 10.3390/mi14112076] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/28/2023] [Revised: 10/30/2023] [Accepted: 11/04/2023] [Indexed: 11/26/2023]
Abstract
Wide-bandgap gallium nitride (GaN)-based semiconductors offer significant advantages over traditional Si-based semiconductors in terms of high-power and high-frequency operations. As it has superior properties, such as high operating temperatures, high-frequency operation, high breakdown electric field, and enhanced radiation resistance, GaN is applied in various fields, such as power electronic devices, renewable energy systems, light-emitting diodes, and radio frequency (RF) electronic devices. For example, GaN-based high-electron-mobility transistors (HEMTs) are used widely in various applications, such as 5G cellular networks, satellite communication, and radar systems. When a current flows through the transistor channels during operation, the self-heating effect (SHE) deriving from joule heat generation causes a significant increase in the temperature. Increases in the channel temperature reduce the carrier mobility and cause a shift in the threshold voltage, resulting in significant performance degradation. Moreover, temperature increases cause substantial lifetime reductions. Accordingly, GaN-based HEMTs are operated at a low power, although they have demonstrated high RF output power potential. The SHE is expected to be even more important in future advanced technology designs, such as gate-all-around field-effect transistor (GAAFET) and three-dimensional (3D) IC architectures. Materials with high thermal conductivities, such as silicon carbide (SiC) and diamond, are good candidates as substrates for heat dissipation in GaN-based semiconductors. However, the thermal boundary resistance (TBR) of the GaN/substrate interface is a bottleneck for heat dissipation. This bottleneck should be reduced optimally to enable full employment of the high thermal conductivity of the substrates. Here, we comprehensively review the experimental and simulation studies that report TBRs in GaN-on-SiC and GaN-on-diamond devices. The effects of the growth methods, growth conditions, integration methods, and interlayer structures on the TBR are summarized. This study provides guidelines for decreasing the TBR for thermal management in the design and implementation of GaN-based semiconductor devices.
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Affiliation(s)
- Tianzhuo Zhan
- Graduate School of Interdisciplinary New Science, Toyo University, 2100 Kujirai, Kawagoe 350-8585, Saitama, Japan; (S.G.); (T.H.); (T.M.)
- Faculty of Science and Engineering, Waseda University, 3-4-1 Ookubo, Shinjuku-ku 169-8555, Tokyo, Japan; (Z.C.); (C.Z.); (T.W.)
| | - Mao Xu
- School of Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Tokyo, Japan; (M.X.); (A.O.)
| | - Zhi Cao
- Faculty of Science and Engineering, Waseda University, 3-4-1 Ookubo, Shinjuku-ku 169-8555, Tokyo, Japan; (Z.C.); (C.Z.); (T.W.)
| | - Chong Zheng
- Faculty of Science and Engineering, Waseda University, 3-4-1 Ookubo, Shinjuku-ku 169-8555, Tokyo, Japan; (Z.C.); (C.Z.); (T.W.)
| | - Hiroki Kurita
- Graduate School of Environmental Studies, Tohoku University, 6-6-02 Aoba-yama, Sendai 980-8579, Miyagi, Japan; (H.K.); (F.N.)
| | - Fumio Narita
- Graduate School of Environmental Studies, Tohoku University, 6-6-02 Aoba-yama, Sendai 980-8579, Miyagi, Japan; (H.K.); (F.N.)
| | - Yen-Ju Wu
- National Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, Ibaraki, Japan; (Y.-J.W.); (Y.X.)
| | - Yibin Xu
- National Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, Ibaraki, Japan; (Y.-J.W.); (Y.X.)
| | - Haidong Wang
- School of Aerospace Engineering, Tsinghua University, Beijing 100084, China;
| | - Mengjie Song
- School of Mechanical Engineering, Beijing Institute of Technology, Beijing 100081, China; (M.S.); (W.W.)
| | - Wei Wang
- School of Mechanical Engineering, Beijing Institute of Technology, Beijing 100081, China; (M.S.); (W.W.)
| | - Yanguang Zhou
- School of Engineering, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong SAR, China;
| | - Xuqing Liu
- Department of Materials, University of Manchester, Manchester M13 9PL, UK;
| | - Yu Shi
- School of Design, University of Leeds, Woodhouse, Leeds LS2 9JT, UK;
| | - Yu Jia
- School of Engineering and Applied Science, Aston University, Birmingham B4 7ET, UK;
| | - Sujun Guan
- Graduate School of Interdisciplinary New Science, Toyo University, 2100 Kujirai, Kawagoe 350-8585, Saitama, Japan; (S.G.); (T.H.); (T.M.)
| | - Tatsuro Hanajiri
- Graduate School of Interdisciplinary New Science, Toyo University, 2100 Kujirai, Kawagoe 350-8585, Saitama, Japan; (S.G.); (T.H.); (T.M.)
| | - Toru Maekawa
- Graduate School of Interdisciplinary New Science, Toyo University, 2100 Kujirai, Kawagoe 350-8585, Saitama, Japan; (S.G.); (T.H.); (T.M.)
| | - Akitoshi Okino
- School of Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Tokyo, Japan; (M.X.); (A.O.)
| | - Takanobu Watanabe
- Faculty of Science and Engineering, Waseda University, 3-4-1 Ookubo, Shinjuku-ku 169-8555, Tokyo, Japan; (Z.C.); (C.Z.); (T.W.)
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Liu S, Xu F, Zhou L, Cui H, Liu M, Wen M, Wang C, Wang W, Li S, Sun X. Hot-Pressing Deformation Yields Fine-Grained, Highly Dense and (002) Textured Ru Targets. MATERIALS (BASEL, SWITZERLAND) 2023; 16:6621. [PMID: 37895603 PMCID: PMC10608600 DOI: 10.3390/ma16206621] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/23/2023] [Revised: 10/02/2023] [Accepted: 10/09/2023] [Indexed: 10/29/2023]
Abstract
Ruthenium (Ru) is a refractory metal that has applications in the semiconductor industry as a sputtering target material. However, conventional powder metallurgy methods cannot produce dense and fine-grained Ru targets with preferred orientation. Here, we present a novel method of hot-pressing deformation to fabricate Ru targets with high relative density (98.8%), small grain size (~4.4 μm) and strong (002) texture. We demonstrate that applying pressures of 30-40 MPa at 1400 °C transforms cylindrical Ru samples into disk-shaped targets with nearly full densification in the central region. We also show that the hardness and the (002)/(101) peak intensity ratio of the targets increase with the pressure, indicating enhanced mechanical and crystallographic properties. Our study reveals the mechanisms of densification and texture formation of Ru targets by hot-pressing deformation.
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Affiliation(s)
- Shaohong Liu
- Key Laboratory for Anisotropy and Texture of Materials (Ministry of Education), School of Materials Science and Engineering, Northeastern University, Shenyang 110819, China
- State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Yunnan Precious Metals Laboratory Co., Ltd., Kunming 650106, China
| | - Fengshuo Xu
- Key Laboratory for Anisotropy and Texture of Materials (Ministry of Education), School of Materials Science and Engineering, Northeastern University, Shenyang 110819, China
| | - Limin Zhou
- State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Yunnan Precious Metals Laboratory Co., Ltd., Kunming 650106, China
| | - Hao Cui
- State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Yunnan Precious Metals Laboratory Co., Ltd., Kunming 650106, China
| | - Manmen Liu
- State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Yunnan Precious Metals Laboratory Co., Ltd., Kunming 650106, China
| | - Ming Wen
- State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Yunnan Precious Metals Laboratory Co., Ltd., Kunming 650106, China
| | - Chuanjun Wang
- State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Yunnan Precious Metals Laboratory Co., Ltd., Kunming 650106, China
| | - Wei Wang
- Key Laboratory for Anisotropy and Texture of Materials (Ministry of Education), School of Materials Science and Engineering, Northeastern University, Shenyang 110819, China
| | - Song Li
- Key Laboratory for Anisotropy and Texture of Materials (Ministry of Education), School of Materials Science and Engineering, Northeastern University, Shenyang 110819, China
| | - Xudong Sun
- Key Laboratory for Anisotropy and Texture of Materials (Ministry of Education), School of Materials Science and Engineering, Northeastern University, Shenyang 110819, China
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