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Whelan PR, De Fazio D, Pasternak I, Thomsen JD, Zelzer S, Mikkelsen MO, Booth TJ, Diekhöner L, Sassi U, Johnstone D, Midgley PA, Strupinski W, Jepsen PU, Ferrari AC, Bøggild P. Mapping nanoscale carrier confinement in polycrystalline graphene by terahertz spectroscopy. Sci Rep 2024; 14:3163. [PMID: 38326379 PMCID: PMC10850153 DOI: 10.1038/s41598-024-51548-z] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/15/2023] [Accepted: 01/06/2024] [Indexed: 02/09/2024] Open
Abstract
Terahertz time-domain spectroscopy (THz-TDS) can be used to map spatial variations in electrical properties such as sheet conductivity, carrier density, and carrier mobility in graphene. Here, we consider wafer-scale graphene grown on germanium by chemical vapor deposition with non-uniformities and small domains due to reconstructions of the substrate during growth. The THz conductivity spectrum matches the predictions of the phenomenological Drude-Smith model for conductors with non-isotropic scattering caused by backscattering from boundaries and line defects. We compare the charge carrier mean free path determined by THz-TDS with the average defect distance assessed by Raman spectroscopy, and the grain boundary dimensions as determined by transmission electron microscopy. The results indicate that even small angle orientation variations below 5° within graphene grains influence the scattering behavior, consistent with significant backscattering contributions from grain boundaries.
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Affiliation(s)
- Patrick R Whelan
- DTU Physics, Technical University of Denmark, Fysikvej, Bld. 309, 2800, Kongens Lyngby, Denmark
- Department of Materials and Production, Aalborg University, Skjernvej 4A, 9220, Aalborg, Denmark
| | - Domenico De Fazio
- Cambridge Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge, CB3 0FA, UK
- Department of Molecular Sciences and Nanosystems, Ca' Foscari University of Venice, 30172, Venice, Italy
| | - Iwona Pasternak
- Faculty of Physics, Warsaw University of Technology, Koszykowa 75, 00-662, Warsaw, Poland
- Vigo System S.A., 129/133 Poznanska Str, 05-850, Ozarow Mazowiecki, Poland
| | - Joachim D Thomsen
- DTU Physics, Technical University of Denmark, Fysikvej, Bld. 309, 2800, Kongens Lyngby, Denmark
| | - Steffen Zelzer
- Department of Materials and Production, Aalborg University, Skjernvej 4A, 9220, Aalborg, Denmark
| | - Martin O Mikkelsen
- Department of Materials and Production, Aalborg University, Skjernvej 4A, 9220, Aalborg, Denmark
| | - Timothy J Booth
- DTU Physics, Technical University of Denmark, Fysikvej, Bld. 309, 2800, Kongens Lyngby, Denmark
- Center for Nanostructured Graphene (CNG), Technical University of Denmark, Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
| | - Lars Diekhöner
- Department of Materials and Production, Aalborg University, Skjernvej 4A, 9220, Aalborg, Denmark
| | - Ugo Sassi
- Cambridge Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge, CB3 0FA, UK
| | - Duncan Johnstone
- Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge, CB3 0FS, UK
| | - Paul A Midgley
- Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge, CB3 0FS, UK
| | - Wlodek Strupinski
- Faculty of Physics, Warsaw University of Technology, Koszykowa 75, 00-662, Warsaw, Poland
- Vigo System S.A., 129/133 Poznanska Str, 05-850, Ozarow Mazowiecki, Poland
| | - Peter U Jepsen
- Center for Nanostructured Graphene (CNG), Technical University of Denmark, Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
- DTU Fotonik, Technical University of Denmark, Ørsteds Plads 343, 2800, Kongens Lyngby, Denmark
| | - Andrea C Ferrari
- Cambridge Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge, CB3 0FA, UK
| | - Peter Bøggild
- DTU Physics, Technical University of Denmark, Fysikvej, Bld. 309, 2800, Kongens Lyngby, Denmark.
- Center for Nanostructured Graphene (CNG), Technical University of Denmark, Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark.
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2
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Zhou B, Rasmussen M, Whelan PR, Ji J, Shivayogimath A, Bøggild P, Jepsen PU. Non-Linear Conductivity Response of Graphene on Thin-Film PET Characterized by Transmission and Reflection Air-Plasma THz-TDS. SENSORS (BASEL, SWITZERLAND) 2023; 23:3669. [PMID: 37050729 PMCID: PMC10099266 DOI: 10.3390/s23073669] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 03/02/2023] [Revised: 03/28/2023] [Accepted: 03/29/2023] [Indexed: 06/19/2023]
Abstract
We demonstrate that the conductivity of graphene on thin-film polymer substrates can be accurately determined by reflection-mode air-plasma-based THz time-domain spectroscopy (THz-TDS). The phase uncertainty issue associated with reflection measurements is discussed, and our implementation is validated by convincing agreement with graphene electrical properties extracted from more conventional transmission-mode measurements. Both the reflection and transmission THz-TDS measurements reveal strong non-linear and instantaneous conductivity depletion across an ultra-broad bandwidth (1-9 THz) under relatively high incident THz electrical field strengths (up to 1050 kV/cm).
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Affiliation(s)
- Binbin Zhou
- Department of Electrical and Photonics Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
| | - Mattias Rasmussen
- Department of Electrical and Photonics Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
| | | | - Jie Ji
- Department of Physics, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
| | - Abhay Shivayogimath
- Department of Physics, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
| | - Peter Bøggild
- Department of Physics, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
| | - Peter Uhd Jepsen
- Department of Electrical and Photonics Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
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3
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Mølvig BH, Bæk T, Ji J, Bøggild P, Lange SJ, Jepsen PU. Terahertz Cross-Correlation Spectroscopy and Imaging of Large-Area Graphene. SENSORS (BASEL, SWITZERLAND) 2023; 23:3297. [PMID: 36992008 PMCID: PMC10059862 DOI: 10.3390/s23063297] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/10/2023] [Revised: 03/08/2023] [Accepted: 03/16/2023] [Indexed: 06/19/2023]
Abstract
We demonstrate the use of a novel, integrated THz system to obtain time-domain signals for spectroscopy in the 0.1-1.4 THz range. The system employs THz generation in a photomixing antenna excited by a broadband amplified spontaneous emission (ASE) light source and THz detection with a photoconductive antenna by coherent cross-correlation sampling. We benchmark the performance of our system against a state-of-the-art femtosecond-based THz time-domain spectroscopy system in terms of mapping and imaging of the sheet conductivity of large-area graphene grown by chemical vapor deposition (CVD) and transferred to a PET polymer substrate. We propose to integrate the algorithm for the extraction of the sheet conductivity with the data acquisition, thereby enabling true in-line monitoring capability of the system for integration in graphene production facilities.
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Affiliation(s)
- Bjørn Hübschmann Mølvig
- Department of Electrical and Photonics Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
| | - Thorsten Bæk
- Department of Electrical and Photonics Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
- GLAZE Technologies Aps, 2950 Vedbæk, Denmark
| | - Jie Ji
- Department of Physics, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
| | - Peter Bøggild
- Department of Physics, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
| | - Simon Jappe Lange
- Department of Electrical and Photonics Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
- GLAZE Technologies Aps, 2950 Vedbæk, Denmark
| | - Peter Uhd Jepsen
- Department of Electrical and Photonics Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark
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4
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Chen Z, Xie C, Wang W, Zhao J, Liu B, Shan J, Wang X, Hong M, Lin L, Huang L, Lin X, Yang S, Gao X, Zhang Y, Gao P, Novoselov KS, Sun J, Liu Z. Direct growth of wafer-scale highly oriented graphene on sapphire. SCIENCE ADVANCES 2021; 7:eabk0115. [PMID: 34797705 PMCID: PMC8604399 DOI: 10.1126/sciadv.abk0115] [Citation(s) in RCA: 17] [Impact Index Per Article: 5.7] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/14/2023]
Abstract
Direct chemical vapor deposition (CVD) growth of wafer-scale high-quality graphene on dielectrics is of paramount importance for versatile applications. Nevertheless, the synthesized graphene is typically a polycrystalline film with high density of uncontrolled defects, resulting in a low carrier mobility and high sheet resistance. Here, we report the direct growth of highly oriented monolayer graphene films on sapphire wafers. Our growth strategy is achieved by designing an electromagnetic induction heating CVD operated at elevated temperature, where the high pyrolysis and migration barriers of carbon species are easily overcome. Meanwhile, the embryonic graphene domains are guided into good alignment by minimizing its configuration energy. The thus obtained graphene film accordingly manifests a markedly improved carrier mobility (~14,700 square centimeters per volt per second at 4 kelvin) and reduced sheet resistance (~587 ohms per square), which compare favorably with those from catalytic growth on polycrystalline metal foils and epitaxial growth on silicon carbide.
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Affiliation(s)
- Zhaolong Chen
- Center for Nanochemistry (CNC), Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
- Beijing Graphene Institute (BGI), Beijing 100095, China
- Institute for Functional Intelligent Materials, National University of Singapore, Singapore 117575, Singapore
| | - Chunyu Xie
- Center for Nanochemistry (CNC), Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China
| | - Wendong Wang
- School of Physics and Astronomy, University of Manchester, Manchester M13 9PL, UK
| | - Jinpei Zhao
- Department of Physics, National University of Singapore, Singapore 117551, Singapore
| | - Bingyao Liu
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China
- Electron Microscopy Laboratory and International Center for Quantum Materials, School of Physics, Peking University, Beijing 100871, China
| | - Jingyuan Shan
- Center for Nanochemistry (CNC), Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
- Beijing Graphene Institute (BGI), Beijing 100095, China
| | - Xueyan Wang
- Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
| | - Min Hong
- Center for Nanochemistry (CNC), Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China
| | - Li Lin
- Institute for Functional Intelligent Materials, National University of Singapore, Singapore 117575, Singapore
| | - Li Huang
- Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
| | - Xiao Lin
- Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
| | - Shenyuan Yang
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
- Corresponding author. (S.Y.); (Y.Z.); (P.G.); (K.S.N.); (J.S.); (Z.L.)
| | - Xuan Gao
- Beijing Graphene Institute (BGI), Beijing 100095, China
| | - Yanfeng Zhang
- Center for Nanochemistry (CNC), Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
- Beijing Graphene Institute (BGI), Beijing 100095, China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China
- Corresponding author. (S.Y.); (Y.Z.); (P.G.); (K.S.N.); (J.S.); (Z.L.)
| | - Peng Gao
- Beijing Graphene Institute (BGI), Beijing 100095, China
- Electron Microscopy Laboratory and International Center for Quantum Materials, School of Physics, Peking University, Beijing 100871, China
- Collaborative Innovation Center of Quantum Matter, Beijing 100871, China
- Interdisciplinary Institute of Light-Element Quantum Materials and Research Center for Light-Element Advanced Materials, Peking University, Beijing 100871,China
- Corresponding author. (S.Y.); (Y.Z.); (P.G.); (K.S.N.); (J.S.); (Z.L.)
| | - Kostya S. Novoselov
- Institute for Functional Intelligent Materials, National University of Singapore, Singapore 117575, Singapore
- Chongqing 2D Materials Institute, Liangjiang New Area, Chongqing 400714, China
- Corresponding author. (S.Y.); (Y.Z.); (P.G.); (K.S.N.); (J.S.); (Z.L.)
| | - Jingyu Sun
- Beijing Graphene Institute (BGI), Beijing 100095, China
- College of Energy, Soochow Institute for Energy and Materials Innovations (SIEMIS), Key Laboratory of Advanced Carbon Materials and Wearable Energy Technologies of Jiangsu Province, Soochow University, Suzhou 215006, China
- Corresponding author. (S.Y.); (Y.Z.); (P.G.); (K.S.N.); (J.S.); (Z.L.)
| | - Zhongfan Liu
- Center for Nanochemistry (CNC), Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
- Beijing Graphene Institute (BGI), Beijing 100095, China
- Corresponding author. (S.Y.); (Y.Z.); (P.G.); (K.S.N.); (J.S.); (Z.L.)
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Whelan PR, Shen Q, Luo D, Wang M, Ruoff RS, Jepsen PU, Bøggild P, Zhou B. Reference-free THz-TDS conductivity analysis of thin conducting films. OPTICS EXPRESS 2020; 28:28819-28830. [PMID: 33114792 DOI: 10.1364/oe.402447] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/09/2020] [Accepted: 09/01/2020] [Indexed: 06/11/2023]
Abstract
We present a reference-free method to determine electrical parameters of thin conducting films by steady state transmission-mode terahertz time-domain spectroscopy (THz-TDS). We demonstrate that the frequency-dependent AC conductivity of graphene can be acquired by comparing the directly transmitted THz pulse with a transient internal reflection within the substrate which avoids the need for a standard reference scan. The DC sheet conductivity, scattering time, carrier density, mobility, and Fermi velocity of graphene are retrieved subsequently by fitting the AC conductivity with the Drude model. This reference-free method was investigated with two complementary THz setups: one commercial fibre-coupled THz spectrometer with fast scanning rate (0.2-1.5 THz) and one air-plasma based ultra-broadband THz spectrometer for greatly extended frequency range (2-10 THz). Certain propagation correction terms for more accurate retrieval of electrical parameters are discussed.
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6
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Mackenzie DMA, Kalhauge KG, Whelan PR, Østergaard FW, Pasternak I, Strupinski W, Bøggild P, Jepsen PU, Petersen DH. Wafer-scale graphene quality assessment using micro four-point probe mapping. NANOTECHNOLOGY 2020; 31:225709. [PMID: 32167935 DOI: 10.1088/1361-6528/ab7677] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Micro four-point probes (M4PP) provide rapid and automated lithography-free transport properties of planar surfaces including two-dimensional materials. We perform sheet conductance wafer maps of graphene directly grown on a 100 mm diameter SiC wafer using a multiplexed seven-point probe with minor additional measurement time compared to a four-point probe. Comparing the results of three subprobes we find that compared to a single-probe result, our measurement yield increases from 72%-84% to 97%. The additional data allows for correlation analysis between adjacent subprobes, that must measure the same values in case the sample is uniform on the scale of the electrode pitch. We observe that the relative difference in measured sheet conductance between two adjacent subprobes increase in the transition between large and low conductance regions. We mapped sheet conductance of graphene as it changed over several weeks. Terahertz time-domain spectroscopy conductivity maps both before and after M4PP mapping showed no significant change due to M4PP measurement, with both methods showing the same qualitative changes over time.
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Affiliation(s)
- David M A Mackenzie
- Center for Nanostructured Graphene (CNG), Technical University of Denmark, DK-2800, Kgs. Lyngby, Denmark. Department of Electronics and Nanoengineering, Aalto University, PO Box 13500, FI-00076 Aalto, Finland
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7
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Towards standardisation of contact and contactless electrical measurements of CVD graphene at the macro-, micro- and nano-scale. Sci Rep 2020; 10:3223. [PMID: 32081982 PMCID: PMC7035257 DOI: 10.1038/s41598-020-59851-1] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/01/2019] [Accepted: 12/05/2019] [Indexed: 11/16/2022] Open
Abstract
Graphene has become the focus of extensive research efforts and it can now be produced in wafer-scale. For the development of next generation graphene-based electronic components, electrical characterization of graphene is imperative and requires the measurement of work function, sheet resistance, carrier concentration and mobility in both macro-, micro- and nano-scale. Moreover, commercial applications of graphene require fast and large-area mapping of electrical properties, rather than obtaining a single point value, which should be ideally achieved by a contactless measurement technique. We demonstrate a comprehensive methodology for measurements of the electrical properties of graphene that ranges from nano- to macro- scales, while balancing the acquisition time and maintaining the robust quality control and reproducibility between contact and contactless methods. The electrical characterisation is achieved by using a combination of techniques, including magneto-transport in the van der Pauw geometry, THz time-domain spectroscopy mapping and calibrated Kelvin probe force microscopy. The results exhibit excellent agreement between the different techniques. Moreover, we highlight the need for standardized electrical measurements in highly controlled environmental conditions and the application of appropriate weighting functions.
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Mishra N, Forti S, Fabbri F, Martini L, McAleese C, Conran BR, Whelan PR, Shivayogimath A, Jessen BS, Buß L, Falta J, Aliaj I, Roddaro S, Flege JI, Bøggild P, Teo KBK, Coletti C. Wafer-Scale Synthesis of Graphene on Sapphire: Toward Fab-Compatible Graphene. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2019; 15:e1904906. [PMID: 31668009 DOI: 10.1002/smll.201904906] [Citation(s) in RCA: 30] [Impact Index Per Article: 6.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/29/2019] [Indexed: 05/26/2023]
Abstract
The adoption of graphene in electronics, optoelectronics, and photonics is hindered by the difficulty in obtaining high-quality material on technologically relevant substrates, over wafer-scale sizes, and with metal contamination levels compatible with industrial requirements. To date, the direct growth of graphene on insulating substrates has proved to be challenging, usually requiring metal-catalysts or yielding defective graphene. In this work, a metal-free approach implemented in commercially available reactors to obtain high-quality monolayer graphene on c-plane sapphire substrates via chemical vapor deposition is demonstrated. Low energy electron diffraction, low energy electron microscopy, and scanning tunneling microscopy measurements identify the Al-rich reconstruction 31 × 31 R ± 9 ° of sapphire to be crucial for obtaining epitaxial graphene. Raman spectroscopy and electrical transport measurements reveal high-quality graphene with mobilities consistently above 2000 cm2 V-1 s-1 . The process is scaled up to 4 and 6 in. wafers sizes and metal contamination levels are retrieved to be within the limits for back-end-of-line integration. The growth process introduced here establishes a method for the synthesis of wafer-scale graphene films on a technologically viable basis.
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Affiliation(s)
- Neeraj Mishra
- Center for Nanotechnology Innovation @ NEST, Istituto Italiano di Tecnologia, Piazza San Silvestro 12, 56127, Pisa, Italy
- Graphene Labs, Istituto Italiano di Tecnologia, Via Morego 30, 16163, Genova, Italy
| | - Stiven Forti
- Center for Nanotechnology Innovation @ NEST, Istituto Italiano di Tecnologia, Piazza San Silvestro 12, 56127, Pisa, Italy
| | - Filippo Fabbri
- Center for Nanotechnology Innovation @ NEST, Istituto Italiano di Tecnologia, Piazza San Silvestro 12, 56127, Pisa, Italy
- Graphene Labs, Istituto Italiano di Tecnologia, Via Morego 30, 16163, Genova, Italy
| | - Leonardo Martini
- Center for Nanotechnology Innovation @ NEST, Istituto Italiano di Tecnologia, Piazza San Silvestro 12, 56127, Pisa, Italy
| | - Clifford McAleese
- AIXTRON Ltd., Buckingway Business Park, Anderson Rd, Swavesey, Cambridge, CB24 4FQ, UK
| | - Ben R Conran
- AIXTRON Ltd., Buckingway Business Park, Anderson Rd, Swavesey, Cambridge, CB24 4FQ, UK
| | - Patrick R Whelan
- DTU Physics, Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
- Center for Nanostructured Graphene (CNG), Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
| | - Abhay Shivayogimath
- DTU Physics, Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
- Center for Nanostructured Graphene (CNG), Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
| | - Bjarke S Jessen
- DTU Physics, Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
- Center for Nanostructured Graphene (CNG), Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
| | - Lars Buß
- Institute of Solid State Physics, University of Bremen, Bremen, 28334, Germany
| | - Jens Falta
- Institute of Solid State Physics, University of Bremen, Bremen, 28334, Germany
| | - Ilirjan Aliaj
- NEST, Scuola Normale Superiore and Istituto Nanoscienze-CNR, Piazza S. Silvestro 12, 56127, Pisa, Italy
| | - Stefano Roddaro
- NEST, Scuola Normale Superiore and Istituto Nanoscienze-CNR, Piazza S. Silvestro 12, 56127, Pisa, Italy
- Dipartimento di Fisica, Università di Pisa, Largo B. Pontecorvo 3, 56127, Pisa, Italy
| | - Jan I Flege
- Institute of Solid State Physics, University of Bremen, Bremen, 28334, Germany
- Brandenburg University of Technology Cottbus-Senftenberg, Chair of Applied Physics and Semiconductor Spectroscopy, Konrad-Zuse-Str. 1, 03046, Cottbus, Germany
| | - Peter Bøggild
- DTU Physics, Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
- Center for Nanostructured Graphene (CNG), Ørsteds Plads 345C, 2800, Kongens Lyngby, Denmark
| | - Kenneth B K Teo
- AIXTRON Ltd., Buckingway Business Park, Anderson Rd, Swavesey, Cambridge, CB24 4FQ, UK
| | - Camilla Coletti
- Center for Nanotechnology Innovation @ NEST, Istituto Italiano di Tecnologia, Piazza San Silvestro 12, 56127, Pisa, Italy
- Graphene Labs, Istituto Italiano di Tecnologia, Via Morego 30, 16163, Genova, Italy
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