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Lee U, Kim H, Oh DK, Lee N, Park J, Park J, Son H, Noh H, Rho J, Ok JG. Azimuthal rotation-controlled nanoinscribing for continuous patterning of period- and shape-tunable asymmetric nanogratings. MICROSYSTEMS & NANOENGINEERING 2024; 10:60. [PMID: 38736716 PMCID: PMC11088629 DOI: 10.1038/s41378-024-00687-4] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 08/07/2023] [Revised: 01/05/2024] [Accepted: 02/01/2024] [Indexed: 05/14/2024]
Abstract
We present an azimuthal-rotation-controlled dynamic nanoinscribing (ARC-DNI) process for continuous and scalable fabrication of asymmetric nanograting structures with tunable periods and shape profiles. A sliced edge of a nanograting mold, which typically has a rectangular grating profile, slides over a polymeric substrate to induce its burr-free plastic deformation into a linear nanopattern. During this continuous nanoinscribing process, the "azimuthal angle," that is, the angle between the moving direction of the polymeric substrate and the mold's grating line orientation, can be controlled to tailor the period, geometrical shape, and profile of the inscribed nanopatterns. By modulating the azimuthal angle, along with other important ARC-DNI parameters such as temperature, force, and inscribing speed, we demonstrate that the mold-opening profile and temperature- and time-dependent viscoelastic polymer reflow can be controlled to fabricate asymmetric, blazed, and slanted nanogratings that have diverse geometrical profiles such as trapezoidal, triangular, and parallelogrammatic. Finally, period- and profile-tunable ARC-DNI can be utilized for the practical fabrication of diverse optical devices, as is exemplified by asymmetric diffractive optical elements in this study.
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Affiliation(s)
- Useung Lee
- Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 01811 Republic of Korea
- Present Address: Department of Mechanical Engineering, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul, 02841 Republic of Korea
| | - Hyein Kim
- Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 01811 Republic of Korea
| | - Dong Kyo Oh
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673 Republic of Korea
| | - Nayeong Lee
- Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 01811 Republic of Korea
| | - Jonggab Park
- Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 01811 Republic of Korea
| | - Jaewon Park
- Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 01811 Republic of Korea
| | - Hyunji Son
- Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 01811 Republic of Korea
| | - Hyunchan Noh
- Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 01811 Republic of Korea
- Present Address: Research Team, Hyundai Motor Group, 150 Hyundaiyeonguso-ro, Hwaseong-si, Gyeonggi 18280 Republic of Korea
| | - Junsuk Rho
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673 Republic of Korea
- Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673 Republic of Korea
- POSCO-POSTECH-RIST Convergence Research Center for Flat Optics and Metaphotonics, Pohang, 37673 Republic of Korea
- National Institute of Nanomaterials Technology (NINT), Pohang, 37673 Republic of Korea
| | - Jong G. Ok
- Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 01811 Republic of Korea
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Kim G, Kim S, Kim H, Lee J, Badloe T, Rho J. Metasurface-empowered spectral and spatial light modulation for disruptive holographic displays. NANOSCALE 2022; 14:4380-4410. [PMID: 35266481 DOI: 10.1039/d1nr07909c] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
The holographic display, one of the most realistic ways to reconstruct optical images in three-dimensional (3D) space, has gained a lot of attention as a next-generation display platform for providing deeper immersive experiences to users. So far, diffractive optical elements (DOEs) and spatial light modulators (SLMs) have been used to generate holographic images by modulating electromagnetic waves at each pixel. However, such architectures suffer from limitations in terms of having a resolution of only a few microns and the bulkiness of the entire optical system. In this review, we describe novel metasurfaces-based nanophotonic platforms that have shown exceptional control of electromagnetic waves at the subwavelength scale as promising candidates to overcome existing restrictions, while realizing flat optical devices. After introducing the fundamentals of metasurfaces in terms of spatial and spectral wavefront modulation, we present a variety of multiplexing approaches for high-capacity and full-color metaholograms exploiting the multiple properties of light as an information carrier. We then review tunable metaholograms using active materials modulated by several external stimuli. Afterward, we discuss the integration of metasurfaces with other optical elements required for future 3D display platforms in augmented/virtual reality (AR/VR) displays such as lenses, beam splitters, diffusers, and eye-tracking sensors. Finally, we address the challenges of conventional nanofabrication methods and introduce scalable preparation techniques that can be applied to metasurface-based nanophotonic technologies towards commercially and ergonomically viable future holographic displays.
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Affiliation(s)
- Gyeongtae Kim
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
| | - Seokwoo Kim
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
| | - Hongyoon Kim
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
| | - Jihae Lee
- Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| | - Trevon Badloe
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
| | - Junsuk Rho
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
- Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
- POSCO-POSTECH-RIST Convergence Research Center for Flat Optics and Metaphotonics, Pohang 37673, Republic of Korea
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Hwang J, Park H, Lee J, Kang DJ. Parametric scheme for rapid nanopattern replication via electrohydrodynamic instability. RSC Adv 2021; 11:18152-18161. [PMID: 35480914 PMCID: PMC9033445 DOI: 10.1039/d1ra01728d] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/04/2021] [Accepted: 05/10/2021] [Indexed: 11/21/2022] Open
Abstract
Electrohydrodynamic (EHD) instability patterning exhibits substantial potential for application as a next-generation lithographic technique; nevertheless, its development continues to be hindered by the lack of process parameter controllability, especially when replicating sub-microscale pattern features. In this paper, a new parametric guide is introduced. It features an expanded range of valid parameters by increasing the pattern growth velocity, thereby facilitating reproducible EHD-driven patterning for perfect nanopattern replication. Compared with conventional EHD-driven patterning, the rapid patterning approach not only shortens the patterning time but also exhibits enhanced scalability for replicating small and geometrically diverse features. Numerical analyses and simulations are performed to elucidate the interplay between the pattern growth velocity, fidelity of the replicated features, and boundary between the domains of suitable and unsuitable parametric conditions in EHD-driven patterning. The developed rapid route facilitates nanopattern replication using EHD instability with a wide range of suitable parameters and further opens up many opportunities for device applications using tailor-made nanostructures in an effective and straightforward manner. 1/τm-dependent electrohydrodynamic replication of a hexagonally ordered hole array nanopattern by adjusting the filling ratio. As the 1/τm increases, the morphology evolves into the perfectly replicated hole features with increasing filling ratio.![]()
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Affiliation(s)
- Jaeseok Hwang
- Department of Energy Science
- Sungkyunkwan University
- Suwon
- Republic of Korea
| | - Hyunje Park
- Department of Physics
- Sungkyunkwan University
- Suwon
- Republic of Korea
| | - Jaejong Lee
- Korea Institute of Machinery and Materials (KIMM)
- Daejeon 34103
- Republic of Korea
| | - Dae Joon Kang
- Department of Physics
- Sungkyunkwan University
- Suwon
- Republic of Korea
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