Controlled Nanoscale Electrohydrodynamic Patterning Using Mesopatterned Template

Pattern formation in thin polymeric films via electrohydrodynamic patterning

The free surface of a thin polymeric film is often unstable and deforms into various micro-/nano-patterns under an externally applied electric field. This paper reviews a recent patterning technique, electrohydrodynamic patterning (EHDP), a straightforward, cost-effective and contactless bottom-up method. The theoretical and numerical studies of EHDP are shown. How the characteristic wavelength and the characteristic time depend on both the external conditions (such as voltage, film thickness, template-substrate spacing) and the initial polymer properties (such as rheological property, electrical property and surface tension) is theoretically and experimentally discussed. Various possible strategies for fabricating high-aspect-ratio or hierarchical patterns are theoretically and experimentally reviewed. Aligning and ordering of the anisotropic polymers by EHDP is emphasized. A perspective, including novelty and limitations of the methods, particularly in comparison to some conventional patterning techniques, and a possible future direction of research, is presented.

Parametric scheme for rapid nanopattern replication via electrohydrodynamic instability

Electrohydrodynamic (EHD) instability patterning exhibits substantial potential for application as a next-generation lithographic technique; nevertheless, its development continues to be hindered by the lack of process parameter controllability, especially when replicating sub-microscale pattern features. In this paper, a new parametric guide is introduced. It features an expanded range of valid parameters by increasing the pattern growth velocity, thereby facilitating reproducible EHD-driven patterning for perfect nanopattern replication. Compared with conventional EHD-driven patterning, the rapid patterning approach not only shortens the patterning time but also exhibits enhanced scalability for replicating small and geometrically diverse features. Numerical analyses and simulations are performed to elucidate the interplay between the pattern growth velocity, fidelity of the replicated features, and boundary between the domains of suitable and unsuitable parametric conditions in EHD-driven patterning. The developed rapid route facilitates nanopattern replication using EHD instability with a wide range of suitable parameters and further opens up many opportunities for device applications using tailor-made nanostructures in an effective and straightforward manner.

1/τ_m-dependent electrohydrodynamic replication of a hexagonally ordered hole array nanopattern by adjusting the filling ratio. As the 1/τ_m increases, the morphology evolves into the perfectly replicated hole features with increasing filling ratio.

Reversible morphological switching and deformation hysteresis in electric field mediated instability of thin elastic films

Reversible morphology switching in a soft elastic film sandwiched between two parallel electrodes when subject to an externally applied electric field is reported herein. In contrast to electric field mediated instability of a thin liquid film, where the instability patterns remain permanent, in the present case the patterns debond completely or partially when the electric field is switched off, depending on whether the gap spacing (dG) between the film and the top electrode is >100 nm or not. The onset of instability is marked with the appearance of isotropic columns when the applied field strength (U) exceeds a critical value (Uc). The subsequent increase in U leads to the gradual transition of the instability patterns from pillars to bi-continuous labyrinths to an array of holes. Complete conformal contact is established between the film and the top electrode at U = UF. When U is reduced, the morphology changes in a reverse sequence. There is a significant level of hysteresis between the bonding and debonding stages, including persistence of the features at much lower voltages due to pinning of the patterns to the top electrode. Complete detachment occurs at a lower voltage UD when dG > 100 nm. The holes fluctuate before complete contact between the film and the top electrode due to competition between the destabilizing electric field and restoring forces due to stretching of the crosslinked polymer matrix.