Chemisorption Studies of CH3S on Ni(111)

First-principles investigation of methanethiol adsorption and dissociation mechanisms on the high-Miller-index vicinal surface Cu(4 1 0)

In this work, we present detailed investigations of methanethiol adsorption on a Cu(4 1 0) surface within the framework of the self-consistent first-principles calculations as implemented in the Vienna ab initio simulation package (VASP). In particular, the adsorption sites, the surface coverage rate and electronic properties have been determined and compared to experimental values. The results indicate that the favorable adsorption site in the case of low coverage rate is a bridge on the step followed by the hollow site on the terrace. The adsorption significantly affects the outermost layer of the surface mainly for a higher coverage rate in a (2 × 2) supercell. The nature of the chemisorption process on the surface is analyzed by means of the density of states which, combined with charge density difference and atomic charge calculations, confirms the ionic character of the S-Cu bond. The specific effect of the presence of steps is highlighted by comparing the adsorption on the (1 0 0) terrace to the adsorption on the extended Cu(1 0 0) surface. Compared to the flat Cu(1 0 0), it is found here that while the stability is almost the same at p(2 × 2) coverage, the CH3S/Cu(4 1 0) becomes more stable than CH3S/Cu(1 0 0) at c(2 × 2) coverage with 0.30 eV per molecule. The mechanism of methanethiol dissociation is explored by the nudged elastic band method and demonstrates that the most favorable path is dissociation followed by migration of hydrogen from the step to its most stable position (hollow on the terrace) with energy barriers less than 0.5 eV.

A density functional study of the adsorption of methane-thiol on the (111) surfaces of the Ni-group metals: I. Molecular and dissociative adsorption

The molecular and dissociative adsorption of methane-thiol (CH(3)SH) in the high-coverage limit on the (111) surfaces of the Ni-group metals has been investigated using ab initio density functional techniques. In molecular form, methane-thiol is bound to the surface only by weak polarization-induced forces in a slightly asymmetric configuration with the C-S axis tilted by 35-60° relative to the surface normal. On Ni and Pd surfaces the S atom occupies a position close to a bridge site; on Pt it is located close to an on-top position. The length of the S-H bond is only slightly stretched relative to its value in the gas phase, indicating only a very modest degree of activation for dehydrogenation. A strong covalent adsorbate/substrate bond is formed upon adsorption of a methane-thiolate (CH(3)S) radical. On Ni(111) in the energetically most favorable configuration the S atom occupies a position in a threefold hollow, slightly displaced towards a bridge site. The C-S axis is tilted by about 35° across the bridge. On Pd(111) and Pt(111) the S atom of thiolate occupies a position between a hollow and a bridge site, with the C-S axis tilted even more strongly across a neighboring threefold hollow. On all three surfaces our calculations demonstrate the existence of multiple metastable adsorption configurations, including upright CH(3)S bound in the center of a threefold hollow as reported in some earlier studies. Dehydrogenation of the adsorbed methane-thiol to form co-adsorbed methane-thiolate and atomic hydrogen is an exothermic process, which is not activated on Ni(111) but activated on Pd(111) and Pt(111).

Alkanethiol headgroup on metal (111)-surfaces: general features of the adsorption onto group 10 and 11 transition metals

Using first-principles density-functional calculations, we studied the adsorption of methylthiolate (CH(3)S) on (111)-surfaces of the transition metals belonging to group 10 (Ni, Pd, and Pt), and two group 11 metals, Ag and Au. By making a systematic comparison between the different metals, we identify general adsorption properties and clarify them in terms of the interplay between energies, structures and electronic details. On the basis of electron density arguments, we suggest an explanation for the preference of the face-centred cubic (fcc) above the hexagonal close-packed (hcp) hollow site for the adsorption onto (111) metal surfaces. In nanotechnological applications, our analysis may serve to rationalize the optimal choice of the substrate when a given property is required.

Electrochemical Self-Assembly of Alkanethiolate Molecules on Ni(111) and Polycrystalline Ni Surfaces

In this work, the electrochemical formation of alkanethiolate self-assembled monolayers (SAMs) on Ni(111) and polycrystalline Ni surfaces from alkanethiol-containing aqueous 1 M NaOH solutions was studied by combining Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), electrochemical techniques, and density functional theory (DFT) calculations. Results show that alkanethiolates adsorb on Ni concurrent with NiO electroreduction. The resulting surface coverage depends on the applied potential and hydrocarbon chain length. Electrochemical and XPS data reveal that alkanethiolate electroadsorption at room temperature takes place without S-C bond scission, in contrast to previous results from gas-phase adsorption. A complete and dense monolayer, which is stable even at very high cathodic potentials (-1.5 V vs SCE), is formed for dodecanethiol. DFT calculations show that the greater stability against electrodesorption found for alkanethiolate SAMs on Ni, with respect to SAMs on Au, is somewhat related to the larger alkanethiolate adsorption energy but is mainly due to the larger barrier to interfacial electron transfer present in alkanethiolate-covered Ni. A direct consequence of this work is the possibility of using electrochemical self-assembly as a straightforward route to build stable SAMs of long-chained alkanethiolates on Ni surfaces at room temperature.

Models for the treatment of crystalline solids and surfaces

Crystalline solids and surfaces have become a subject of growing interest. The difficulty of a comprehensive description of a variety of phenomena by a single method has led to the development of many models. These models can be classified as nonperiodic and periodic models. The former include free clusters, saturated clusters, and embedded clusters. The latter two models serve to remove the boundary effects of the free clusters. No perfect avoidance of such effects can be achieved in this way. The cyclic cluster model overcomes this difficulty in a natural way. It is periodic with a finite periodicity. An embedding can take into account a long-range effect in ionic crystals. Previous periodic approaches relied on the large unit cell model, which is related to the supercell approach. For perfect crystals the conventional unit cell approach is a well-known standard. However, its disadvantage is the unphysical periodicity of defects, which is avoided in the cyclic cluster model. The present article presents a description of these models together with selective applications to solid-state systems and surfaces.

Reflection absorption infrared spectroscopy and the structure of molecular adsorbates on metal surfaces

Infrared (IR) spectroscopy is widely used to identify molecular adsorbates that form on metals in the course of surface chemical reactions. Because IR spectroscopy is one of the few surface-sensitive probes that provide molecule-specific information without perturbing the chemisorbed state, there is great interest in extracting as much structural information from the spectra as possible. The various ways IR spectroscopy is used to determine the structure of molecular adsorbates, from strictly qualitative interpretations based on symmetry selection rules to the use of ab initio electronic structure calculations to predict the IR spectrum of a chemisorbed molecule, are reviewed.