Tribochemical Reaction Dynamics of Phosphoric Ester Lubricant Additive by Using a Hybrid Tight-Binding Quantum Chemical Molecular Dynamics Method

Accurate Simulation for 2D Lubricating Materials in Realistic Environments: From Classical to Quantum Mechanical Methods

2D materials such as graphene, MoS2, and hexagonal BN are the most advanced solid lubricating materials with superior friction and anti-wear performance. However, as a typical surface phenomenon, the lubricating properties of 2D materials are largely dependent on the surrounding environment, such as temperature, stress, humidity, oxygen, and other environmental substances. Given the technical challenges in experiment for real-time and in situ detection of microscopic environment-material interaction, recent years have witnessed the acceleration of computational research on the lubrication behavior of 2D materials in realistic environments. This study reviews the up-to-date computational studies for the effect of environmental factors on the lubrication performance of 2D materials, summarizes the theoretical methods in lubrication from classical to quantum-mechanics ones, and emphasizes the importance of quantum method in revealing the lubrication mechanism at atomic and electronic level. An effective simulation method based on ab initio molecular dynamics is also proposed to try to provide more ways to accurately reveal the friction mechanisms and reliably guide the lubricating material design. On the basis of current development, future prospects, and challenges for the simulation and modeling in lubrication with realistic environment are outlined.

Effects of surface chemistry on the mechanochemical decomposition of tricresyl phosphate

The growth of protective tribofilms from lubricant antiwear additives on rubbing surfaces is initiated by mechanochemically promoted dissociation reactions. These processes are not well understood at the molecular scale for many important additives, such as tricresyl phosphate (TCP). One aspect that needs further clarification is the extent to which the surface properties affect the mechanochemical decomposition. Here, we use nonequilibrium molecular dynamics (NEMD) simulations with a reactive force field (ReaxFF) to study the decomposition of TCP molecules confined and pressurised between sliding ferrous surfaces at a range of temperatures. We compare the decomposition of TCP on native iron, iron carbide, and iron oxide surfaces. We show that the decomposition rate of TCP molecules on all the surfaces increases exponentially with temperature and shear stress, implying that this is a stress-augmented thermally activated (SATA) process. The presence of base oil molecules in the NEMD simulations decreases the shear stress, which in turn reduces the rate constant for TCP decomposition. The decomposition is much faster on iron surfaces than iron carbide, and particularly iron oxide. The activation energy, activation volume, and pre-exponential factor from the Bell model are similar on iron and iron carbide surfaces, but significantly differ for iron oxide surfaces. These findings provide new insights into the mechanochemical decomposition of TCP and have important implications for the design of novel lubricant additives for use in high-temperature and high-pressure environments.

Mechanochemistry of phosphate esters confined between sliding iron surfaces

The molecular structure of lubricant additives controls not only their adsorption and dissociation behaviour at the nanoscale, but also their ability to reduce friction and wear at the macroscale. Here, we show using nonequilibrium molecular dynamics simulations with a reactive force field that tri(s-butyl)phosphate dissociates much faster than tri(n-butyl)phosphate when heated and compressed between sliding iron surfaces. For both molecules, dissociative chemisorption proceeds through cleavage of carbon-oxygen bonds. The dissociation rate increases exponentially with temperature and stress. When the rate-temperature-stress data are fitted with the Bell model, both molecules have similar activation energies and activation volumes and the higher reactivity of tri(s-butyl)phosphate is due to a larger pre-exponential factor. These observations are consistent with experiments using the antiwear additive zinc dialkyldithiophosphate. This study represents a crucial step towards the virtual screening of lubricant additives with different substituents to optimise tribological performance.

Role of OH Termination in Mitigating Friction of Diamond-like Carbon under High Load: A Joint Simulation and Experimental Study

Diamond-like carbon (DLC) has recently attracted much attention as a promising solid-state lubricant because it exhibits low friction, low abrasion, and high wear resistance. Although we previously reported the reason why H-terminated DLC exhibits low friction based on a tight-binding quantum chemical molecular dynamics (TB-QCMD) simulation, experimentally, the low-friction state of H-terminated DLC is not stable, limiting its application. In the present work, our TB-QCMD simulations suggest that H/OH-terminated DLC could give low friction even under high loads, whereas H-terminated DLC could not. By using gas-phase friction experiments, we confirm that OH termination can indeed provide much more stable lubricity than H termination, validating the predictions from simulations. We conclude that H/OH-terminated DLC is a new low-friction material with high load capacity and high stable lubricity that may be suitable for practical use in industrial applications.

Cooperative roles of chemical reactions and mechanical friction in chemical mechanical polishing of gallium nitride assisted by OH radicals: tight-binding quantum chemical molecular dynamics simulations

Chemical mechanical polishing (CMP) of Ga-face GaN is accelerated by the chemical reactions with OH radicals.

Effect of Ambient Chemistry on Friction at the Basal Plane of Graphite

Graphite is widely used as a solid lubricant due to its layered structure, which enables ultralow friction. However, the lubricity of graphite is affected by ambient conditions and previous studies have shown a sharp contrast between frictional behavior in vacuum or dry environments compared to humid air. Here, we studied the effect of organic gaseous species in the environment, specifically comparing the adsorption of phenol and pentanol vapor. Atomic force microscopy experiments and reactive molecular dynamics simulations showed that friction was larger with phenol than with pentanol. The simulation results were analyzed to test multiple hypotheses to explain the friction difference, and it was found that mechanically driven chemical bonding between the tip and phenol molecules plays a critical role. Bonding increases the number of phenol molecules in the contact, which increases the adhesion as well as the number of atoms in registry with the topmost graphene layer acting as a pinning site to resist sliding. The findings of this research provide insight into how the chemistry of the operating environment can affect the frictional behavior of graphite and layered materials more generally.

Depolymerization of sodium polyphosphates on an iron oxide surface at high temperature

Density functional theory (DFT) and first principles molecular dynamics (FPMD) studies of pyrophosphate cluster Na₄P₂O₇ and triphosphate cluster Na₅P₃O₁₀ absorbed and decomposed on an Fe₂O₃(0001) surface have been conducted. Comparative analyses of the structure properties and adsorption processes during the simulation at elevated temperature have been carried out. The results depict the key interactions including the covalent P-O bonds, pure ionic Na-O or Fe-O interactions. The iron oxide surface plays an important role in the bridging bond decomposition scheme which can both promote and suppress phosphate depolymerization. It is found that the chain length of polyphosphates does not have considerable effects on the decomposition of phosphate clusters. This study provides detailed insights into the interaction of a phosphate cluster on an iron oxide surface at high temperature, and in particular the depolymerization/polymerization of an inorganic phosphate glass lubricant, which has an important behavior under hot metal forming conditions.

Tribo-induced photoluminescent behavior of graphene and YSZ:Er/graphene composite films

In the present work, a novel method was developed to study the evolving surface state of graphene film as it is subject to friction, characterized by photoluminescence properties. We prepared the graphene film (GF) and YSZ:Er (Er3+-Y3+ co-doped ZrO2)/graphene composite films (ZGCF). The Raman spectra and photoluminescence properties of the GF and ZGCF were characterized before and after the sliding friction. A remarkable phenomenon was observed that after friction the GF generated a more pronounced luminescence response than it had prior, apparently due to graphene quantum dots which were found in the wear debris of the GF. Furthermore, the introduction of graphene into YSZ:Er nanoparticles (NPs) resulted in an unmistakable red-shift on the main luminescence bands of ZGCF after the applied friction. This is explained by the formation of considerable graphene scrolls in the wear debris of ZGCF due to the interaction of the graphene and the YSZ:Er NPs. It can be concluded that changes to the configuration of graphene greatly influence the tribo-induced photoluminescence response. Our findings justify further investigation into the composition and morphology of worn surfaces in order to better understand how photoluminescence relates to frictional effects. In addition, this work proposes the in situ fabrication of graphene quantum dots and nanoscale scrolls as a new potential application of the tribo-induced photoluminescence study.

Atomistic Mechanisms of Chemical Mechanical Polishing of a Cu Surface in Aqueous H2O2: Tight-Binding Quantum Chemical Molecular Dynamics Simulations

We applied our original chemical mechanical polishing (CMP) simulator based on the tight-binding quantum chemical molecular dynamics (TB-QCMD) method to clarify the atomistic mechanism of CMP processes on a Cu(111) surface polished with a SiO2 abrasive grain in aqueous H2O2. We reveal that the oxidation of the Cu(111) surface mechanically induced at the friction interface is a key process in CMP. In aqueous H2O2, in the first step, OH groups and O atoms adsorbed on a nascent Cu surface are generated by the chemical reactions of H2O2 molecules. In the second step, at the friction interface between the Cu surface and the abrasive grain, the surface-adsorbed O atom intrudes into the Cu bulk and dissociates the Cu-Cu bonds. The dissociation of the Cu-Cu back-bonds raises a Cu atom from the surface that is mechanically sheared by the abrasive grain. In the third step, the raised Cu atom bound to the surface-adsorbed OH groups is removed from the surface by the generation and desorption of a Cu(OH)2 molecule. In contrast, in pure water, there are no geometrical changes in the Cu surface because the H2O molecules do not react with the Cu surface, and the abrasive grain slides smoothly on the planar Cu surface. The comparison between the CMP simulations in aqueous H2O2 and pure water indicates that the intrusion of a surface-adsorbed O atom into the Cu bulk is the most important process for the efficient polishing of the Cu surface because it induces the dissociation of the Cu-Cu bonds and generates raised Cu atoms that are sheared off by the abrasive grain. Furthermore, density functional theory calculations show that the intrusion of the surface-adsorbed O atoms into the Cu bulk has a high activation energy of 28.2 kcal/mol, which is difficult to overcome at 300 K. Thus, we suggest that the intrusion of surface-adsorbed O atoms into the Cu bulk induced by abrasive grains at the friction interface is a rate-determining step in the Cu CMP process.

Tight-binding quantum chemical molecular dynamics simulations for the elucidation of chemical reaction dynamics in SiC etching with SF6/O2 plasma

Simulations based on tight-binding quantum chemical molecular dynamics are performed to elucidate SiC etching mechanisms and to study SiC surface reactions with SF₅ radicals and O atoms.

Tribochemical mechanism of amorphous silica asperities in aqueous environment: a reactive molecular dynamics study

Reactive molecular dynamics (ReaxFF) simulations are used to explore the atomic-level tribochemical mechanism of amorphous silica (a-SiO2) in a nanoscale, single-asperity contact in an aqueous environment. These sliding simulations are performed in both a phosphoric acid solution and in pure water under different normal pressures. The results show that tribochemical processes have profound consequences on tribological performance. Water molecules could help avoid direct adhesive interaction between a-SiO2 surfaces in pure water under low normal load. However, formation and rupture of interfacial siloxane bonds are obviously observed under higher normal load. In phosphoric acid solution, polymerization of phosphoric acid molecules occurs, yielding oligomers under lower load, and tribochemical reactions between the molecules and the sliding surfaces could enhance wear under higher load. The bridging oxygen atoms in silica play an important role in the formation of interfacial covalent bonds, and hydrogen is found to have a weakening effect on these bonds, resulting in the rupture during shear-related loading. This work sheds light on tribochemical reactions as a mechanism for lubrication and wear in water-based or other tribological systems.

Utilizing atomistic simulations to map pressure distributions and contact areas in molecular adlayers within nanoscale surface-asperity junctions: a demonstration with octadecylsilane-functionalized silica interfaces

To achieve a better understanding of the mechanical effects of adsorbed films at surface contacts, methods were developed to map and examine the pressure distribution of nanoasperity contacts, modeled by molecular dynamics simulation. The methods employ smoothing functions to project the atomic forces obtained in contact simulation onto the contact plane for fitting to standard continuum contact models and subsequent analysis. Importantly, these methods allow for contact evolution between nanoscopic asperity-asperity contacts to be examined because these are the central load-bearing junctions at interfaces. To demonstrate the application and features of this approach, it was employed to examine the evolution of contact between silica nanoasperities, with an increasing density of octadecyltrichlorosilane (OTS) films employed as a model adsorbate film. Linearly increasing contact radius and linearly decreasing maximal pressure were observed as a function of the film packing density. Because contact between the underlying, high-energy silica surfaces is undesirable, the evolution of silica contact was also examined using these same methods. As more molecules were introduced into the contact, a sharp transition was observed from the narrow, high-pressure interaction between the underlying substrates, to a broad, substantially lower pressure interaction, indicating a sharp transition from the dry to lubricated condition. To study the dependence of these behaviors on contact morphology, silica nanoasperities in contact with a flat silica surface were also examined. Similar behavior, including the broadening of the contact area and the minimization of direct surface contact, were observed. The method developed herein is applicable to a variety of systems and can be employed to optimize surface protection and pressure redistribution by boundary lubricants. This method can also be extended to AFM adhesion measurements where a detailed understanding of the true contact area is critical for the quantitative determinations of molecular forces and local surface mechanics.

A computational chemistry study on friction of h-MoS(2). Part I. Mechanism of single sheet lubrication

In this work, we theoretically investigated the friction mechanism of hexagonal MoS(2) (a well-known lamellar compound) using a computational chemistry method. First, we determined several parameters for molecular dynamics simulations via accurate quantum chemistry calculations and MoS(2) and MoS(2-x)O(x) structures were successfully reproduced. We also show that the simulated Raman spectrum and peak shift on X-ray diffraction patterns were in good agreement with those of experiment. The atomic interactions between MoS(2) sheets were studied by using a hybrid quantum chemical/classical molecular dynamics method. We found that the predominant interaction between two sulfur layers in different MoS(2) sheets was Coulombic repulsion, which directly affects the MoS(2) lubrication. MoS(2) sheets adsorbed on a nascent iron substrate reduced friction further due to much larger Coulombic repulsive interactions. Friction for the oxygen-containing MoS(2) sheets was influenced by not only the Coulomb repulsive interaction but also the atomic-scale roughness of the MoS(2)/MoS(2) sliding interface.

Friction between solids

The theoretical examination of the friction between solids is discussed with a focus on self-assembled monolayers, carbon-containing materials and antiwear additives. Important findings are illustrated by describing examples where simulations have complemented experimental work by providing a deeper understanding of the molecular origins of friction. Most of the work discussed herein makes use of classical molecular dynamics (MD) simulations. Of course, classical MD is not the only theoretical tool available to study friction. In view of that, a brief review of the early models of friction is also given. It should be noted that some topics related to the friction between solids, i.e. theory of electronic friction, are not discussed here but will be discussed in a subsequent review.

Oxidation mechanism in the metabolism of (S)-N-[1-(3-morpholin-4-ylphenyl)ethyl]-3-phenylacrylamide on oxyferryl active site in CYP3A4 Cytochrome: DFT modeling

The metabolism mechanism of (S)-N-[1-(3-morpholin-4ylphenyl)ethyl]-3-phenylacrylamide, mediated by CYP3A4 Cytochrome has been investigated by density functional QM calculations aided with molecular mechanics/molecular dynamics simulations. Two different orientations of phenyl ring for substrate approach toward oxyferryl center, imposing two subsequent rearrangement pathways have been investigated. Starting from sigma-complex in perpendicular orientation enzymatic mechanism involves consecutive proton shuttle intermediate, which further leads to the formation of alcohol and ketone. Parallel conformation leads solely to ketone product by 1,2 hydride shift. Although parallel and perpendicular sigma-complexes are energetically equivalent both for the gas phase or PCM solvent model, molecular dynamics studies in full CYP3A4 environment show that perpendicular conformation of the sigma-complex should be privileged, stabilized by hydrophobic interactions of phenylacrylamide chain. After assessing probability of the two conformations we postulate that the alcohol, accessible with the lowest energy barriers should be the major metabolite for studied substrate and CYP3A4 enzyme.