Promotion of exocyclic bond cleavages in the decomposition of 1,3-disilacyclobutane in the presence of a metal filament

Understanding the Reaction Chemistry of 1,1,3,3-Tetramethyldisilazane as a Precursor Gas in a Catalytic Chemical Vapor Deposition Process

The reaction chemistry of 1,1,3,3-tetramethyldisilazane (TMDSZ) in catalytic chemical vapor deposition (Cat-CVD), including its primary decomposition on a heated W filament and secondary gas-phase reactions in a Cat-CVD reactor, was studied using 10.5 eV vacuum ultraviolet single-photon ionization and/or laser-induced electron ionization in tandem with time-of-flight mass spectrometry. It has been demonstrated that TMDSZ initially breaks down to form various species, including methyl radical (•CH3), ammonia (NH3), and 1,1-dimethylsilanimine (DMSA). The activation energies (Ea) for the formation of •CH3 and NH3 were determined to be 61.2 ± 1.0 and 42.1 ± 0.9 kJ mol-1, respectively, in the temperature range of 1400-2000 and 900-2400 °C. It was found that the formation of DMSA may have two different contributing routes, i.e., a concerted one (Ea = 33.6 ± 2.3 kJ mol-1) at lower temperatures of 900-1500 °C and a stepwise one (Ea = 155.0 ± 7.8 kJ mol-1) at higher temperatures of 2100-2400 °C. The secondary gas-phase reactions occurring in the Cat-CVD reactor environment were found to stem from two competing processes. The first one, free-radical short-chain reactions initiated by •CH3 formation and propagated by H abstraction reactions, is the dominating chemical process, producing many high-mass stable alkyl-substituted or silyl-substituted disilazane or trisilazane products via radical recombination reactions. Head-to-tail cycloaddition of unstable DMSA is the second contributing chemical process, which forms cyclodisilazane species. In addition, evidence was found for the conversion of NH3 into H2 and N2 in the Cat-CVD reactor.

Covalent functionalization of graphene sheets for plasmid DNA delivery: experimental and theoretical study

Several approaches, including plasmid transfection and viral vectors, were used to deliver genes into cells for therapeutic and experimental purposes. However, due to the limited efficacy and questionable safety issues, researchers are looking for better new approaches. Over the past decade, graphene has attracted tremendous attention in versatile medical applications, including gene delivery, which could be safer than the traditional viral vectors. This work aims to covalently functionalize pristine graphene sheets with a polyamine to allow the loading of plasmid DNA (pDNA) and enhance its delivery into cells. Graphene sheets were successfully covalently functionalized with a derivative of tetraethylene glycol connected to polyamine groups to improve their water dispersibility and capacity to interact with the pDNA. The improved dispersibility of the graphene sheets was demonstrated visually and by transmission electron microscopy. Also, it was shown by thermogravimetric analysis that the degree of functionalization was about 58%. Moreover, the surface charge of the functionalized graphene was +29 mV as confirmed by zeta potential analysis. The complexion of f-graphene with pDNA was achieved at a relatively low mass ratio (10 : 1). The incubation of HeLa cells with f-graphene loaded with pDNA that encodes enhanced green fluorescence protein (eGFP) resulted in the detection of fluorescence signal in the cells within one hour. f-Graphene showed no toxic effect in vitro. Density functional theory (DFT) and quantum theory of atoms in molecules (QTAIM) calculations revealed strong binding with ΔH ₂₉₈ = 74.9 kJ mol^-1. QTAIM between the f-graphene and a simplified model of pDNA. Taken together, the developed functionalized graphene could be used for the development of a new non-viral gene delivery system.

A Mechanistic Study of Thermal Decomposition of 1,1,2,2-Tetramethyldisilane Using Vacuum Ultraviolet Photoionization Time-of-Flight Mass Spectrometry

Thermal decomposition of 1,1,2,2-tetramethyldisilane was performed by flash pyrolysis in a SiC microreactor in the temperature range from 295 to 1340 K, followed by molecular beam sampling and vacuum ultraviolet photoionization mass spectrometry analysis. Density functional theory investigations on the energetics of reactants, intermediates, and products were carried out to support the experimental observations. Energetics for 1,1,2,2-tetramethyldisilane initiation decomposition reactions and important secondary reactions were calculated. Dimethylsilane, dimethylsilyl radicals, dimethylsilylene, trimethylsilane, and tetramethyldisilene were determined as the primary reaction products in the initiation thermal decompositions of 1,1,2,2-tetramethyldisilane. Further decomposition reactions of tetramethyldisilene, such as production of dimethylsilene (m/z = 72) and eventually SiC₃H₄ (m/z = 68) fragments, were examined. Other products from secondary reactions of dimethylsilane and dimethylsilylene such as SiC₂H_2-6 and SiCH_0-4 were also observed. The comprehensive pyrolysis mechanism of 1,1,2,2-tetramethyldisilane was proposed.

A kinetic study of the gas-phase reactions of 1-methylsilacyclobutane in hot wire chemical vapor deposition

The reaction kinetics of the decomposition of 1-methylsilacyclobutane (MSCB) in a hot wire chemical vapor deposition (HWCVD) reactor was investigated. The stable reaction products were monitored using vacuum ultraviolet laser single photon ionization in tandem with time-of-flight mass spectrometry. Steady-state approximation was used to determine the rate constants of three individual decomposition pathways of MSCB, i.e., cycloreversion to form ethene and methylsilene (R1), ring opening to form propene and methylsilylene (R2), and exocyclic Si-CH₃ bond cleavage to form ˙CH₃ radicals (R3). The activation energies (E_a) for R2 and R3 in a HWCVD reactor were determined to be 86.6 kJ mol^-1 and 106 kJ mol^-1, respectively. The fact that these E_a values are close to those obtained for the MSCB decomposition on metal surfaces under collision-free conditions indicates that the heterogeneous reactions on the hot wire surface govern the gas-phase reaction kinetics in the HWCVD reactor. In addition, the E_a values obtained from a theoretical study of the decomposition kinetics using ab initio calculations at the CCSD(T)/6-311++G(3d,2p)//MP2/6-311++G(d,p) level were 62.9 kcal mol^-1 (i.e., 263 kJ mol^-1), 62.0 kcal mol^-1 (i.e., 259 kJ mol^-1), and 86.2 kcal mol^-1 (i.e., 361 kJ mol^-1) for R1, R2, and R3, respectively. The much lower experimental E_a values compared with those from the theoretical calculations clearly suggest that the tungsten filament in the HWCVD reactor catalyzed the decomposition.

Hydrogen elimination from the dissociation of methyl-substituted silanes on tungsten and tantalum surfaces

The elimination of H2 from the dissociation of four methyl-substituted silane molecules, including monomethylsilane (MMS), dimethylsilane (DMS), trimethylsilane (TriMS), and tetramethylsilane (TMS), on a heated tungsten or tantalum filament surface has been studied using laser ionization mass spectrometry. Two complementary ionization methods, i.e., single photon ionization (SPI) using a vacuum ultraviolet wavelength at 118 nm (10.5 eV) and a dual ionization source incorporating both 10.5 eV SPI and laser-induced electron ionization, were employed to detect the production of H2. Examination of the intensity of the H2+ peak from the four molecules has shown that it increases with temperature until reaching a plateau at around 2000−2100 °C on both tungsten and tantalum filaments. These methyl-substituted silanes are dissociatively adsorbed on tungsten and tantalum surfaces by Si−H bond cleavage, and as the temperature is raised, by C−H bond rupture. Experiments with the isotopomers of MMS, DMS, and TriMS have shown that the formation of H2 follows the Langmuir−Hinshelwood mechanism where two adsorbed hydrogen atoms on metal surfaces recombine to produce H2. The determined activation energy (Ea) for H2 formation from MMS, DMS, and TriMS, in the range of 58.2−93.4 kJ mol−1, has been found to increase with the number of methyl substitutions in the precursor molecule. Comparison of these Ea values with the reported values of 51.1−78.8 kJ mol−1 for the methyl radical formation from the same three precursor molecules has led to the conclusion that the initial Si−H bond cleavage in the dissociative adsorption of MMS, DMS, and TriMS is the rate-limiting step for the formation of both H2 molecules and ·CH3 radicals.