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Liu Q, Lu X, Liu Y, Li Z, Yan P, Chen W, Meng Q, Zhang Y, Yam C, He L, Yan Y, Zhang Y, Wu J, Frauenheim T, Zhang R, Xu Y. Carrier Relaxation and Multiplication in Bi Doped Graphene. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2023; 19:e2206218. [PMID: 36670078 DOI: 10.1002/smll.202206218] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/10/2022] [Revised: 01/09/2023] [Indexed: 05/04/2023]
Abstract
By introducing different contents of Bi adatoms to the surface of monolayer graphene, the carrier concentration and their dynamics have been effectively modulated as probed directly by the time- and angle-resolved photoemission spectroscopy technique. The Bi adatoms are found to assist acoustic phonon scattering events mediated by supercollisions as the disorder effectively relaxes the momentum conservation constraint. A reduced carrier multiplication has been observed, which is related to the shrinking Fermi sea for scattering, as confirmed by time-dependent density functional theory simulation. This work gives insight into hot carrier dynamics in graphene, which is crucial for promoting the application of photoelectric devices.
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Affiliation(s)
- Qi Liu
- Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, China
| | - Xianyang Lu
- Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, China
| | - Yuxiang Liu
- Bremen Center for Computational Materials Science, University of Bremen, Am Fallturm 1, 28359, Bremen, Germany
| | - Zhihao Li
- Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, China
| | - Pengfei Yan
- Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, China
| | - Wang Chen
- National Laboratory of Solid State Microstructure, School of Physics and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, China
| | - Qinghao Meng
- National Laboratory of Solid State Microstructure, School of Physics and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, China
| | - Yongheng Zhang
- National Laboratory of Solid State Microstructure, School of Physics and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, China
| | - ChiYung Yam
- Shenzhen Institute for Advanced Study, University of Electronic Science and Technology of China, Shenzhen, 518000, China
- Hong Kong Quantum AI Lab Limited, Hong Kong, 00000, China
| | - Liang He
- Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, China
| | - Yu Yan
- Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, China
| | - Yi Zhang
- National Laboratory of Solid State Microstructure, School of Physics and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, China
| | - Jing Wu
- York-Nanjing Joint Center (YNJC) for Spintronics and Nano-engineering, Department of Electronics and Physics, University of York, York, YO10 5DD, UK
| | - Thomas Frauenheim
- Bremen Center for Computational Materials Science, University of Bremen, Am Fallturm 1, 28359, Bremen, Germany
- Beijing Computational Science Research Center, Haidian District, Beijing, 100193, China
- Shenzhen JL Computational Science and Applied Research Institute, Shenzhen, 518109, China
| | - Rong Zhang
- Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, China
| | - Yongbing Xu
- Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, China
- York-Nanjing Joint Center (YNJC) for Spintronics and Nano-engineering, Department of Electronics and Physics, University of York, York, YO10 5DD, UK
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Luo X, Liang G, Li Y, Yu F, Zhao X. Regulating the Electronic Structure of Freestanding Graphene on SiC by Ge/Sn Intercalation: A Theoretical Study. MOLECULES (BASEL, SWITZERLAND) 2022; 27:molecules27249004. [PMID: 36558135 PMCID: PMC9788586 DOI: 10.3390/molecules27249004] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/07/2022] [Revised: 11/29/2022] [Accepted: 12/13/2022] [Indexed: 12/23/2022]
Abstract
The intrinsic n-type of epitaxial graphene on SiC substrate limits its applications in microelectronic devices, and it is thus vital to modulate and achieve p-type and charge-neutral graphene. The main groups of metal intercalations, such as Ge and Sn, are found to be excellent candidates to achieve this goal based on the first-principle calculation results. They can modulate the conduction type of graphene via intercalation coverages and bring out interesting magnetic properties to the entire intercalation structures without inducing magnetism to graphene, which is superior to the transition metal intercalations, such as Fe and Mn. It is found that the Ge intercalation leads to ambipolar doping of graphene, and the p-type graphene can only be obtained when forming the Ge adatom between Ge layer and graphene. Charge-neutral graphene can be achieved under high Sn intercalation coverage (7/8 bilayer) owing to the significantly increased distance between graphene and deformed Sn intercalation. These findings would open up an avenue for developing novel graphene-based spintronic and electric devices on SiC substrate.
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Affiliation(s)
- Xingyun Luo
- State Key Lab of Crystal Materials, Institute of Crystal Materials, Shandong University, Jinan 250100, China
| | - Guojun Liang
- State Key Lab of Crystal Materials, Institute of Crystal Materials, Shandong University, Jinan 250100, China
| | - Yanlu Li
- State Key Lab of Crystal Materials, Institute of Crystal Materials, Shandong University, Jinan 250100, China
- Correspondence: (Y.L.); (X.Z.)
| | - Fapeng Yu
- State Key Lab of Crystal Materials, Institute of Crystal Materials, Shandong University, Jinan 250100, China
| | - Xian Zhao
- Center for Optics Research and Engineering of Shandong University, Shandong University, Qingdao 266237, China
- Correspondence: (Y.L.); (X.Z.)
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Wang C, Wang H, Tian Q, Zong J, Xie X, Chen W, Zhang Y, Wang K, Qiu X, Wang L, Li F, Zhang H, Zhang Y. Suppression of Intervalley Coupling in Graphene via Potassium Doping. J Phys Chem Lett 2022; 13:9396-9403. [PMID: 36190902 DOI: 10.1021/acs.jpclett.2c02657] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
The quantum interference patterns induced by impurities in graphene can form the (√3 × √3)R30° superlattice with intervalley scattering. This superlattice can lead to the folded Dirac cone at the center of Brillouin zone by coupling two non-equivalent valleys. Using angle-resolved photoemission spectroscopy (ARPES), we report the observation of suppression of the folded Dirac cone in mono- and bilayer graphene upon potassium doping. The intervalley coupling with chiral symmetry broken can persist upon a light potassium-doped level but be ruined at the heavily doped level. Meanwhile, the folded Dirac cone can be suppressed by the renormalization of the Dirac band with potassium doping. Our results demonstrate that the suppression of the intervalley scattering pattern by potassium doping could pave the way toward the realization of novel chiraltronic devices in superlattice graphene.
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Affiliation(s)
- Can Wang
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
- Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Huaiqiang Wang
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
- Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Qichao Tian
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Junyu Zong
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Xuedong Xie
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Wang Chen
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Yongheng Zhang
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Kaili Wang
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Xiaodong Qiu
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Li Wang
- Vacuum Interconnected Nanotech Workstation (Nano-X), Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
| | - Fangsen Li
- Vacuum Interconnected Nanotech Workstation (Nano-X), Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
| | - Haijun Zhang
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
- Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
| | - Yi Zhang
- National Laboratory of Solid State Microstructure, School of Physics, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
- Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, Jiangsu 210093, People's Republic of China
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Yavuz S, Loran EM, Sarkar N, Fenning DP, Bandaru PR. Enhanced Environmental Stability Coupled with a 12.5% Power Conversion Efficiency in an Aluminum Oxide-Encapsulated n-Graphene/p-Silicon Solar Cell. ACS APPLIED MATERIALS & INTERFACES 2018; 10:37181-37187. [PMID: 30280565 DOI: 10.1021/acsami.8b16322] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
A significant improvement in the power conversion efficiency (PCE) and the environmental stability of n-Graphene/p-Si solar cells is indicated through effective n-doping of graphene, using low work function oxide capping layers. AlO x, deposited through atomic layer deposition, is particularly effective for such doping and in addition serves as an antireflection coating and a cell encapsulating layer. It is shown that the related charge transfer doping and interfacial engineering was crucial to achieve a record PCE of 12.5%. The work indicates a path forward, through work function engineering, for further efficiency gains in Gr-based solar cells.
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Kar S, Mohapatra DR, Sood AK. Tunable terahertz photoconductivity of hydrogen functionalized graphene using optical pump-terahertz probe spectroscopy. NANOSCALE 2018; 10:14321-14330. [PMID: 30020299 DOI: 10.1039/c8nr04154g] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
We show that the terahertz photoconductivity of monolayer graphene following 800 nm femtosecond optical pump excitation can be tuned by different levels of hydrogenation (graphane) and provide a quantitative understanding of the unique spectral dependence of photoconductivity. The real part of terahertz photoconductivity (ΔσRe(ω)), which is negative in doped pristine graphene, becomes positive after hydrogenation. Frequency and electronic temperature Te dependent conductivity σ(ω, Te) is calculated using the Boltzmann transport equation taking into account the energy dependence of different scattering rates of the hot carriers. It is shown that the carrier scattering rate dominated by disorder-induced short-range scattering, though sufficient for pristine graphene, is not able to explain the observed complex Δσ(ω) for graphane. Our results are explained by considering the system to be heterogeneous after hydrogenation where conductivity is a weighted sum of conductivities of two parts: one dominated by Coulomb scattering coming from trapped charge impurities in the underlying substrate and the other dominated by short-range scattering coming from disorder, surface defects, dislocations and ripples in graphene flakes. A finite band gap opening due to hydrogenation is shown to be important in determining Δσ(ω).
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Affiliation(s)
- Srabani Kar
- Department of Physics, Indian Institute of Science, Bangalore 560 012, India. and Center for ultrafast laser application, Indian Institute of Science, Bangalore 560 012, India
| | - Dipti R Mohapatra
- Department of Physics, Indian Institute of Science, Bangalore 560 012, India.
| | - A K Sood
- Department of Physics, Indian Institute of Science, Bangalore 560 012, India. and Center for ultrafast laser application, Indian Institute of Science, Bangalore 560 012, India
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Mach J, Procházka P, Bartošík M, Nezval D, Piastek J, Hulva J, Švarc V, Konečný M, Kormoš L, Šikola T. Electronic transport properties of graphene doped by gallium. NANOTECHNOLOGY 2017; 28:415203. [PMID: 28813368 DOI: 10.1088/1361-6528/aa86a4] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
In this work we present the effect of low dose gallium (Ga) deposition (<4 ML) performed in UHV (10-7 Pa) on the electronic doping and charge carrier scattering in graphene grown by chemical vapor deposition. In situ graphene transport measurements performed with a graphene field-effect transistor structure show that at low Ga coverages a graphene layer tends to be strongly n-doped with an efficiency of 0.64 electrons per one Ga atom, while the further deposition and Ga cluster formation results in removing electrons from graphene (less n-doping). The experimental results are supported by the density functional theory calculations and explained as a consequence of distinct interaction between graphene and Ga atoms in case of individual atoms, layers, or clusters.
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Affiliation(s)
- J Mach
- Central European Institute of Technology-Brno University of Technology (CEITEC BUT) Purkyňova 123, 612 00 Brno, Czechia. Institute of Physical Engineering, Brno University of Technology, Technická 2, 616 69 Brno, Czechia
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Electronic transport properties of Ir-decorated graphene. Sci Rep 2015; 5:15764. [PMID: 26508279 PMCID: PMC4623782 DOI: 10.1038/srep15764] [Citation(s) in RCA: 22] [Impact Index Per Article: 2.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/24/2015] [Accepted: 09/28/2015] [Indexed: 11/17/2022] Open
Abstract
Graphene decorated with 5d transitional metal atoms is predicted to exhibit many intriguing properties; for example iridium adatoms are proposed to induce a substantial topological gap in graphene. We extensively investigated the conductivity of single-layer graphene decorated with iridium deposited in ultra-high vacuum at low temperature (7 K) as a function of Ir concentration, carrier density, temperature, and annealing conditions. Our results are consistent with the formation of Ir clusters of ~100 atoms at low temperature, with each cluster donating a single electronic charge to graphene. Annealing graphene increases the cluster size, reducing the doping and increasing the mobility. We do not observe any sign of an energy gap induced by spin-orbit coupling, possibly due to the clustering of Ir.
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