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Dass D. Metallic-semiconducting transition of silicon nanowires by surface passivation. RESULTS IN SURFACES AND INTERFACES 2021. [DOI: 10.1016/j.rsurfi.2021.100009] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
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García-Hevia L, Bañobre-López M, Gallo J. Recent Progress on Manganese-Based Nanostructures as Responsive MRI Contrast Agents. Chemistry 2018; 25:431-441. [PMID: 29999200 DOI: 10.1002/chem.201802851] [Citation(s) in RCA: 43] [Impact Index Per Article: 7.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/05/2018] [Revised: 07/09/2018] [Indexed: 01/10/2023]
Abstract
Manganese-based nanostructured contrast agents (CAs) entered the field of medical diagnosis through magnetic resonance imaging (MRI) some years ago. Although some of these Mn-based CAs behave as classic T1 contrast enhancers in the same way as clinical Gd-based molecules do, a new type of Mn nanomaterials have been developed to improve MRI sensitivity and potentially gather new functional information from tissues by using traditional T1 contrast enhanced MRI. These nanomaterials have been designed to respond to biological environments, mainly to pH and redox potential variations. In many cases, the differences in signal generation in these responsive Mn-based nanostructures come from intrinsic changes in the magnetic properties of Mn cations depending on their oxidation state. In other cases, no changes in the nature of Mn take place, but rather the nanomaterial as a whole responds to the change in the environment through different mechanisms, including changes in integrity and hydration state. This review focusses on the chemistry and MR performance of these responsive Mn-based nanomaterials.
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Affiliation(s)
- Lorena García-Hevia
- Advanced (Magnetic) Theranostic Nanostructures Laboratory, Department of Life Sciences, INL-International Iberian Nanotechnology Laboratory, Av. Mestre José Veiga, 4715-330, Braga, Portugal
| | - Manuel Bañobre-López
- Advanced (Magnetic) Theranostic Nanostructures Laboratory, Department of Life Sciences, INL-International Iberian Nanotechnology Laboratory, Av. Mestre José Veiga, 4715-330, Braga, Portugal
| | - Juan Gallo
- Advanced (Magnetic) Theranostic Nanostructures Laboratory, Department of Life Sciences, INL-International Iberian Nanotechnology Laboratory, Av. Mestre José Veiga, 4715-330, Braga, Portugal
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Ding N, Xu J, Zhang Q, Su J, Gao Y, Zhou X, Zhai T. Controllable Carrier Type in Boron Phosphide Nanowires Toward Homostructural Optoelectronic Devices. ACS APPLIED MATERIALS & INTERFACES 2018; 10:10296-10303. [PMID: 29504739 DOI: 10.1021/acsami.7b17204] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
The p-n junction is one important and fundamental building block of the optoelectronic age. However, electrons and holes will be severely scattered in heterostructures led by the grain boundary at the alloy interface between two dissimilar semiconductors. In this work, we present boron phosphide (BP) nanowires with artificially controllable carrier type for the fabrication of homojunctions via adjusting borane/phosphine ratio during the deposition process, both prove high crystallization with fewer impurities. The homojunctions that consist of n-type and p-type BP nanowires show apparent photovoltaic effect [external quantum efficiency ≈ 10% under a ∼0.4 pW light @ 600 nm] and the quenched photoluminescence within the junction area, which indicates the effective separation and transfer of photogenerated charge carriers at the interface. The achievement of controllable carrier type implemented in the same material ushers in a frontier for the design of nanoscale homojunctions toward advanced optoelectronic devices.
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Affiliation(s)
- Nan Ding
- State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering , Huazhong University of Science and Technology (HUST) , Wuhan 430074 , P. R. China
| | - Junqi Xu
- State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering , Huazhong University of Science and Technology (HUST) , Wuhan 430074 , P. R. China
| | - Qi Zhang
- State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering , Huazhong University of Science and Technology (HUST) , Wuhan 430074 , P. R. China
| | - Jianwei Su
- State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering , Huazhong University of Science and Technology (HUST) , Wuhan 430074 , P. R. China
| | - Yu Gao
- State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering , Huazhong University of Science and Technology (HUST) , Wuhan 430074 , P. R. China
| | - Xing Zhou
- State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering , Huazhong University of Science and Technology (HUST) , Wuhan 430074 , P. R. China
| | - Tianyou Zhai
- State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering , Huazhong University of Science and Technology (HUST) , Wuhan 430074 , P. R. China
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Shin WH, Roh JW, Ryu B, Chang HJ, Kim HS, Lee S, Seo WS, Ahn K. Enhancing Thermoelectric Performances of Bismuth Antimony Telluride via Synergistic Combination of Multiscale Structuring and Band Alignment by FeTe 2 Incorporation. ACS APPLIED MATERIALS & INTERFACES 2018; 10:3689-3698. [PMID: 29303242 DOI: 10.1021/acsami.7b18451] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
It has been a difficulty to form well-distributed nano- and mesosized inclusions in a Bi2Te3-based matrix and thereby realizing no degradation of carrier mobility at interfaces between matrix and inclusions for high thermoelectric performances. Herein, we successfully synthesize multistructured thermoelectric Bi0.4Sb1.6Te3 materials with Fe-rich nanoprecipitates and sub-micron FeTe2 inclusions by a conventional solid-state reaction followed by melt-spinning and spark plasma sintering that could be a facile preparation method for scale-up production. This study presents a bismuth antimony telluride based thermoelectric material with a multiscale structure whose lattice thermal conductivity is drastically reduced with minimal degradation on its carrier mobility. This is possible because a carefully chosen FeTe2 incorporated in the matrix allows its interfacial valence band with the matrix to be aligned, leading to a significantly improved p-type thermoelectric power factor. Consequently, an impressively high thermoelectric figure of merit ZT of 1.52 is achieved at 396 K for p-type Bi0.4Sb1.6Te3-8 mol % FeTe2, which is a 43% enhancement in ZT compared to the pristine Bi0.4Sb1.6Te3. This work demonstrates not only the effectiveness of multiscale structuring for lowering lattice thermal conductivities, but also the importance of interfacial band alignment between matrix and inclusions for maintaining high carrier mobilities when designing high-performance thermoelectric materials.
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Affiliation(s)
- Weon Ho Shin
- Energy Materials Center, Energy & Environment Division, Korea Institute of Ceramic Engineering & Technology , Jinju 52851, Republic of Korea
| | - Jong Wook Roh
- Materials R&D Center, Samsung Advanced Institute of Technology, Samsung Electronics , Suwon 16419, Republic of Korea
| | - Byungki Ryu
- Thermoelectric Conversion Research Center, Creative and Fundamental Research Division, Korea Electrotechnology Research Institute , Changwon 51543, Republic of Korea
| | - Hye Jung Chang
- Advanced Analysis Center, Korea Institute of Science and Technology , Seoul 02792, Republic of Korea
| | - Hyun Sik Kim
- Materials R&D Center, Samsung Advanced Institute of Technology, Samsung Electronics , Suwon 16419, Republic of Korea
| | - Soonil Lee
- Energy Materials Center, Energy & Environment Division, Korea Institute of Ceramic Engineering & Technology , Jinju 52851, Republic of Korea
| | - Won Seon Seo
- Energy Materials Center, Energy & Environment Division, Korea Institute of Ceramic Engineering & Technology , Jinju 52851, Republic of Korea
| | - Kyunghan Ahn
- Department of Chemistry, Chung-Ang University , Seoul 06974, Republic of Korea
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Peelaers H, Durgun E, Partoens B, Bilc DI, Ghosez P, Van de Walle CG, Peeters FM. Ab initio study of hydrogenic effective mass impurities in Si nanowires. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2017; 29:095303. [PMID: 28059776 DOI: 10.1088/1361-648x/aa5768] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The effect of B and P dopants on the band structure of Si nanowires is studied using electronic structure calculations based on density functional theory. At low concentrations a dispersionless band is formed, clearly distinguishable from the valence and conduction bands. Although this band is evidently induced by the dopant impurity, it turns out to have purely Si character. These results can be rigorously analyzed in the framework of effective mass theory. In the process we resolve some common misconceptions about the physics of hydrogenic shallow impurities, which can be more clearly elucidated in the case of nanowires than would be possible for bulk Si. We also show the importance of correctly describing the effect of dielectric confinement, which is not included in traditional electronic structure calculations, by comparing the obtained results with those of G0W0 calculations.
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Affiliation(s)
- H Peelaers
- Materials Department, University of California, Santa Barbara, CA 93106-5050, United States of America. Departement Fysica, Universiteit Antwerpen, Groenenborgerlaan 171, B-2020 Antwerpen, Belgium
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Kim J, Hong KH. Retarded dopant diffusion by moderated dopant–dopant interactions in Si nanowires. Phys Chem Chem Phys 2015; 17:1575-9. [DOI: 10.1039/c4cp04513k] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
The mechanical softening and quantum confinement found in nanostructures are the physical origin of the suppressed dopant diffusion.
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Affiliation(s)
- Jongseob Kim
- Samsung Advanced Institute of Technology
- Samsung Electronics Co., Ltd
- Yongin-Si
- Korea
| | - Ki-Ha Hong
- Department of Materials Science and Engineering
- Hanbat National University
- Daejeon
- 305-719 Korea
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Ng MF, Tong SW. Chemically doped radial junction characteristics in silicon nanowires. NANO LETTERS 2012; 12:6133-6138. [PMID: 23137035 DOI: 10.1021/nl302906k] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/01/2023]
Abstract
We evaluate the boron (B) and phosphorus (P) core-surface codoped radial p-n junction characteristics in silicon nanowires (SiNWs) using density functional theory calculations. We find that the formation of radial p-n junction is energetically favorable. The stability depends on the diameter of SiNWs and the dopant concentration. Generally, a higher concentration of B-P pair dopants results in a more stable nanowire. More importantly, we predict that the radial p-n junction can evolve into a Schottky-like junction in relatively highly doped SiNWs when the diameter increases, attributing to the change of the core p-doping characteristic, that is, the core p-junction becomes metallic, while the n-junction near the surface remains semiconducting. The interfacial contact between the junctions is found to be the key for such change. Our calculated results support an experimental observation in SiNW solar cells.
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Affiliation(s)
- Man-Fai Ng
- Institute of High Performance Computing, Agency for Science, Technology and Research, 1 Fusionopolis Way, #16-16 Connexis, Singapore 138632, Singapore.
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Kim S, Park JS, Chang KJ. Stability and segregation of B and P dopants in Si/SiO2 core-shell nanowires. NANO LETTERS 2012; 12:5068-5073. [PMID: 22985080 DOI: 10.1021/nl3013924] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/01/2023]
Abstract
Using molecular dynamics simulations, we generate realistic atomic models for oxidized Si nanowires which consist of a crystalline Si core and an amorphous SiO(2) shell. The amorphous characteristics of SiO(2) are well reproduced, as compared to those for bulk amorphous silica. Based on first-principles density functional calculations, we investigate the stability and segregation of B and P dopants near the radial interface between Si and SiO(2). Although substitutional B atoms are more stable in the core than in the oxide, B dopants can segregate to the oxide with the aid of Si self-interstitials which are generated during thermal oxidation. The segregation of B dopants occurs in the form of B interstitials in the oxide, leaving the self-interstitials in the Si core. In the case of P dopants, dopant segregation to the oxide is unfavorable even in the presence of self-interstitials. Instead, we find that P dopants tend to aggregate in the Si region near the interface and may form nearest-neighbor donor pairs, which are energetically more stable than isolated P dopants.
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Affiliation(s)
- Sunghyun Kim
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Republic of Korea
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Wu F, Kan E, Wu X. Site-selected doping in silicon nanowires by an external electric field. NANOSCALE 2011; 3:3620-3622. [PMID: 21842087 DOI: 10.1039/c1nr10569h] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/31/2023]
Abstract
The properties of dopant-related defects in silicon nanowires are key characteristics in semiconductive devices. Our first-principles calculations predicted that the preferred doping sites of B and P atoms in hydrogen-passivated silicon nanowires have opposite distribution behavior under electric field, suggesting a steady intrinsic p-n junction can be spontaneously formed in (B and P) codoped silicon nanowires.
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Affiliation(s)
- Fang Wu
- School of Science, Nanjing Forestry University, Nanjing, Jiangsu 210037, P. R. China
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Bondi RJ, Lee S, Hwang GS. First-principles study of the structural, electronic, and optical properties of oxide-sheathed silicon nanowires. ACS NANO 2011; 5:1713-1723. [PMID: 21366232 DOI: 10.1021/nn102232u] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/30/2023]
Abstract
Using a density functional theory approach, we examine the dielectric function (ε(ω)) optical spectra and electronic structure of various silicon nanowire (SiNW) orientations (<100>, <110>, <111>, and <112>) with amorphous oxide sheaths (-a-SiOx) and compare the results against H-terminated reference SiNWs. We extend the same methods to investigate the effects of surface passivation on <111> SiNW properties using functional group termination (-H, -OH, and -F) and three different thicknesses of oxide sheath passivation. Oxide layer growth is evidenced in the spectra by concomitant appearance of tail oxide character with signatures of increased Si disorder. Suboxide contributions and increased Si disorder from oxidation average out the band structure dispersion observed in the reference SiNWs. Furthermore, we plot average Seraphin coefficients for <111> passivations that clearly distinguish functional group termination from surface oxidation and discuss the suboxide and disorder contributions on the characteristic intersection of these coefficients. The substantial difference in properties observed between <111>-OH and <111>-a-SiOx SiNWs emphasizes the importance of using realistic oxidation models to improve understanding of SiNW properties.
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Affiliation(s)
- Robert J Bondi
- Department of Chemical Engineering, University of Texas, Austin, Texas 78712, United States
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Hong KH, Kim J, Lee JH, Shin J, Chung UI. Asymmetric doping in silicon nanostructures: the impact of surface dangling bonds. NANO LETTERS 2010; 10:1671-1676. [PMID: 20377269 DOI: 10.1021/nl904282v] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
We investigate peculiar dopant deactivation behaviors of Si nanostrucures with first principle calculations and reveal that surface dangling bonds (SDBs) on Si nanostructures could be fundamental obstacles in nanoscale doping. In contrast to bulk Si, as the size of Si becomes smaller, SDBs on Si nanostructures prefer to be charged and asymmetrically deactivate n- and p-type doping. The asymmetric dopant deactivation in Si nanostructures is ascribed to the preference for negatively charged SDBs as a result of a larger quantum confinement effect on the conduction band. On the basis of our results, we show that the control of the growth direction of silicon nanowire as well as surface passivation is very important in preventing dopant deactivation.
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Affiliation(s)
- Ki-Ha Hong
- Samsung Advanced Institute of Technology, Mt. 14, Gyeonggi-Do, Korea.
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