1
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Guo D, Wang H, Yang L, Dong W, Xu B, Du S, Rui X, Liang Q, Watanabe K, Taniguchi T, Wang Z, Xiong Y, Jiang W, Zhou J, Zheng S. Anisotropic Resonant Tunneling in Twist-Stacked van der Waals Heterostructure. ACS NANO 2025; 19:9826-9834. [PMID: 40062694 DOI: 10.1021/acsnano.4c13215] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 03/19/2025]
Abstract
Resonant tunneling, with energy and momentum conservation, has been extensively studied in two-dimensional van der Waals heterostructures and has potential applications in band structure probing, multivalued logic, and oscillators. Lattice alignment is crucial in resonant tunneling transistors (RTTs) for achieving negative differential resistance (NDR) with a high peak-to-valley ratio (PVR) because twist-angle-induced momentum mismatch can break the resonant tunneling condition. Here, we report anisotropic resonant tunneling in twist-stacked ReSe2/h-BN/ReSe2 RTTs, where the PVR exhibits a strong dependence on the twist angle between the two ReSe2 layers, reaching a maximum at the twist angle of 102°. Theoretical calculations suggest that the twist angle modulates the joint density of states of the two anisotropic bands in ReSe2 layers during the tunneling process, significantly suppressing the valley current and thereby enhancing the PVR. Double NDR peaks were observed in twist-stacked RTTs, which are attributed to interband resonant tunneling. Moreover, our twist-stacked RTTs are utilized in multibit inverters and adjustable self-powered photodetectors, providing potentials for the design of high-performance RTTs and photodetectors via twist-stacked engineering.
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Affiliation(s)
- Dan Guo
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Huiwen Wang
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Liu Yang
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Weikang Dong
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Boyu Xu
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Shuang Du
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Xuyan Rui
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Qingrong Liang
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Kenji Watanabe
- National Institute for Materials Science, 1-1 Namiki, Tsukuba 303-0044, Japan
| | - Takashi Taniguchi
- National Institute for Materials Science, 1-1 Namiki, Tsukuba 303-0044, Japan
| | - Zhiwei Wang
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Yan Xiong
- Analysis & Testing Center, Beijing Institute of Technology, Beijing 100081, China
| | - Wei Jiang
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Jiadong Zhou
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Shoujun Zheng
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
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2
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Seo Y, Tsuji Y, Onodera M, Moriya R, Zhang Y, Watanabe K, Taniguchi T, Machida T. Spectrum of Tunneling Transport through Phonon-Coupled Defect States in a Carbon-Doped Hexagonal Boron Nitride Barrier. NANO LETTERS 2024; 24:13733-13740. [PMID: 39432125 DOI: 10.1021/acs.nanolett.4c03847] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/22/2024]
Abstract
Defects in hexagonal boron nitride (h-BN) play important roles in tunneling transport through the h-BN barrier. Here, using carbon-doped h-BN (h-BN:C) as a tunnel barrier containing defects in a controlled manner, we investigated tunneling transport through defects in the h-BN:C/graphene heterostructures. Defect-assisted tunneling through a specific kind of carbon-related defect was observed in all measured devices, where the defect level was always located at ∼0.1 eV above the graphene's charge neutrality point. We revealed a phonon-assisted inelastic process in the defect-assisted tunneling, in which carriers tunnel through the defect with phonon emission. Furthermore, when the h-BN:C barrier was thick (12 layers, ∼4 nm), sequential tunneling through two defects became dominant, where the phonon-assisted inelastic process shows substantial effects between the two defects. This study reveals the contribution of phonons to defect-assisted tunneling transport, which is essential for the development of defect-related van der Waals (vdW) electronic techniques.
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Affiliation(s)
- Yuta Seo
- Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
| | - Yuki Tsuji
- Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
| | - Momoko Onodera
- Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
| | - Rai Moriya
- Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
| | - Yijin Zhang
- Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
| | - Kenji Watanabe
- Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Takashi Taniguchi
- Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Tomoki Machida
- Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
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3
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Quincke M, Mundszinger M, Biskupek J, Kaiser U. Defect Density and Atomic Defect Recognition in the Middle Layer of a Trilayer MoS 2 Stack. NANO LETTERS 2024; 24:10496-10503. [PMID: 38950105 PMCID: PMC11363126 DOI: 10.1021/acs.nanolett.4c02391] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/21/2024] [Revised: 06/26/2024] [Accepted: 06/27/2024] [Indexed: 07/03/2024]
Abstract
Molybdenum disulfide (MoS2) is one of the most intriguing two-dimensional materials, and moreover, its single atomic defects can significantly alter the properties. These defects can be both imaged and engineered using spherical and chromatic aberration-corrected high-resolution transmission electron microscopy (CC/CS-corrected HRTEM). In a few-layer stack, several atoms are vertically aligned in one atomic column. Therefore, it is challenging to determine the positions of missing atoms and the damage cross-section, particularly in the not directly accessible middle layers. In this study, we introduce a technique for extracting subtle intensity differences in CC/CS-corrected HRTEM images. By exploiting the crystal structure of the material, our method discerns chalcogen vacancies even in the middle layer of trilayer MoS2. We found that in trilayer MoS2 the middle layer's damage cross-section is about ten times lower than that in the monolayer. Our findings could be essential for the application of few-layer MoS2 in nanodevices.
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Affiliation(s)
- Moritz Quincke
- Central
Facility Materials Science Electron Microscopy, Ulm University, 89081 Ulm, Germany
- Institute
for Quantum Optics, Ulm University, 89081 Ulm, Germany
| | - Manuel Mundszinger
- Central
Facility Materials Science Electron Microscopy, Ulm University, 89081 Ulm, Germany
| | - Johannes Biskupek
- Central
Facility Materials Science Electron Microscopy, Ulm University, 89081 Ulm, Germany
| | - Ute Kaiser
- Central
Facility Materials Science Electron Microscopy, Ulm University, 89081 Ulm, Germany
- Institute
for Quantum Optics, Ulm University, 89081 Ulm, Germany
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4
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Zabelotsky T, Singh S, Haim G, Malkinson R, Kadkhodazadeh S, Radko IP, Aharonovich I, Steinberg H, Berg-Sørensen K, Huck A, Taniguchi T, Watanabe K, Bar-Gill N. Creation of Boron Vacancies in Hexagonal Boron Nitride Exfoliated from Bulk Crystals for Quantum Sensing. ACS APPLIED NANO MATERIALS 2023; 6:21671-21678. [PMID: 38835900 PMCID: PMC11145586 DOI: 10.1021/acsanm.3c03395] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 08/09/2023] [Revised: 11/01/2023] [Accepted: 11/05/2023] [Indexed: 06/06/2024]
Abstract
Boron vacancies (VB-) in hexagonal boron -nitride (hBN) have sparked great interest in recent years due to their optical and spin properties. Since hBN can be readily integrated into devices where it interfaces a huge variety of other 2D materials, boron vacancies may serve as a precise sensor which can be deployed at very close proximity to many important materials systems. Boron vacancy defects may be produced by a number of existing methods, the use of which may depend on the final application. Any method should reproducibly generate defects with controlled density and desired pattern. To date, however, detailed studies of such methods are missing. In this paper, we study various techniques for the preparation of hBN flakes from bulk crystals and relevant postprocessing treatments, namely, focused ion beam (FIB) implantation, for creation of VB-s as a function of flake thickness and defect concentrations. We find that flake thickness plays an important role when optimizing implantation parameters, while careful sample cleaning proved important to achieve consistent results.
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Affiliation(s)
- Ty Zabelotsky
- The
Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem 91904, Israel
- The
Institute of Applied Physics, The Hebrew
University of Jerusalem, Jerusalem 91904, Israel
| | - Sourabh Singh
- The
Racah Institute of Physics, The Hebrew University
of Jerusalem, Jerusalem 91904, Israel
| | - Galya Haim
- The
Institute of Applied Physics, The Hebrew
University of Jerusalem, Jerusalem 91904, Israel
- School
of Physics, The University of Melbourne, Parkville, Victoria 3010, Australia
| | - Rotem Malkinson
- The
Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem 91904, Israel
- The
Institute of Applied Physics, The Hebrew
University of Jerusalem, Jerusalem 91904, Israel
| | - Shima Kadkhodazadeh
- DTU
Nanolab, Technical University of Denmark, Fysikvej, Kongens, Lyngby, 2800, Denmark
| | - Ilya P. Radko
- Department
of Physics, Technical University of Denmark, Kongens, Lyngby, 2800, Denmark
| | - Igor Aharonovich
- School
of Mathematical and Physical Sciences, University
of Technology Sydney, Ultimo, New South Wales 2007, Australia
- ARC
Centre of Excellence for Transformative Meta-Optical Systems (TMOS),
Faculty of Science, University of Technology
Sydney, Ultimo, New South Wales 2007, Australia
| | - Hadar Steinberg
- The
Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem 91904, Israel
- The
Racah Institute of Physics, The Hebrew University
of Jerusalem, Jerusalem 91904, Israel
| | - Kirstine Berg-Sørensen
- Department
of Health Technology, Technical University
of Denmark, Kongens, Lyngby 2800, Denmark
| | - Alexander Huck
- Center
for Macroscopic Quantum States (bigQ), Department of Physics, Technical University of Denmark, 2800 Kongens, Lyngby, Denmark
| | - Takashi Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Kenji Watanabe
- Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Nir Bar-Gill
- The
Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem 91904, Israel
- The
Institute of Applied Physics, The Hebrew
University of Jerusalem, Jerusalem 91904, Israel
- The
Racah Institute of Physics, The Hebrew University
of Jerusalem, Jerusalem 91904, Israel
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5
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Cao Q, Telford EJ, Benyamini A, Kennedy I, Zangiabadi A, Watanabe K, Taniguchi T, Dean CR, Hunt BM. Tunneling Spectroscopy of Two-Dimensional Materials Based on Via Contacts. NANO LETTERS 2022; 22:8941-8948. [PMID: 36356229 DOI: 10.1021/acs.nanolett.2c03081] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
We introduce a novel planar tunneling architecture for van der Waals heterostructures based on via contacts, namely, metallic contacts embedded into through-holes in hexagonal boron nitride (hBN). We use the via-based tunneling method to study the single-particle density of states of two different two-dimensional (2D) materials, NbSe2 and graphene. In NbSe2 devices, we characterize the barrier strength and interface disorder for barrier thicknesses of 0, 1, and 2 layers of hBN and study the dependence on the tunnel-contact area down to (44 ± 14)2 nm2. For 0-layer hBN devices, we demonstrate a crossover from diffusive to point contacts in the small-contact-area limit. In graphene, we show that reducing the tunnel barrier thickness and area can suppress effects due to phonon-assisted tunneling and defects in the hBN barrier. This via-based architecture overcomes limitations of other planar tunneling designs and produces high-quality, ultraclean tunneling structures from a variety of 2D materials.
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Affiliation(s)
- Qingrui Cao
- Department of Physics, Carnegie Mellon University, Pittsburgh, Pennsylvania15213, United States
| | - Evan J Telford
- Department of Physics, Columbia University, New York, New York10027, United States
| | - Avishai Benyamini
- Department of Physics, Columbia University, New York, New York10027, United States
| | - Ian Kennedy
- Department of Physics, Columbia University, New York, New York10027, United States
| | - Amirali Zangiabadi
- Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York10027, United States
| | - Kenji Watanabe
- Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba305-0044, Japan
| | - Takashi Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba305-0044, Japan
| | - Cory R Dean
- Department of Physics, Columbia University, New York, New York10027, United States
| | - Benjamin M Hunt
- Department of Physics, Carnegie Mellon University, Pittsburgh, Pennsylvania15213, United States
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6
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Zheng S, Joo Y, Zhao M, Kang K, Watanabe K, Taniguchi T, Myoung N, Moon P, Son YW, Yang H. Robust Quantum Oscillation of Dirac Fermions in a Single-Defect Resonant Transistor. ACS NANO 2021; 15:20013-20019. [PMID: 34843211 DOI: 10.1021/acsnano.1c07613] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
The massless nature of Dirac Fermions produces large energy gaps between Landau levels (LLs), which is promising for topological devices. While the energy gap between the zeroth and first LLs reaches 36 meV in a magnetic field of 1 T in graphene, exploiting the quantum Hall effect at room temperature requires large magnetic fields (∼30 T) to overcome the energy level broadening induced by charge inhomogeneities in the device. Here, we report a way to use the robust quantum oscillations of Dirac Fermions in a single-defect resonant transistor, which is based on local tunneling through a thin (∼1.4 nm) hexagonal boron nitride (h-BN) between lattice-orientation-aligned graphene layers. A single point defect in the h-BN, selected by the orientation-tuned graphene layers, probes local LLs in its proximity, minimizing the energy broadening of the LLs by charge inhomogeneity at a moderate magnetic field and ambient conditions. Thus, the resonant tunneling between lattice-orientation-aligned graphene layers highlights the potential to spectroscopically locate the atomic defects in the h-BN, which contributes to the study on electrically tunable single photon source via defect states in h-BN.
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Affiliation(s)
- Shoujun Zheng
- Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Yanggeun Joo
- Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea
| | - Mali Zhao
- Department of Energy Science, Sungkyunkwan University, Suwon 16419, Korea
| | - Kyungrok Kang
- Department of Energy Science, Sungkyunkwan University, Suwon 16419, Korea
| | - Kenji Watanabe
- National Institute for Materials Science, 1-1 Namiki, Tsukuba 303-0044, Japan
| | - Takashi Taniguchi
- National Institute for Materials Science, 1-1 Namiki, Tsukuba 303-0044, Japan
| | - Nojoon Myoung
- Department of Physics Education, Chosun University, Gwangju 61452, Korea
| | - Pilkyung Moon
- New York University Shanghai and NYU-ECNU Institute of Physics at NYU Shanghai, Shanghai 200122, China
- School of Computational Sciences, Korea Institute for Advanced Study, Seoul 02455, Korea
| | - Young-Woo Son
- School of Computational Sciences, Korea Institute for Advanced Study, Seoul 02455, Korea
| | - Heejun Yang
- Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea
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7
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Devidas TR, Keren I, Steinberg H. Spectroscopy of NbSe 2 Using Energy-Tunable Defect-Embedded Quantum Dots. NANO LETTERS 2021; 21:6931-6937. [PMID: 34351777 DOI: 10.1021/acs.nanolett.1c02177] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Quantum dots have sharply defined energy levels, which can be used for high resolution energy spectroscopy when integrated in tunneling circuitry. Here we report dot-assisted spectroscopy measurements of the superconductor NbSe2, using a van der Waals device consisting of a vertical stack of graphene-MoS2-NbSe2. The MoS2 tunnel barriers host naturally occurring defects which function as quantum dots, allowing transport via resonant tunneling. The dot energies are tuned by an electric field exerted by a back-gate, which penetrates the graphene source electrode. Scanning the dot potential across the superconductor Fermi energy, we reproduce the NbSe2 density of states which exhibits a well-resolved two-gap spectrum. Surprisingly, we find that the dot-assisted current is dominated by the lower energy feature of the two NbSe2 gaps, possibly due to a selection rule which favors coupling between the dots and the orbitals which exhibit this gap.
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Affiliation(s)
- T R Devidas
- The Racah Institute of Physics, The Center for Nanoscience and Nanotechnology, The Hebrew University, Jerusalem 91904, Israel
| | - Itai Keren
- The Racah Institute of Physics, The Center for Nanoscience and Nanotechnology, The Hebrew University, Jerusalem 91904, Israel
| | - Hadar Steinberg
- The Racah Institute of Physics, The Center for Nanoscience and Nanotechnology, The Hebrew University, Jerusalem 91904, Israel
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