1
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Kotsakidis JC, Stephen GM, DeJarld M, Myers-Ward RL, Daniels KM, Gaskill DK, Fuhrer MS, Butera RE, Hanbicki AT, Friedman AL. Charged Impurity Scattering and Electron-Electron Interactions in Large-Area Hydrogen Intercalated Bilayer Graphene. ACS APPLIED MATERIALS & INTERFACES 2024; 16:61194-61203. [PMID: 39439056 DOI: 10.1021/acsami.4c07724] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/25/2024]
Abstract
Intercalation is a promising technique to modify the structural and electronic properties of 2D materials on the wafer scale for future electronic device applications. Yet, few reports to date demonstrate 2D intercalation as a viable technique on this scale. Spurred by recent demonstrations of mm-scale sensors, we use hydrogen intercalated quasi-freestanding bilayer graphene (hQBG) grown on 6H-SiC(0001), to understand the electronic properties of a large-area (16 mm2) device. To do this, we first analyze Shubnikov-de Haas (SdH) oscillations and weak localization, permitting determination of the Fermi level, cyclotron effective mass, and quantum scattering time. Our transport results indicate that at low temperature, scattering in hQBG is dominated by charged impurities and electron-electron interactions. Using low- temperature scanning tunneling microscopy and spectroscopy (STS), we investigate the source of the charged impurities on the nm-scale via observation of Friedel oscillations. Comparison to theory suggests that the Friedel oscillations we observe are caused by hydrogen vacancies underneath the hQBG. Furthermore, STS measurements demonstrate that hydrogen vacancies in the hQBG have an extremely localized effect on the local density of states, such that the Fermi level of the hQBG is only affected directly above the location of the defect. Hence, we find that the calculated Fermi level from SdH oscillations on the millimeter scale agrees with the value measured locally on the nanometer scale with STS measurements.
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Affiliation(s)
- Jimmy C Kotsakidis
- Laboratory for Physical Sciences, College Park, Maryland 20740, United States
| | - Gregory M Stephen
- Laboratory for Physical Sciences, College Park, Maryland 20740, United States
| | - Matthew DeJarld
- U.S. Naval Research Laboratory, Washington D.C., 20375, United States
| | | | - Kevin M Daniels
- Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20742, United States
| | - D Kurt Gaskill
- Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20742, United States
| | - Michael S Fuhrer
- School of Physics and Astronomy, Monash University, Melbourne, Victoria 3800, Australia
| | - Robert E Butera
- Laboratory for Physical Sciences, College Park, Maryland 20740, United States
| | - Aubrey T Hanbicki
- Laboratory for Physical Sciences, College Park, Maryland 20740, United States
| | - Adam L Friedman
- Laboratory for Physical Sciences, College Park, Maryland 20740, United States
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2
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Han S, Liu J, Pérez-Jiménez AI, Lei Z, Yan P, Zhang Y, Guo X, Bai R, Hu S, Wu X, Zhang DW, Sun Q, Akinwande D, Yu ET, Ji L. Visualizing and Controlling of Photogenerated Electron-Hole Pair Separation in Monolayer WS 2 Nanobubbles under Piezoelectric Field. ACS APPLIED MATERIALS & INTERFACES 2024; 16:36735-36744. [PMID: 38952105 DOI: 10.1021/acsami.4c00092] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/03/2024]
Abstract
The piezoelectric properties of two-dimensional semiconductor nanobubbles present remarkable potential for application in flexible optoelectronic devices, and the piezoelectric field has emerged as an efficacious pathway for both the separation and migration of photogenerated electron-hole pairs, along with inhibition of recombination. However, the comprehension and control of photogenerated carrier dynamics within nanobubbles still remain inadequate. Hence, this study is dedicated to underscore the importance of in situ detection and detailed characterization of photogenerated electron-hole pairs in nanobubbles to enrich understanding and strategic manipulation in two-dimensional semiconductor materials. Utilizing frequency modulation kelvin probe force microscopy (FM-KPFM) and strain gradient distribution techniques, the existence of a piezoelectric field in monolayer WS2 nanobubbles was confirmed. Combining w/o and with illumination FM-KPFM, second-order capacitance gradient technique and in situ nanoscale tip-enhanced photoluminescence characterization techniques, the interrelationships among the piezoelectric effect, interlayer carrier transfer, and the funneling effect for photocarrier dynamics process across various nanobubble sizes were revealed. Notably, for a WS2/graphene bubble height of 15.45 nm, a 0 mV surface potential difference was recorded in the bubble region w/o and with illumination, indicating a mutual offset of piezoelectric effect, interlayer carrier transfer, and the funneling effect. This phenomenon is prevalent in transition metal dichalcogenides materials exhibiting inversion symmetry breaking. The implication of our study is profound for advancing the understanding of the dynamics of photogenerated electron-hole pair in nonuniform strain piezoelectric systems, and offers a reliable framework for the separation and modulation of photogenerated electron-hole pair in flexible optoelectronic devices and photocatalytic applications.
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Affiliation(s)
- Sheng Han
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Jiong Liu
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Ana I Pérez-Jiménez
- Technology Innovation Institute, 9639, Masdar City, Abu Dhabi, United Arab Emirates
| | - Zhou Lei
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Pei Yan
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Yu Zhang
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Xiangyu Guo
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Rongxu Bai
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Shen Hu
- School of Microelectronics, Fudan University, Shanghai 200433, China
- Jiashan Fudan Institute, Jiaxing 314110, China
| | - Xuefeng Wu
- School of Microelectronics, Fudan University, Shanghai 200433, China
- Shanghai Integrated Circuit Manufacturing Innovation Center, Shanghai 201210, China
| | - David W Zhang
- School of Microelectronics, Fudan University, Shanghai 200433, China
- Shanghai Integrated Circuit Manufacturing Innovation Center, Shanghai 201210, China
- Jiashan Fudan Institute, Jiaxing 314110, China
- Hubei Yangtze Memory Laboratories, Wuhan 430205, China
| | - Qingqing Sun
- School of Microelectronics, Fudan University, Shanghai 200433, China
- Shanghai Integrated Circuit Manufacturing Innovation Center, Shanghai 201210, China
- Jiashan Fudan Institute, Jiaxing 314110, China
| | - Deji Akinwande
- Microelectronic Research Center, Department of Electrical and Computer Engineering, The University of Texas at Austin, Austin 78758, United States
| | - Edward T Yu
- Microelectronic Research Center, Department of Electrical and Computer Engineering, The University of Texas at Austin, Austin 78758, United States
| | - Li Ji
- School of Microelectronics, Fudan University, Shanghai 200433, China
- Shanghai Integrated Circuit Manufacturing Innovation Center, Shanghai 201210, China
- Jiashan Fudan Institute, Jiaxing 314110, China
- Hubei Yangtze Memory Laboratories, Wuhan 430205, China
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3
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Røst HI, Reed BP, Strand FS, Durk JA, Evans DA, Grubišić-Čabo A, Wan G, Cattelan M, Prieto MJ, Gottlob DM, Tănase LC, de Souza Caldas L, Schmidt T, Tadich A, Cowie BCC, Chellappan RK, Wells JW, Cooil SP. A Simplified Method for Patterning Graphene on Dielectric Layers. ACS APPLIED MATERIALS & INTERFACES 2021; 13:37510-37516. [PMID: 34328712 PMCID: PMC8365599 DOI: 10.1021/acsami.1c09987] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/29/2021] [Accepted: 07/13/2021] [Indexed: 06/13/2023]
Abstract
The large-scale formation of patterned, quasi-freestanding graphene structures supported on a dielectric has so far been limited by the need to transfer the graphene onto a suitable substrate and contamination from the associated processing steps. We report μm scale, few-layer graphene structures formed at moderate temperatures (600-700 °C) and supported directly on an interfacial dielectric formed by oxidizing Si layers at the graphene/substrate interface. We show that the thickness of this underlying dielectric support can be tailored further by an additional Si intercalation of the graphene prior to oxidation. This produces quasi-freestanding, patterned graphene on dielectric SiO2 with a tunable thickness on demand, thus facilitating a new pathway to integrated graphene microelectronics.
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Affiliation(s)
- Håkon I. Røst
- Center
for Quantum Spintronics, Department of Physics, Norwegian University of Science and Technology (NTNU), NO-7491 Trondheim, Norway
| | - Benjamen P. Reed
- Department
of Physics, Aberystwyth University, Aberystwyth SY23 3BZ, United Kingdom
| | - Frode S. Strand
- Center
for Quantum Spintronics, Department of Physics, Norwegian University of Science and Technology (NTNU), NO-7491 Trondheim, Norway
| | - Joseph A. Durk
- Department
of Physics, Aberystwyth University, Aberystwyth SY23 3BZ, United Kingdom
| | - D. Andrew Evans
- Department
of Physics, Aberystwyth University, Aberystwyth SY23 3BZ, United Kingdom
| | - Antonija Grubišić-Čabo
- School
of Physics & Astronomy, Monash University, 1 Wellington Rd., Clayton, Victoria 3800, Australia
| | - Gary Wan
- School
of Physics, HH Wills Physics Laboratory, University of Bristol, Tyndall Avenue, Bristol BS8 1TL, United Kingdom
| | - Mattia Cattelan
- School
of Chemistry, University of Bristol, Cantocks Close, Bristol BS8 1TS, United
Kingdom
| | - Mauricio J. Prieto
- Department
of Interface Science, Fritz-Haber-Institute
of the Max-Planck Society, Faradayweg 4-6, 14195 Berlin, Germany
| | - Daniel M. Gottlob
- Department
of Interface Science, Fritz-Haber-Institute
of the Max-Planck Society, Faradayweg 4-6, 14195 Berlin, Germany
| | - Liviu C. Tănase
- Department
of Interface Science, Fritz-Haber-Institute
of the Max-Planck Society, Faradayweg 4-6, 14195 Berlin, Germany
| | - Lucas de Souza Caldas
- Department
of Interface Science, Fritz-Haber-Institute
of the Max-Planck Society, Faradayweg 4-6, 14195 Berlin, Germany
| | - Thomas Schmidt
- Department
of Interface Science, Fritz-Haber-Institute
of the Max-Planck Society, Faradayweg 4-6, 14195 Berlin, Germany
| | - Anton Tadich
- Australian
Synchrotron, 800 Blackburn
Rd., Clayton, Victoria 3168, Australia
| | - Bruce C. C. Cowie
- Australian
Synchrotron, 800 Blackburn
Rd., Clayton, Victoria 3168, Australia
| | - Rajesh Kumar Chellappan
- Center
for Quantum Spintronics, Department of Physics, Norwegian University of Science and Technology (NTNU), NO-7491 Trondheim, Norway
| | - Justin W. Wells
- Center
for Quantum Spintronics, Department of Physics, Norwegian University of Science and Technology (NTNU), NO-7491 Trondheim, Norway
- Semiconductor
Physics, Department of Physics, University
of Oslo (UiO), NO-0371 Oslo, Norway
| | - Simon P. Cooil
- Department
of Physics, Aberystwyth University, Aberystwyth SY23 3BZ, United Kingdom
- Semiconductor
Physics, Department of Physics, University
of Oslo (UiO), NO-0371 Oslo, Norway
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4
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Bayazit M, Xiong L, Jiang C, Moniz SJA, White E, Shaffer MSP, Tang J. Defect-Free Single-Layer Graphene by 10 s Microwave Solid Exfoliation and Its Application for Catalytic Water Splitting. ACS APPLIED MATERIALS & INTERFACES 2021; 13:28600-28609. [PMID: 34110762 PMCID: PMC8289231 DOI: 10.1021/acsami.1c03906] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 03/01/2021] [Accepted: 05/30/2021] [Indexed: 06/12/2023]
Abstract
Mass production of defect-free single-layer graphene flakes (SLGFs) by a cost-effective approach is still very challenging. Here, we report such single-layer graphene flakes (SLGFs) (>90%) prepared by a nondestructive, energy-efficient, and easy up-scalable physical approach. These high-quality graphene flakes are attributed to a novel 10 s microwave-modulated solid-state approach, which not only fast exfoliates graphite in air but also self-heals the surface of graphite to remove the impurities. The fabricated high-quality graphene films (∼200 nm) exhibit a sheet resistance of ∼280 Ω/sq without any chemical or physical post-treatment. Furthermore, graphene-incorporated Ni-Fe electrodes represent a remarkable ∼140 mA/cm2 current for the catalytic water oxidation reaction compared with the pristine Ni-Fe electrode (∼10 mA/cm2) and a 120 mV cathodic shift in onset potential under identical experimental conditions, together with a faradic efficiency of >90% for an ideal ratio of H2 and O2 production from water. All these excellent performances are attributed to extremely high conductivity of the defect-free graphene flakes.
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Affiliation(s)
- Mustafa
K. Bayazit
- Department
of Chemical Engineering, University College
London, Torrington Place, London WC1E 7JE, U.K.
| | - Lunqiao Xiong
- Department
of Chemical Engineering, University College
London, Torrington Place, London WC1E 7JE, U.K.
| | - Chaoran Jiang
- Department
of Chemical Engineering, University College
London, Torrington Place, London WC1E 7JE, U.K.
| | - Savio J. A. Moniz
- Department
of Chemical Engineering, University College
London, Torrington Place, London WC1E 7JE, U.K.
| | - Edward White
- Department
of Chemistry, Imperial College London, London SW7 2AZ, U.K.
| | | | - Junwang Tang
- Department
of Chemical Engineering, University College
London, Torrington Place, London WC1E 7JE, U.K.
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5
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Towards standardisation of contact and contactless electrical measurements of CVD graphene at the macro-, micro- and nano-scale. Sci Rep 2020; 10:3223. [PMID: 32081982 PMCID: PMC7035257 DOI: 10.1038/s41598-020-59851-1] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/01/2019] [Accepted: 12/05/2019] [Indexed: 11/16/2022] Open
Abstract
Graphene has become the focus of extensive research efforts and it can now be produced in wafer-scale. For the development of next generation graphene-based electronic components, electrical characterization of graphene is imperative and requires the measurement of work function, sheet resistance, carrier concentration and mobility in both macro-, micro- and nano-scale. Moreover, commercial applications of graphene require fast and large-area mapping of electrical properties, rather than obtaining a single point value, which should be ideally achieved by a contactless measurement technique. We demonstrate a comprehensive methodology for measurements of the electrical properties of graphene that ranges from nano- to macro- scales, while balancing the acquisition time and maintaining the robust quality control and reproducibility between contact and contactless methods. The electrical characterisation is achieved by using a combination of techniques, including magneto-transport in the van der Pauw geometry, THz time-domain spectroscopy mapping and calibrated Kelvin probe force microscopy. The results exhibit excellent agreement between the different techniques. Moreover, we highlight the need for standardized electrical measurements in highly controlled environmental conditions and the application of appropriate weighting functions.
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6
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Heilmann M, Prikhodko AS, Hanke M, Sabelfeld A, Borgardt NI, Lopes JMJ. Influence of Proximity to Supporting Substrate on van der Waals Epitaxy of Atomically Thin Graphene/Hexagonal Boron Nitride Heterostructures. ACS APPLIED MATERIALS & INTERFACES 2020; 12:8897-8907. [PMID: 31971775 DOI: 10.1021/acsami.9b21490] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Combining graphene and the insulating hexagonal boron nitride (h-BN) into two-dimensional heterostructures is promising for novel, atomically thin electronic nanodevices. A heteroepitaxial growth, in which these materials are grown on top of each other, will be crucial for their scalable device integration. However, during this so-called van der Waals epitaxy, not only the atomically thin substrate itself must be considered but also the influences from the supporting substrate below it. Here, we report not only a substantial difference between the formation of h-BN on single- (SLG) and on bi-layer epitaxial graphene (BLG) on SiC, but also vice versa, that the van der Waals epitaxy of h-BN at growth temperatures well below 1000 °C affects the varying number of graphene layers differently. Our results clearly demonstrate that the additional graphene layer in BLG enhances the distance to the corrugated, carbon-rich interface of the supporting SiC substrate and thereby diminishes its influence on the van der Waals epitaxy, leading to a homogeneous formation of a smooth, atomically thin heterostructure, which will be required for a scalable device integration of 2D heterostructures.
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Affiliation(s)
- Martin Heilmann
- Leibniz-Institut im Forschungsverbund Berlin e.V. , Paul-Drude-Institut für Festkörperelektronik , Hausvogteiplatz 5-7 , 10117 Berlin , Germany
| | - Alexander S Prikhodko
- National Research University of Electronic Technology (MIET) , Zelenograd 124498 , Moscow , Russia
| | - Michael Hanke
- Leibniz-Institut im Forschungsverbund Berlin e.V. , Paul-Drude-Institut für Festkörperelektronik , Hausvogteiplatz 5-7 , 10117 Berlin , Germany
| | - Alexander Sabelfeld
- Leibniz-Institut im Forschungsverbund Berlin e.V. , Paul-Drude-Institut für Festkörperelektronik , Hausvogteiplatz 5-7 , 10117 Berlin , Germany
| | - Nikolai I Borgardt
- National Research University of Electronic Technology (MIET) , Zelenograd 124498 , Moscow , Russia
| | - J Marcelo J Lopes
- Leibniz-Institut im Forschungsverbund Berlin e.V. , Paul-Drude-Institut für Festkörperelektronik , Hausvogteiplatz 5-7 , 10117 Berlin , Germany
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7
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Enhanced Performance of a Visible Light Detector Made with Quasi-Free-Standing Graphene on SiC. MATERIALS 2019; 12:ma12193227. [PMID: 31581618 PMCID: PMC6804206 DOI: 10.3390/ma12193227] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 08/16/2019] [Revised: 09/15/2019] [Accepted: 09/27/2019] [Indexed: 01/21/2023]
Abstract
The excellent optoelectronic properties of graphene give it great potential for applications in optical detection. Among the graphenes obtained through many synthetic methods, epitaxial graphene obtained by thermal decomposition on silicon carbide has remarkable advantages for preparing photodetectors. In this research, epitaxial graphene has been successfully prepared on a silicon surface (0001) of semi-insulating 4H-SiC substrate with a size of 10 mm × 10 mm and epitaxial graphene has been converted to quasi-free-standing graphene by hydrogen passivation. Two metal-graphene-metal photodetectors were fabricated using the two types of graphenes above and the photo-absorption properties of detectors have been investigated under 650-nm laser illumination with different illumination powers. From a comparison of the performances between the two detectors, it was found that a photodetector fabricated with quasi-free-standing graphene shows enhanced performance under a light power of 0.018 mW. Responsivity and external quantum efficiency reach maxima of 5.11 A/W and 9.74%, respectively. This dramatic improvement is mainly due to the disappearance of the buffer layer in epitaxial graphene, providing a new method to achieve optimization of graphene-based opto-electrical devices.
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8
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Farell M, Wetherington M, Shankla M, Chae I, Subramanian S, Kim SH, Aksimentiev A, Robinson J, Kumar M. Characterization of the Lipid Structure and Fluidity of Lipid Membranes on Epitaxial Graphene and Their Correlation to Graphene Features. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2019; 35:4726-4735. [PMID: 30844287 PMCID: PMC6449857 DOI: 10.1021/acs.langmuir.9b00164] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Graphene has been recognized as an enhanced platform for biosensors because of its high electron mobility. To integrate active membrane proteins into graphene-based materials for such applications, graphene's surface must be functionalized with lipids to mimic the biological environment of these proteins. Several studies have examined supported lipids on various types of graphene and obtained conflicting results for the lipid structure. Here, we present a correlative characterization technique based on fluorescence measurements in a Raman spectroscopy setup to study the lipid structure and dynamics on epitaxial graphene. Compared to other graphene variations, epitaxial graphene is grown on a substrate more conducive to production of electronics and offers unique topographic features. On the basis of experimental and computational results, we propose that a lipid sesquilayer (1.5 bilayer) forms on epitaxial graphene and demonstrate that the distinct surface features of epitaxial graphene affect the structure and diffusion of supported lipids.
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Affiliation(s)
| | | | - Manish Shankla
- Department of Physics , University of Illinois at Urbana Champaign , Urbana , Illinois 61801 , United States
| | | | | | | | - Aleksei Aksimentiev
- Department of Physics , University of Illinois at Urbana Champaign , Urbana , Illinois 61801 , United States
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9
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Surface potential and thin film quality of low work function metals on epitaxial graphene. Sci Rep 2018; 8:16487. [PMID: 30405192 PMCID: PMC6220296 DOI: 10.1038/s41598-018-34595-1] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/12/2018] [Accepted: 10/18/2018] [Indexed: 11/09/2022] Open
Abstract
Metal films deposited on graphene are known to influence its electronic properties, but little is known about graphene's interactions with very low work function rare earth metals. Here we report on the work functions of a wide range of metals deposited on n-type epitaxial graphene (EG) as measured by Kelvin Probe Force Microscopy (KPFM). We compare the behaviors of rare earth metals (Pr, Eu, Er, Yb, and Y) with commonly used noble metals (Cr, Cu, Rh, Ni, Au, and Pt). The rare earth films oxidize rapidly, and exhibit unique behaviors when on graphene. We find that the measured work function of the low work function group is consistently higher than predicted, unlike the noble metals, which is likely due to rapid oxidation during measurement. Some of the low work function metals interact with graphene; for example, Eu exhibits bonding anomalies along the metal-graphene perimeter. We observe no correlation between metal work function and photovoltage, implying the metal-graphene interface properties are a more determinant factor. Yb emerges as the best choice for future applications requiring a low-work function electrical contact on graphene. Yb films have the strongest photovoltage response and maintains a relatively low surface roughness, ~5 nm, despite sensitivity to oxidation.
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10
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Whelan PR, Panchal V, Petersen DH, Mackenzie DMA, Melios C, Pasternak I, Gallop J, Østerberg FW, U Jepsen P, Strupinski W, Kazakova O, Bøggild P. Electrical Homogeneity Mapping of Epitaxial Graphene on Silicon Carbide. ACS APPLIED MATERIALS & INTERFACES 2018; 10:31641-31647. [PMID: 30130090 DOI: 10.1021/acsami.8b11428] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Epitaxial graphene is a promising route to wafer-scale production of electronic graphene devices. Chemical vapor deposition of graphene on silicon carbide offers epitaxial growth with layer control but is subject to significant spatial and wafer-to-wafer variability. We use terahertz time-domain spectroscopy and micro four-point probes to analyze the spatial variations of quasi-freestanding bilayer graphene grown on 4 in. silicon carbide (SiC) wafers and find significant variations in electrical properties across large regions, which are even reproduced across graphene on different SiC wafers cut from the same ingot. The dc sheet conductivity of epitaxial graphene was found to vary more than 1 order of magnitude across a 4 in. SiC wafer. To determine the origin of the variations, we compare different optical and scanning probe microscopies with the electrical measurements from nano- to millimeter scale and identify three distinct qualities of graphene, which can be attributed to the microstructure of the SiC surface.
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Affiliation(s)
- Patrick R Whelan
- DTU Fotonik , Technical University of Denmark , Ørsteds Plads 343 , DK-2800 Kongens Lyngby , Denmark
| | - Vishal Panchal
- National Physical Laboratory , Hampton Road , Teddington TW11 0LW , U.K
| | | | | | - Christos Melios
- National Physical Laboratory , Hampton Road , Teddington TW11 0LW , U.K
| | - Iwona Pasternak
- Faculty of Physics , Warsaw University of Technology , Koszykowa 75 , 00-662 Warsaw , Poland
| | - John Gallop
- National Physical Laboratory , Hampton Road , Teddington TW11 0LW , U.K
| | | | - Peter U Jepsen
- DTU Fotonik , Technical University of Denmark , Ørsteds Plads 343 , DK-2800 Kongens Lyngby , Denmark
| | - Wlodek Strupinski
- Faculty of Physics , Warsaw University of Technology , Koszykowa 75 , 00-662 Warsaw , Poland
| | - Olga Kazakova
- National Physical Laboratory , Hampton Road , Teddington TW11 0LW , U.K
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11
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Abstract
By combining optical imaging, Raman spectroscopy, kelvin probe force microscopy (KFPM), and photoemission electron microscopy (PEEM), we show that graphene’s layer orientation, as well as layer thickness, measurably changes the surface potential (Φ). Detailed mapping of variable-thickness, rotationally-faulted graphene films allows us to correlate Φ with specific morphological features. Using KPFM and PEEM we measure ΔΦ up to 39 mV for layers with different twist angles, while ΔΦ ranges from 36–129 mV for different layer thicknesses. The surface potential between different twist angles or layer thicknesses is measured at the KPFM instrument resolution of ≤ 200 nm. The PEEM measured work function of 4.4 eV for graphene is consistent with doping levels on the order of 1012cm−2. We find that Φ scales linearly with Raman G-peak wavenumber shift (slope = 22.2 mV/cm−1) for all layers and twist angles, which is consistent with doping-dependent changes to graphene’s Fermi energy in the ‘high’ doping limit. Our results here emphasize that layer orientation is equally important as layer thickness when designing multilayer two-dimensional systems where surface potential is considered.
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12
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Melios C, Winters M, Strupiński W, Panchal V, Giusca CE, Imalka Jayawardena KDG, Rorsman N, Silva SRP, Kazakova O. Tuning epitaxial graphene sensitivity to water by hydrogen intercalation. NANOSCALE 2017; 9:3440-3448. [PMID: 28232984 DOI: 10.1039/c6nr09465a] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The effects of humidity on the electronic properties of quasi-free standing one layer graphene (QFS 1LG) are investigated via simultaneous magneto-transport in the van der Pauw geometry and local work function measurements in a controlled environment. QFS 1LG on 4H-SiC(0001) is obtained by hydrogen intercalation of the interfacial layer. In this system, the carrier concentration experiences a two-fold increase in sensitivity to changes in relative humidity as compared to the as-grown epitaxial graphene. This enhanced sensitivity to water is attributed to the lowering of the hydrophobicity of QFS 1LG, which results from spontaneous polarization of 4H-SiC(0001) strongly influencing the graphene. Moreover, the superior carrier mobility of the QFS 1LG system is retained even at the highest humidity. The work function maps constructed from Kelvin probe force microscopy also revealed higher sensitivity to water for 1LG compared to 2LG in both QFS 1LG and as-grown systems. These results point to a new field of applications for QFS 1LG, i.e., as humidity sensors, and the corresponding need for metrology in calibration of graphene-based sensors and devices.
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Affiliation(s)
- C Melios
- National Physical Laboratory, Teddington, TW11 0LW, UK. and Advanced Technology Institute, University of Surrey, Guildford, GU2 7XH, UK
| | - M Winters
- Chalmers University of Technology, Dept. of Microtechnology and Nanoscience, Göteborg, 412-96, Sweden
| | - W Strupiński
- Institute of Electronic Materials Technology, Warsaw, 01-919, Poland
| | - V Panchal
- National Physical Laboratory, Teddington, TW11 0LW, UK.
| | - C E Giusca
- National Physical Laboratory, Teddington, TW11 0LW, UK.
| | | | - N Rorsman
- Chalmers University of Technology, Dept. of Microtechnology and Nanoscience, Göteborg, 412-96, Sweden
| | - S Ravi P Silva
- Advanced Technology Institute, University of Surrey, Guildford, GU2 7XH, UK
| | - O Kazakova
- National Physical Laboratory, Teddington, TW11 0LW, UK.
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Altfeder I, Voevodin AA, Check MH, Eichfeld SM, Robinson JA, Balatsky AV. Scanning Tunneling Microscopy Observation of Phonon Condensate. Sci Rep 2017; 7:43214. [PMID: 28225066 PMCID: PMC5320553 DOI: 10.1038/srep43214] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/21/2016] [Accepted: 01/20/2017] [Indexed: 11/09/2022] Open
Abstract
Using quantum tunneling of electrons into vibrating surface atoms, phonon oscillations can be observed on the atomic scale. Phonon interference patterns with unusually large signal amplitudes have been revealed by scanning tunneling microscopy in intercalated van der Waals heterostructures. Our results show that the effective radius of these phonon quasi-bound states, the real-space distribution of phonon standing wave amplitudes, the scattering phase shifts, and the nonlinear intermode coupling strongly depend on the presence of defect-induced scattering resonance. The observed coherence of these quasi-bound states most likely arises from phase- and frequency-synchronized dynamics of all phonon modes, and indicates the formation of many-body condensate of optical phonons around resonant defects. We found that increasing the strength of the scattering resonance causes the increase of the condensate droplet radius without affecting the condensate fraction inside it. The condensate can be observed at room temperature.
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Affiliation(s)
- Igor Altfeder
- Nanoelectronic Materials Branch, Air Force Research Laboratory, Wright Patterson AFB, OH 45433, USA
| | - Andrey A. Voevodin
- Nanoelectronic Materials Branch, Air Force Research Laboratory, Wright Patterson AFB, OH 45433, USA
- Department of Materials Science and Engineering, University of North Texas, Denton, Texas 76203, USA
| | - Michael H. Check
- Nanoelectronic Materials Branch, Air Force Research Laboratory, Wright Patterson AFB, OH 45433, USA
| | - Sarah M. Eichfeld
- Department of Materials Science and Engineering and The Center for Two-Dimensional and Layered Materials, The Pennsylvania State University, University Park, PA 16802, USA
| | - Joshua A. Robinson
- Department of Materials Science and Engineering and The Center for Two-Dimensional and Layered Materials, The Pennsylvania State University, University Park, PA 16802, USA
| | - Alexander V. Balatsky
- Institute for Materials Science, Los Alamos National Laboratory, Los Alamos, NM 87545, USA
- Nordita, Center for Quantum Materials, KTH Royal Institute of Technology and Stockholm University, Roslagstullsbacken 23, 10691 Stockholm, Sweden
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14
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Eklöf J, Gschneidtner T, Lara-Avila S, Nygård K, Moth-Poulsen K. Controlling deposition of nanoparticles by tuning surface charge of SiO 2 by surface modifications. RSC Adv 2016; 6:104246-104253. [PMID: 28066544 PMCID: PMC5171215 DOI: 10.1039/c6ra22412a] [Citation(s) in RCA: 25] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/07/2016] [Accepted: 10/23/2016] [Indexed: 12/18/2022] Open
Abstract
The self-assembly of nanoparticles on substrates is relevant for a variety of applications such as plasmonics, sensing devices and nanometer-sized electronics. We investigate the deposition of 60 nm spherical Au nanoparticles onto silicon dioxide (SiO2) substrates by changing the chemical treatment of the substrate and by that altering the surface charge. The deposition is characterized by scanning electron microscopy (SEM). Kelvin probe force microscopy (KPFM) was used to characterize the surface workfunction. The underlying physics involved in the deposition of nanoparticles was described by a model based on Derjaguin-Landau-Verwey-Overbeek (DLVO) theory combined with random sequential adsorption (RSA). The spatial statistical method Ripley's K-function was used to verify the DLVO-RSA model (ERSA). The statistical results also showed that the adhered particles exhibit a short-range order at distances below ~300 nm. This method can be used in future research to predict the deposition densities of charged nanoparticles onto charged surfaces.
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Affiliation(s)
- Johnas Eklöf
- Department of Chemistry and Chemical Engineering, Chalmers University of Technology, Gothenburg SE-412 96, Sweden.
| | - Tina Gschneidtner
- Department of Chemistry and Chemical Engineering, Chalmers University of Technology, Gothenburg SE-412 96, Sweden.
| | - Samuel Lara-Avila
- Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg SE-412 96, Sweden
| | - Kim Nygård
- Department of Chemistry & Molecular Biology, University of Gothenburg, Gothenburg SE-412 96, Sweden
| | - Kasper Moth-Poulsen
- Department of Chemistry and Chemical Engineering, Chalmers University of Technology, Gothenburg SE-412 96, Sweden.
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15
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Williams JOD, Alexander-Webber JA, Lapington JS, Roy M, Hutchinson IB, Sagade AA, Martin MB, Braeuninger-Weimer P, Cabrero-Vilatela A, Wang R, De Luca A, Udrea F, Hofmann S. Towards a Graphene-Based Low Intensity Photon Counting Photodetector. SENSORS (BASEL, SWITZERLAND) 2016; 16:E1351. [PMID: 27563903 PMCID: PMC5038629 DOI: 10.3390/s16091351] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/19/2016] [Revised: 07/15/2016] [Accepted: 08/15/2016] [Indexed: 06/06/2023]
Abstract
Graphene is a highly promising material in the development of new photodetector technologies, in particular due its tunable optoelectronic properties, high mobilities and fast relaxation times coupled to its atomic thinness and other unique electrical, thermal and mechanical properties. Optoelectronic applications and graphene-based photodetector technology are still in their infancy, but with a range of device integration and manufacturing approaches emerging this field is progressing quickly. In this review we explore the potential of graphene in the context of existing single photon counting technologies by comparing their performance to simulations of graphene-based single photon counting and low photon intensity photodetection technologies operating in the visible, terahertz and X-ray energy regimes. We highlight the theoretical predictions and current graphene manufacturing processes for these detectors. We show initial experimental implementations and discuss the key challenges and next steps in the development of these technologies.
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Affiliation(s)
- Jamie O D Williams
- Department of Physics and Astronomy, University of Leicester, University Road, Leicester LE1 7RH, UK.
| | - Jack A Alexander-Webber
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK.
| | - Jon S Lapington
- Department of Physics and Astronomy, University of Leicester, University Road, Leicester LE1 7RH, UK.
| | - Mervyn Roy
- Department of Physics and Astronomy, University of Leicester, University Road, Leicester LE1 7RH, UK.
| | - Ian B Hutchinson
- Department of Physics and Astronomy, University of Leicester, University Road, Leicester LE1 7RH, UK.
| | - Abhay A Sagade
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK.
| | - Marie-Blandine Martin
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK.
| | | | - Andrea Cabrero-Vilatela
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK.
| | - Ruizhi Wang
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK.
| | - Andrea De Luca
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK.
| | - Florin Udrea
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK.
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK.
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16
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Yurtsever A, Onoda J, Iimori T, Niki K, Miyamachi T, Abe M, Mizuno S, Tanaka S, Komori F, Sugimoto Y. Effects of Pb Intercalation on the Structural and Electronic Properties of Epitaxial Graphene on SiC. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2016; 12:3956-3966. [PMID: 27295020 DOI: 10.1002/smll.201600666] [Citation(s) in RCA: 14] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/28/2016] [Revised: 05/13/2016] [Indexed: 06/06/2023]
Abstract
The effects of Pb intercalation on the structural and electronic properties of epitaxial single-layer graphene grown on SiC(0001) substrate are investigated using scanning tunneling microscopy (STM), noncontact atomic force microscopy, Kelvin probe force microscopy (KPFM), X-ray photoelectron spectroscopy, and angle-resolved photoemission spectroscopy (ARPES) methods. The STM results show the formation of an ordered moiré superstructure pattern induced by Pb atom intercalation underneath the graphene layer. ARPES measurements reveal the presence of two additional linearly dispersing π-bands, providing evidence for the decoupling of the buffer layer from the underlying SiC substrate. Upon Pb intercalation, the Si 2p core level spectra show a signature for the existence of PbSi chemical bonds at the interface region, as manifested in a shift of 1.2 eV of the bulk SiC component toward lower binding energies. The Pb intercalation gives rise to hole-doping of graphene and results in a shift of the Dirac point energy by about 0.1 eV above the Fermi level, as revealed by the ARPES measurements. The KPFM experiments have shown that decoupling of the graphene layer by Pb intercalation is accompanied by a work function increase. The observed increase in the work function is attributed to the suppression of the electron transfer from the SiC substrate to the graphene layer. The Pb intercalated structure is found to be stable in ambient conditions and at high temperatures up to 1250 °C. These results demonstrate that the construction of a graphene-capped Pb/SiC system offers a possibility of tuning the graphene electronic properties and exploring intriguing physical properties such as superconductivity and spintronics.
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Affiliation(s)
- Ayhan Yurtsever
- Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka, 560-8531, Japan
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka, 567-0047, Japan
| | - Jo Onoda
- Graduate School of Engineering, Osaka University, 2-1 Yamada, Oka, Suita, Osaka, 565-0871, Japan
- Department of Advanced Materials Science, Graduate School of Frontier Sciences, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba, 277-8561, Japan
| | - Takushi Iimori
- The Institute for Solid State Physics, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba, 277-8581, Japan
| | - Kohei Niki
- Graduate School of Engineering, Osaka University, 2-1 Yamada, Oka, Suita, Osaka, 565-0871, Japan
- Department of Advanced Materials Science, Graduate School of Frontier Sciences, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba, 277-8561, Japan
| | - Toshio Miyamachi
- The Institute for Solid State Physics, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba, 277-8581, Japan
| | - Masayuki Abe
- Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka, 560-8531, Japan
| | - Seigi Mizuno
- Department of Molecular and Material Sciences, Kyushu University, Kasuga, Fukuoka, 816-8580, Japan
| | - Satoru Tanaka
- Department of Applied Quantum Physics and Nuclear Engineering, Kyushu University, Fukuoka, 819-0395, Japan
| | - Fumio Komori
- The Institute for Solid State Physics, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba, 277-8581, Japan
| | - Yoshiaki Sugimoto
- Graduate School of Engineering, Osaka University, 2-1 Yamada, Oka, Suita, Osaka, 565-0871, Japan
- Department of Advanced Materials Science, Graduate School of Frontier Sciences, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba, 277-8561, Japan
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17
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Binder J, Urban JM, Stepniewski R, Strupinski W, Wysmolek A. In situ Raman spectroscopy of the graphene/water interface of a solution-gated field-effect transistor: electron-phonon coupling and spectroelectrochemistry. NANOTECHNOLOGY 2016; 27:045704. [PMID: 26655462 DOI: 10.1088/0957-4484/27/4/045704] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
We present a novel measurement approach which combines the electrical characterization of solution-gated field-effect transistors based on epitaxial bilayer graphene on 4H-SiC (0001) with simultaneous Raman spectroscopy. By changing the gate voltage, we observed Raman signatures related to the resonant electron-phonon coupling. An analysis of these Raman bands enabled the extraction of the geometrical capacitance of the system and an accurate calculation of the Fermi levels for bilayer graphene. An intentional application of higher gate voltages allowed us to trigger electrochemical reactions, which we followed in situ by Raman spectroscopy. The reactions showed a partially reversible character, as indicated by an emergence/disappearance of peaks assigned to C-H and Si-H vibration modes as well as an increase/decrease of the defect-related Raman D band intensity. Our setup provides a highly interesting platform for future spectroelectrochemical research on electrically-induced sorption processes of graphene on the micrometer scale.
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Affiliation(s)
- J Binder
- Faculty of Physics, University of Warsaw, Pasteura 5, 02-093 Warsaw, Poland
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