Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

Efficient generation of Bessel-Gauss attosecond pulse trains via nonadiabatic phase-matched high-order harmonics

Generating Bessel-Gauss beams in the extreme ultraviolet (EUV) with attosecond pulse durations poses a significant challenge due to the limitations of conventional transmission optical components. Here, we propose a novel approach to produce such beams by inducing an annular EUV source through high-order harmonic generation (HHG) under nonadiabatic phase-matching conditions. The resulting light pulse maintains temporal coherence and manifests attosecond pulse trains as confirmed by the reconstruction of attosecond beating by interference of two-photon transitions (RABBIT) measurements. Macroscopic HHG calculations reproduce the measured spatiotemporal structures, demonstrating the plasma-induced spatial modulation on the formation of an annular source. Propagation simulations further confirm the feasibility of this approach for generating attosecond Bessel-Gauss beams, presenting exciting prospects for various applications in EUV photonics and attosecond science.

Ultrafast Laser Processing for High-Aspect-Ratio Structures

Over the past few decades, remarkable breakthroughs and progress have been achieved in ultrafast laser processing technology. Notably, the remarkable high-aspect-ratio processing capabilities of ultrafast lasers have garnered significant attention to meet the stringent performance and structural requirements of materials in specific applications. Consequently, high-aspect-ratio microstructure processing relying on nonlinear effects constitutes an indispensable aspect of this field. In the paper, we review the new features and physical mechanisms underlying ultrafast laser processing technology. It delves into the principles and research achievements of ultrafast laser-based high-aspect-ratio microstructure processing, with a particular emphasis on two pivotal technologies: filamentation processing and Bessel-like beam processing. Furthermore, the current challenges and future prospects for achieving both high precision and high aspect ratios simultaneously are discussed, aiming to provide insights and directions for the further advancement of high-aspect-ratio processing.

Modern Types of Axicons: New Functions and Applications

Axicon is a versatile optical element for forming a zero-order Bessel beam, including high-power laser radiation schemes. Nevertheless, it has drawbacks such as the produced beam's parameters being dependent on a particular element, the output beam's intensity distribution being dependent on the quality of element manufacturing, and uneven axial intensity distribution. To address these issues, extensive research has been undertaken to develop nondiffracting beams using a variety of advanced techniques. We looked at four different and special approaches for creating nondiffracting beams in this article. Diffractive axicons, meta-axicons-flat optics, spatial light modulators, and photonic integrated circuit-based axicons are among these approaches. Lately, there has been noteworthy curiosity in reducing the thickness and weight of axicons by exploiting diffraction. Meta-axicons, which are ultrathin flat optical elements made up of metasurfaces built up of arrays of subwavelength optical antennas, are one way to address such needs. In addition, when compared to their traditional refractive and diffractive equivalents, meta-axicons have a number of distinguishing advantages, including aberration correction, active tunability, and semi-transparency. This paper is not intended to be a critique of any method. We have outlined the most recent advancements in this field and let readers determine which approach best meets their needs based on the ease of fabrication and utilization. Moreover, one section is devoted to applications of axicons utilized as sensors of optical properties of devices and elements as well as singular beams states and wavefront features.

Hybrid application of laser-focused atomic deposition and extreme ultraviolet interference lithography methods for manufacturing of self-traceable nanogratings

A novel hybrid method that combines the laser-focused atomic deposition (LFAD) and extreme ultraviolet (EUV) interference lithography has been introduced. The Cr grating manufactured by LFAD has advantages of excellent uniformity, low line edge roughness and its pitch value determined directly by nature constants (i.e. self-traceable). To further enhance the density of the Cr grating, the EUV interference lithography with 13.4 nm wavelength was employed, which replicated the master Cr grating onto a Si wafer with its pitch reduced to half. In order to verify the performance of the gratings manufactured by this novel method, both mask grating (Cr grating) and replicated grating (silicon grating) were calibrated by the metrological large range scanning probe microscope (Met.LR-SPM) at Physikalisch-Technische Bundesanstalt (PTB). The calibrated results show that both gratings have excellent short-term and long-term uniformity: (i) the calibrated position deviation (i.e. nonlinearity) of the grating is below ±1 nm; (ii) the deviation of mean pitch values of 6 randomly selected measurement locations is below 0.003 nm. In addition, the mean pitch value of the Cr grating is calibrated as 212.781 ± 0.008 nm (k = 2). It well agrees with its theoretical value of 212.7787 ± 0.0049 nm, confirming the self-traceability of the manufactured grating by the LFAD. The mean pitch value of the Si grating is calibrated as 106.460 ± 0.012 nm (k = 2). It corresponds to the shrinking factor of 0.500 33 of the applied EUV interference lithographic technique. This factor is very close to its theoretical value of 0.5. The uniform, self-traceable gratings fabricated using this novel approach can be well applied as reference materials in calibrating, e.g. the magnification and uniformity of almost all kinds of high resolution microscopes for nanotechnology.

Twisted non-diffracting beams through all dielectric meta-axicons

We demonstrate transmission-based all-dielectric, highly efficient (≈73.4%) and polarization-insensitive meta-axicons (for the visible wavelength of 633 nm) to generate zero and higher order Bessel beams without using additional components. The Bessel beams, owing to their diverse applications and non-diffractive properties, attract great interest from the scientific community. It is shown that the propagation length can be increased through a lower numerical aperture (∼2600 λ for NA = 0.1) whereas a higher full width at half maximum (< 0.5 λ) can be obtained for a higher numerical aperture (for NA ≥ 0.7). Our dielectric material, hydrogenated amorphous silicon (a-Si:H), provides a significant efficiency advantage over plasmonic and other high-index all-dielectric (e.g., TiO₂ and GaN) metasurfaces in terms of cost, ease of fabrication, and CMOS compatibility. The finite difference time domain (FDTD) technique based numerically simulated and experimental results show excellent agreement. Due to the technological and scientific importance of the Bessel beams, the recommended material and meta-axicons provide an efficient and compact platform for realizing various advanced applications like optical manipulation, optical alignment, laser fabrication, imaging, and laser machining.

Parallel direct writing achromatic talbot lithography: a method for large-area arbitrary sub-micron periodic nano-arrays fabrication

Metasurfaces with complex periodic nanoarrays have attracted a large amount of attention over the past decades due to their pronounced plasmonic and photonic properties. Though various metasurface properties have been theoretically and experimentally investigated, the realization of practical metasurface applications remains a big challenge due to very limited large-area complex nanostructure fabrication. In this paper, we demonstrate a parallel direct writing achromatic Talbot lithography (DW-ATL) technique for large-area arbitrary sub-micron periodic nano-arrays fabrication. By using a laser interferometer, the sparse hole/dot arrays obtained by ATL could be stitched precisely between discrete multiple exposures. Complex sub-micron periodic nanoarrays, such as elliptical discs, rods, L-shaped and Y-shaped periodic nanoarrays, with a sub-hundred nm resolution were fabricated over an area of ∼mm².

Generation of Bessel beam sources in FDTD

In this paper, a straightforward approach is presented to generate Bessel beam sources in three-dimensional finite-difference time-domain (FDTD) method. Based on the angular spectrum representation (ASR), the incident Bessel beam is described as a superposition of plane waves whose wavevectors covering a conical surface. This decomposition of Bessel beam is then approximated by a finite collection of plane waves, which are injected into FDTD simulation domain using the total-field/scattered-field (TF/ST) method. The present method's correctness and accuracy are verified by comparing the reconstructed field in FDTD with the original field. Far-field scattered diagrams of a dielectric sphere and a spheroid particle illuminated by a zero-order or a higher-order Bessel beam are calculated using FDTD. The results are compared with those calculated using the generalized Lorenz-Mie theory (GLMT) and surface integral equation method (SIEM). Very good agreements have been achieved, which partially indicate the correctness of our method. Internal and near-surface field distributions for a two-layer hemisphere particle, which are illuminated by Bessel beams, are also displayed to show the potentials of this approach in solving scattering problems of complex particles. This approach can also be applied to generate other structured beam sources in FDTD, which provides an access to solve structured beam scattering by complex particles using FDTD.

Planar binary-phase lens for super-oscillatory optical hollow needles

Optical hollow beams are suitable for materials processing, optical micromanipulation, microscopy, and optical lithography. However, conventional optical hollow beams are diffraction-limited. The generation of sub-wavelength optical hollow beams using a high numerical aperture objective lens and pupil filters has been theoretically proposed. Although sub-diffraction hollow spot has been reported, nondiffracting hollow beams of sub-diffraction transverse dimensions have not yet been experimentally demonstrated. Here, a planar lens based on binary-phase modulation is proposed to overcome these constraints. The lens has an ultra-long focal length of 300λ. An azimuthally polarized optical hollow needle is experimentally demonstrated with a super-oscillatory transverse size (less than 0.38λ/NA) of 0.34λ to 0.42λ, where λ is the working wavelength and NA is the lens numerical aperture, and a large depth of focus of 6.5λ. For a sub-diffraction transverse size of 0.34λ to 0.52λ, the nondiffracting propagation distance of the proposed optical hollow needle is greater than 10λ. Numerical simulation also reveals a good penetrability of the proposed optical hollow needle at an air-water interface, where the needle propagates through water with a doubled propagation distance and without loss of its super-oscillatory property. The proposed lens is suitable for nanofabrication, optical nanomanipulation, super-resolution imaging, and nanolithography applications.