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Alexe-Ionescu A, Barbero G, Evangelista L, Lamberti A, Pedico A, Pirri C. Langmuir adsorption processes and ion transport under bias potential in capacitive deionisation cells. Electrochim Acta 2020. [DOI: 10.1016/j.electacta.2020.136288] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
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Gdovinová V, Tomašovičová N, Jeng SC, Zakutanská K, Kula P, Kopčanský P. Memory effect in nematic phase of liquid crystal doped with magnetic and non-magnetic nanoparticles. J Mol Liq 2019. [DOI: 10.1016/j.molliq.2019.03.001] [Citation(s) in RCA: 13] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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Evidence of both unusual dielectric mode at low frequencies and the co-existence of antiferroelectric, ferroelectric and paraelectric phases in a novel antiferroelectric liquid crystals mixture. J Mol Liq 2017. [DOI: 10.1016/j.molliq.2017.09.055] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
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Liu YH, Kao CH, Cheng TC, Wu CI, Wang JC. Data Retention Characterization of Gate-Injected Gold-Nanoparticle Non-Volatile Memory with Low-Damage CF₄-Plasma-Treated Blocking Oxide Layer. NANOMATERIALS 2017; 7:nano7110385. [PMID: 29125567 PMCID: PMC5707602 DOI: 10.3390/nano7110385] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/26/2017] [Revised: 11/04/2017] [Accepted: 11/05/2017] [Indexed: 11/16/2022]
Abstract
Gold-nanoparticle (Au-NP) non-volatile memories (NVMs) with low-damage CF4 plasma treatment on the blocking oxide (BO) layer have been investigated to present the gate injection of the holes. These holes, injected from the Al gate with the positive gate bias, were explained by the bandgap engineering of the gradually-fluorinated BO layer and the effective work function modulation of the Al gate. The Si–F complex in the BO layer was analyzed by X-ray photoelectron spectroscopy (XPS), while the depth of fluorine incorporation was verified using a secondary ion mass spectrometer (SIMS). In addition, the valence band modification of the fluorinated BO layer was examined by ultraviolet photoelectron spectroscopy (UPS) to support the bandgap engineering. The reactive power of the CF4 plasma treatment on the BO layer was modified to increase the electric field of the BO layer and raise the effective work function of the Al gate, leading to the hole-injection from the gate. The injected holes are trapped at the interface between the gold-nanoparticles (Au-NPs) and the tunneling oxide (TO) layer, resulting in superior data retention properties such as an extremely low charge loss of 5.7% at 104 s and a nearly negligible increase in charge loss at 85 °C of the CF4-plasma-treated Au-NP NVMs, which can be applied in highly reliable consumer electronics.
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Affiliation(s)
- Yu-Hua Liu
- Department of Electronic Engineering, Chang Gung University, Guishan Dist., Taoyuan 33302, Taiwan.
| | - Chyuan-Haur Kao
- Department of Electronic Engineering, Chang Gung University, Guishan Dist., Taoyuan 33302, Taiwan.
- Department of Electronic Engineering, Ming Chi University of Technology, Taishan Dist., New Taipei City 24301, Taiwan.
- Kidney Research Center, Department of Nephrology, Chang Gung Memorial Hospital, Linkou, Guishan Dist., Taoyuan 33305, Taiwan.
| | - Tsung-Chin Cheng
- Graduated Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 10617, Taiwan.
| | - Chih-I Wu
- Graduated Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 10617, Taiwan.
- Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan.
- Electronic and Optoelectronic System Research Laboratories, Industrial Technology Research Institute, Chutung, Hsinchu 31057, Taiwan.
| | - Jer-Chyi Wang
- Department of Electronic Engineering, Chang Gung University, Guishan Dist., Taoyuan 33302, Taiwan.
- Department of Electronic Engineering, Ming Chi University of Technology, Taishan Dist., New Taipei City 24301, Taiwan.
- Department of Neurosurgery, Chang Gung Memorial Hospital, Linkou, Guishan Dist., Taoyuan 33305, Taiwan.
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Pandey S, Singh DP, Agrahari K, Srivastava A, Czerwinski M, Kumar S, Manohar R. CdTe quantum dot dispersed ferroelectric liquid crystal: Transient memory with faster optical response and quenching of photoluminescence. J Mol Liq 2017. [DOI: 10.1016/j.molliq.2017.04.035] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/19/2022]
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Koduru HK, Marino L, Vallivedu J, Choi CJ, Scaramuzza N. Microstructural, wetting, and dielectric properties of plasma polymerized polypyrrole thin films. J Appl Polym Sci 2016. [DOI: 10.1002/app.43982] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/16/2023]
Affiliation(s)
- Hari Krishna Koduru
- Dipartimento Di Fisica; Università Degli Studi Della Calabria, via P. Bucci; 33B - 87036 Cubo Rende (CS) Italy
| | - Lucia Marino
- Dipartimento Di Fisica; Università Degli Studi Della Calabria, via P. Bucci; 33B - 87036 Cubo Rende (CS) Italy
| | - Janardhanam Vallivedu
- School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center (SPRC); Chonbuk National University; Jeonju 561-756 Republic of Korea
| | - Chel-Jong Choi
- School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center (SPRC); Chonbuk National University; Jeonju 561-756 Republic of Korea
| | - Nicola Scaramuzza
- Dipartimento Di Fisica; Università Degli Studi Della Calabria, via P. Bucci; 33B - 87036 Cubo Rende (CS) Italy
- CNISM - Unità Di Ricerca Di Cosenza C/O Dipartimento Di Fisica; Università Degli Studi Della Calabria; via P. Bucci 31C - 87036 Cubo Rende (CS) Italy
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Synthesis of Gold Nanoparticles Capped with Quaterthiophene for Transistor and Resistor Memory Devices. J CHEM-NY 2016. [DOI: 10.1155/2016/1247175] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022] Open
Abstract
Recently, the fabrication of nonvolatile memory devices based on gold nanoparticles has been intensively investigated. In this work, we report on the design and synthesis of new semiconducting quaterthiophene incorporating hexyl thiol group (4TT). Gold nanoparticles capped with4TT(4TTG) were prepared in a two-phase liquid-liquid system. These nanoparticles have diameters in the range 2–6 nm and are well dispersed in the poly(3-hexylthiophene) (P3HT) host matrix. The intermolecular interaction between4TTand P3HT could enhance the charge-transport between gold nanoparticles and P3HT. Transfer curve of transistor memory device made of4TTG/P3HT hybrid film exhibited significant current hysteresis, probably arising from the energy level barrier at4TTG/P3HT interface. Additionally, the polymer memory resistor structure with an active layer consisting of4TTGand P3HT displayed a remarkable electrical bistable behavior.
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