Design and development of a compact ion implanter and plasma diagnosis facility based on a 2.45 GHz microwave ion source

Development and Evaluation of Ferrite Core Inductively Coupled Plasma Radio Frequency Ion Source for High-Current Ion Implanters in Semiconductor Applications

This study presents the development of a ferrite core inductively coupled plasma (ICP) radio frequency (RF) ion source designed to improve the lifetime of ion sources in commercial ion implanters. Unlike existing DC methods, this novel approach aims to enhance the performance and lifetime of the ion source. We constructed a high-vacuum evaluation chamber to thoroughly examine RF ion source characteristics using a Langmuir probe. Comparative experiments assessed the extraction current of two upgraded ferrite core RF ion sources in a commercial ion implanter setting. Additionally, we tested the plasma lifetime of the ICP source and took temperature measurements of various components to verify the operational stability and efficiency of the innovative design. This study confirmed that the ICP RF ion source operated effectively under a high vacuum of 10-5 torr and in a high-voltage environment of 30 kV. We observed that the extraction current increased linearly with RF power. We also confirmed that BF3 gas, which presents challenging conditions, was stably ionized in the ICP RF ion sources.

Enhancing the electrochemical performance of TiO2 based material using microwave air plasma treatment with an ECR cavity

The microwave-based plasma treatment facility at the Central University of Punjab Bathinda (CUPB) based on 2.45 GHz has been used to investigate the impact on the electrochemical performance of TiO₂. This was accomplished by treating a number of pellets of TiO₂ sample material with microwave plasma at an input power of 80 W. The palette is subjected to microwave plasma treatment at 30-, 60-, 80-, and 100-s intervals. Many such characterization methods, including UV-visible spectroscopy, FTIR, XRD, and FESEM, have been applied to the study of the impact of plasma treatment on other physical and chemical properties in the context of untreated pellets. In the 80-s plasma treatment, the FTIR study showed that the (O-Ti-O) vibration band at 500-900 cm^-1 was wider than other bands. The UV results showed that an 80-s plasma treatment decreased the sample's band gap by 37% and increased the amount of disordered, amorphous material in the sample that had not been treated. XRD studies show that a sample that was treated with plasma for 80 s has low crystallinity and a high disorder (amorphous) factor. The Nyquist plot showed that the electrochemical charge transfer resistance drops from 7 (not treated) to 4 after 80 s of plasma treatment. In a study of electrochemical performance, a sample that was treated with plasma for 80 s has a capacitance that is 35% higher than a sample that was not treated.