Jeong HS, Kim YH, Lee JS, Kim JH, Srinivasarao M, Jung HT. Chiral nematic fluids as masks for lithography.
ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2012;
24:381-384. [PMID:
22162030 DOI:
10.1002/adma.201103817]
[Citation(s) in RCA: 10] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/05/2011] [Indexed: 05/31/2023]
Abstract
A lithographic scheme is reported that uses a cholesteric liquid crystal with its helical axis in the plane of the sample as a "mask" for imprinting patterns in a photoresist over a large area. On the application of an electric field the cholesteric liquid crystals produce a texture that acts as a lattice of cylindrical lenses for one polarization of a light beam. This is used in photolithography to create parallel lines over large areas.
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