Direct ArF laser photopatterning of metal oxide nanostructures prepared by the sol-gel route

Versatile Zirconium Oxide (ZrO2) Sol-Gel Development for the Micro-Structuring of Various Substrates (Nature and Shape) by Optical and Nano-Imprint Lithography

Zirconium oxide (ZrO₂) is a well-studied and promising material due to its remarkable chemical and physical properties. It is used, for example, in coatings for corrosion protection layer, wear and oxidation, in optical applications (mirror, filters), for decorative components, for anti-counterfeiting solutions and for medical applications. ZrO₂ can be obtained as a thin film using different deposition methods such as physical vapor deposition (PVD) or chemical vapor deposition (CVD). These techniques are mastered but they do not allow easy micro-nanostructuring of these coatings due to the intrinsic properties (high melting point, mechanical and chemical resistance). An alternative approach described in this paper is the sol-gel method, which allows direct micro-nanostructuring of the ZrO₂ layers without physical or chemical etching processes, using optical or nano-imprint lithography. In this paper, the authors present a complete and suitable ZrO₂ sol-gel method allowing to achieve complex micro-nanostructures by optical or nano-imprint lithography on substrates of different nature and shape (especially non-planar and foil-based substrates). The synthesis of the ZrO₂ sol-gel is presented as well as the micro-nanostructuring process by masking, colloidal lithography and nano-imprint lithography on glass and plastic substrates as well as on plane and curved substrates.

Direct Laser Writing of Crystallized TiO2 and TiO2 /Carbon Microstructures with Tunable Conductive Properties

Metal oxides are an important class of materials for optoelectronic applications. In this context, developing simple and versatile processes for integrating these materials at the microscale and nanoscale has become increasingly important. One of the major remaining challenges is to control the microstructuration and electro-optical properties in a single step. It is shown here that near-infrared femtosecond laser irradiation can be successfully used to prepare amorphous or crystallized TiO₂ microstructures in a single step using a direct laser writing (DLW) approach from a TiO₂ precursor thin film doped with a suitable dye. When laser writing is conducted under a nitrogen atmosphere, simultaneous to the crosslinking of the Ti-oxide precursor, the graphitization of the organic species embedded in the initial film is observed. In this case, a carbon network is generated within the TiO₂ matrix, which significantly increases the conductivity. Moreover, the TiO₂ /C nanocomposite exhibits piezoresistive behavior that is used in a pressure sensor device. Using this route, it is possible to use DLW to fabricate microsized pressure sensors.

Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly

Deep-UV (DUV) laser patterning has been widely used in recent years for micro- and nanopatterning, taking advantage of the specific properties of irradiation with high-energy photons. In this paper, we show the usefulness of DUV laser patterning for preparing surfaces with controlled chemical properties at the micro- and nanoscale. Our motivation was to develop a simple and versatile method for chemical patterning at multiscales (from mm to nm) over relatively wide areas (mm2 to cm2). The chemical properties were provided by self-assembled monolayers (SAMs), prepared on glass or silicon wafers. We first investigated their modification under our irradiation conditions (ArF laser) using AFM, XPS and contact angle measurements. Photopatterning was then demonstrated with minimum feature sizes as small as 75 nm, and we showed the possibility to regraft a second SAM on the irradiated regions. Finally, we used these chemically patterned surfaces for directed self-assembly of several types of objects, such as block copolymers, sol-gel materials and liquids by vapor condensation.

Optically controlled magnetic-field etching on the nano-scale

Electric and magnetic fields play an important role in both chemical and physical reactions. However, since the coupling efficiency between magnetic fields and electrons is low in comparison with that between electric fields and electrons in the visible wavelength region, the magnetic field is negligible in photo-induced reactions. Here, we performed photo-etching of ZrO₂ nano-stripe structures, and identified an etching-property polarisation dependence. Specifically, the etching rate and etched profiles depend on the structure width. To evaluate this polarisation-dependent etching, we performed numerical calculations using a finite-difference time-domain method. Remarkably, the numerical results revealed that the polarisation-dependent etching properties were determined by the magnetic field distributions, rather than the electric field distributions. As nano-scale structures induce a localised magnetic field, the discovery of this etching dependence on the magnetic field is expected to introduce a new perspective on advanced nano-scale structure fabrication.

Challenges in realizing ultraflat materials surfaces

Ultraflat surface substrates are required to achieve an optimal performance of future optical, electronic, or optoelectronic devices for various applications, because such surfaces reduce the scattering loss of photons, electrons, or both at the surfaces and interfaces. In this paper, we review recent progress toward the realization of ultraflat materials surfaces. First, we review the development of surface-flattening techniques. Second, we briefly review the dressed photon-phonon (DPP), a nanometric quasiparticle that describes the coupled state of a photon, an electron, and a multimode-coherent phonon. Then, we review several recent developments based on DPP-photochemical etching and desorption processes, which have resulted in angstrom-scale flat surfaces. To confirm that the superior flatness of these surfaces that originated from the DPP process, we also review a simplified mathematical model that describes the scale-dependent effects of optical near-fields. Finally, we present the future outlook for these technologies.

Direct nanopatterning of 100 nm metal oxide periodic structures by Deep-UV immersion lithography

Deep-UV lithography using high-efficiency phase mask has been developed to print 100 nm period grating on sol-gel based thin layer. High efficiency phase mask has been designed to produce a high-contrast interferogram (periodic fringes) under water immersion conditions for 244 nm laser. The demonstration has been applied to a new developed immersion-compatible sol-gel layer. A sol-gel photoresist prepared from zirconium alkoxides caped with methacrylic acids was developed to achieve 50 nm resolution in a single step exposure. The nanostructures can be thermally annealed into ZrO(2). Such route considerably simplifies the process for elaborating nanopatterned surfaces of transition metal oxides, and opens new routes for integrating materials of interest for applications in the field of photocatalysis, photovoltaic, optics, photonics or microelectronics.

Concentration dependence on the shape and size of sol-gel-derived yttria-stabilized zirconia ceramic features by soft lithographic patterning

Typical surface areas of 5 × 5 mm(2) were patterned with high-aspect-ratio micrometer- and submicrometer-sized structures of yttria-stabilized zirconia using a combination of micromolding in capillaries and sol-gel chemistry. The influence of precursor solution concentration and mold geometry on the final shape and dimensions of the patterned structures was investigated. At a precursor concentration of [Zr] = 0.724 mol/dm(3), isolated objects-due to the controlled cracking of patterned films-such as crosses (height 1.4 μm, width 6.0 μm) and "dog bones" (height 800-900 nm, width 900 nm) or patterned films (height 450 nm) were obtained, depending on the mold geometry. Lower precursor concentrations led to differently sized and shaped structures, with changes in dimensions of more than an order of magnitude. Employing a precursor concentration of [Zr] = 0.036 mol/dm(3) yielded isolated rings (height 100-150 nm, line width 20 nm) and squares (height 40 nm, line width 40 nm). A better understanding of the relationship between the precursor concentration, mold geometry, and observed coherent crack patterns in as-dried sol-gel structures may lead to new techniques in patterning isolated features.