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Schäfer C, Perera PN, Laible F, Olynick DL, Schwartzberg AM, Weber-Bargioni A, Cabrini S, Schuck PJ, Kern DP, Fleischer M. Selectively accessing the hotspots of optical nanoantennas by self-aligned dry laser ablation. NANOSCALE 2020; 12:19170-19177. [PMID: 32926034 DOI: 10.1039/d0nr04024j] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Plasmonic nanostructures serve as optical antennas for concentrating the energy of incoming light in localized hotspots close to their surface. By positioning nanoemitters in the antenna hotspots, energy transfer is enabled, leading to novel hybrid antenna-emitter-systems, where the antenna can be used to manipulate the optical properties of the nano-objects. The challenge remains how to precisely position emitters within the hotspots. We report a self-aligned process based on dry laser ablation of a calixarene that enables the attachment of molecules within the electromagnetic hotspots at the tips of gold nanocones. Within the laser focus, the ablation threshold is exceeded in nanoscale volumes, leading to selective access of the hotspot areas. A first indication of the site-selective functionalization process is given by attaching fluorescently labelled proteins to the nanocones. In a second example, Raman-active molecules are selectively attached only to nanocones that were previously exposed in the laser focus, which is verified by surface enhanced Raman spectroscopy. Enabling selective functionalization is an important prerequisite e.g. for preparing single photon sources for quantum optical technologies, or multiplexed Raman sensing platforms.
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Affiliation(s)
- Christian Schäfer
- Institute for Applied Physics and Center LISA+, Eberhard Karls Universität Tübingen, Auf der Morgenstelle 10, 72076 Tübingen, Germany.
| | - Pradeep N Perera
- The Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Building 67, Berkeley, CA 94720, USA
| | - Florian Laible
- Institute for Applied Physics and Center LISA+, Eberhard Karls Universität Tübingen, Auf der Morgenstelle 10, 72076 Tübingen, Germany.
| | - Deirdre L Olynick
- The Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Building 67, Berkeley, CA 94720, USA
| | - Adam M Schwartzberg
- The Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Building 67, Berkeley, CA 94720, USA
| | - Alexander Weber-Bargioni
- The Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Building 67, Berkeley, CA 94720, USA
| | - Stefano Cabrini
- The Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Building 67, Berkeley, CA 94720, USA
| | - P James Schuck
- The Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Building 67, Berkeley, CA 94720, USA
| | - Dieter P Kern
- Institute for Applied Physics and Center LISA+, Eberhard Karls Universität Tübingen, Auf der Morgenstelle 10, 72076 Tübingen, Germany.
| | - Monika Fleischer
- Institute for Applied Physics and Center LISA+, Eberhard Karls Universität Tübingen, Auf der Morgenstelle 10, 72076 Tübingen, Germany.
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Ashby PD, Olynick DL, Ogletree DF, Naulleau PP. Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2015; 27:5813-5819. [PMID: 26079187 DOI: 10.1002/adma.201501171] [Citation(s) in RCA: 14] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/10/2015] [Revised: 04/17/2015] [Indexed: 06/04/2023]
Abstract
Extreme ultraviolet lithography (EUVL) is the leading technology for enabling miniaturization of computational components over the next decade. Next-generation resists will need to meet demanding performance criteria of 10 nm critical dimension, 1.2 nm line-edge roughness, and 20 mJ cm(-2) exposure dose. Here, the current state of the development of EUV resist materials is reviewed. First, pattern formation in resist materials is described and the Hansen solubility sphere (HSS) is used as a framework for understanding the pattern-development process. Then, recent progress in EUVL resist chemistry and characterization is discussed. Incremental advances are obtained by transferring chemically amplified resist materials developed for 193 nm lithography to EUV wavelengths. Significant advances will result from synthesizing high-absorbance resist materials using heavier atoms. In the framework of the HSS model, these materials have significant room for improvement and thus offer great promise as high-performance EUV resists for patterning of sub-10 nm features.
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Affiliation(s)
- Paul D Ashby
- The Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA, 94720, USA
| | - Deirdre L Olynick
- The Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA, 94720, USA
| | - D Frank Ogletree
- The Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA, 94720, USA
| | - Patrick P Naulleau
- Center for X-ray Optics, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA, 94720, USA
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Olynick DL, Perera P, Schwartzberg A, Kulshreshta P, De Oteyza DG, Jarnagin N, Henderson C, Sun Z, Gunkel I, Russell T, Budden M, Rangelow IW. Selective Laser Ablation in Resists and Block Copolymers for High Resolution Lithographic Patterning. J PHOTOPOLYM SCI TEC 2015. [DOI: 10.2494/photopolymer.28.663] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
| | - Pradeep Perera
- Molecular Foundry, Lawrence Berkeley National Laboratory
| | | | | | | | - Nathan Jarnagin
- School of Chemistry and Biochemistry and School of Chemical Engineering, Georgia Institute of Technology
| | - Cliff Henderson
- School of Chemistry and Biochemistry and School of Chemical Engineering, Georgia Institute of Technology
| | - Zhiwei Sun
- Molecular Foundry, Lawrence Berkeley National Laboratory
- Department of Polymer Science and Engineering, University of Massachusetts Amherst
| | - Ilja Gunkel
- Molecular Foundry, Lawrence Berkeley National Laboratory
- Department of Polymer Science and Engineering, University of Massachusetts Amherst
| | - Thomas Russell
- Molecular Foundry, Lawrence Berkeley National Laboratory
- Department of Polymer Science and Engineering, University of Massachusetts Amherst
| | - Matthias Budden
- Department of Micro- and Nanoelectronic Systems (MNES), Ilmenau University of Technology
| | - Ivo W. Rangelow
- Department of Micro- and Nanoelectronic Systems (MNES), Ilmenau University of Technology
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