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For: Alves ADC, Newnham J, van Donkelaar JA, Rubanov S, McCallum JC, Jamieson DN. Controlled deterministic implantation by nanostencil lithography at the limit of ion-aperture straggling. Nanotechnology 2013;24:145304. [PMID: 23508018 DOI: 10.1088/0957-4484/24/14/145304] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/01/2023]
Number Cited by Other Article(s)
1
Dynamics of a single-atom electron pump. Sci Rep 2017;7:44371. [PMID: 28295055 PMCID: PMC5353750 DOI: 10.1038/srep44371] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/07/2016] [Accepted: 02/07/2017] [Indexed: 11/18/2022]  Open
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