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For: Wang L, Kirk E, Wäckerlin C, Schneider CW, Hojeij M, Gobrecht J, Ekinci Y. Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography. Nanotechnology 2014;25:235305. [PMID: 24850475 DOI: 10.1088/0957-4484/25/23/235305] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/03/2023]

For:	Wang L, Kirk E, Wäckerlin C, Schneider CW, Hojeij M, Gobrecht J, Ekinci Y. Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography. Nanotechnology 2014;25:235305. [PMID: 24850475 DOI: 10.1088/0957-4484/25/23/235305] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/03/2023]

Number	Cited by Other Article(s)
1	EUV lithography process challenges. ACTA ACUST UNITED AC 2016. [DOI: 10.1016/b978-0-08-100354-1.00004-1] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] Abstract Collapse Key Words Collapse MESH Headings Collapse Grants Collapse Affiliation(s) Collapse