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Qiu F, You G, Tan Z, Wan W, Wang C, Liu X, Chen X, Liu R, Tao H, Fu Z, Li H, Cao J. A terahertz near-field nanoscopy revealing edge fringes with a fast and highly sensitive quantum-well photodetector. iScience 2022; 25:104637. [PMID: 35800762 PMCID: PMC9254002 DOI: 10.1016/j.isci.2022.104637] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/21/2021] [Revised: 05/15/2022] [Accepted: 06/14/2022] [Indexed: 11/30/2022] Open
Abstract
We demonstrate the successful implementation of a terahertz (THz) quantum-well photodetector (QWP) for effective signal collection in a scattering-type scanning near-field optical microscope (s-SNOM) system. The light source is an electrically pumped THz quantum cascade laser (QCL) at 4.2 THz, which spectrally matches with the peak photoresponse of THz QWP. The sensitive THz QWP has a low noise equivalent power (NEP) of about 1.1 pW/Hz0.5 and a spectral response range from 2 to 7 THz. The fast-responding capability of the THz QWP is vital for detecting the rapidly tip-modulated THz light which can effectively suppress the background noise. The THz images of the nanostructure demonstrate a spatial resolution of about 95 nm, corresponding to ∼λ/752 at 4.2 THz. We experimentally investigate and theoretically interpret the formation of the fringes which appear at the edge position of a gold stripe in the THz near-field image. THz scattering-type scanning near-field optical microscope with a high-power THz QCL Highly sensitive THz quantum-well photodetector for effective signal collection Nanoscale spatial resolution reveals local optical properties in THz range Experimentally investigate and theoretically interpret the formation of the edge fringes
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Strong in-plane scattering of acoustic graphene plasmons by surface atomic steps. Nat Commun 2022; 13:983. [PMID: 35190535 PMCID: PMC8861092 DOI: 10.1038/s41467-022-28614-z] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/18/2021] [Accepted: 01/10/2022] [Indexed: 11/18/2022] Open
Abstract
Acoustic graphene plasmons (AGPs) have ultrastrong field confinement and low loss, which have been applied for quantum effect exploration and ångström-thick material sensing. However, the exploration of in-plane scattering of AGPs is still lacking, although it is essential for the manipulation of ultraconfined optical fields down to atomic level. Here, by using scattering-type scanning near-field optical microscopy (s-SNOM), we show that the mid-infrared AGPs can be strongly scattered by atomic level height steps, even though the step height of the scatterer is four orders of magnitude smaller than the incident free wavelength. This effect can be attributed to larger back scattering of AGPs than that of the traditional graphene plasmons. Besides, the scattering of AGPs by individual scatterers can be controlled via electrical back gating. Our work suggests a feasible way to control confined optical fields with atomic level height nanostructures, which can be used for ultra-compacted strong light–matter interactions. Acoustic graphene plasmons (AGPs) hold promise for nanophotonics and sensing applications. Here, the authors observe enhanced in-plane scattering of mid-infrared AGPs caused by atomic steps on the substrate surface, suggesting potential strategies for controlling their propagation via substrate engineering.
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Gao Y, Chen J, Chen G, Fan C, Liu X. Recent Progress in the Transfer of Graphene Films and Nanostructures. SMALL METHODS 2021; 5:e2100771. [PMID: 34928026 DOI: 10.1002/smtd.202100771] [Citation(s) in RCA: 12] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/07/2021] [Revised: 10/13/2021] [Indexed: 06/14/2023]
Abstract
The one-atom-thick graphene has excellent electronic, optical, thermal, and mechanical properties. Currently, chemical vapor deposition (CVD) graphene has received a great deal of attention because it provides access to large-area and uniform films with high-quality. This allows the fabrication of graphene based-electronics, sensors, photonics, and optoelectronics for practical applications. Zero bandgap, however, limits the application of a graphene film as electronic transistor. The most commonly used bottom-up approaches have achieved efficient tuning of the electronic bandgap by customizing well-defined graphene nanostructures. The postgrowth transfer of graphene films/nanostructures to a certain substrate is crucial in utilizing graphene in applicable devices. In this review, the basic growth mechanism of CVD graphene is first introduced. Then, recent advances in various transfer methods of as-grown graphene to target substrates are presented. The fabrication and transfer methods of graphene nanostructures are also provided, and then the transfer-related applications are summarized. At last, the challenging issues and the potential transfer-free approaches are discussed.
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Affiliation(s)
- Yanjing Gao
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Jielin Chen
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Guorui Chen
- Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Chunhai Fan
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Xiaoguo Liu
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
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Allen FI. A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2021; 12:633-664. [PMID: 34285866 PMCID: PMC8261528 DOI: 10.3762/bjnano.12.52] [Citation(s) in RCA: 12] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/19/2020] [Accepted: 04/30/2021] [Indexed: 05/28/2023]
Abstract
The helium ion microscope has emerged as a multifaceted instrument enabling a broad range of applications beyond imaging in which the finely focused helium ion beam is used for a variety of defect engineering, ion implantation, and nanofabrication tasks. Operation of the ion source with neon has extended the reach of this technology even further. This paper reviews the materials modification research that has been enabled by the helium ion microscope since its commercialization in 2007, ranging from fundamental studies of beam-sample effects, to the prototyping of new devices with features in the sub-10 nm domain.
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Affiliation(s)
- Frances I Allen
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
- California Institute for Quantitative Biosciences, University of California, Berkeley, CA 94720, USA
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Zhao W, Li H, Xiao X, Jiang Y, Watanabe K, Taniguchi T, Zettl A, Wang F. Nanoimaging of Low-Loss Plasmonic Waveguide Modes in a Graphene Nanoribbon. NANO LETTERS 2021; 21:3106-3111. [PMID: 33728921 DOI: 10.1021/acs.nanolett.1c00276] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/27/2023]
Abstract
Graphene nanoribbons are predicted to support low-loss and tunable plasmonic waveguide modes with an ultrasmall mode area. Experimental observation of the plasmonic waveguide modes in graphene nanoribbons, however, is challenging because conventional wet lithography has difficulty creating a clean graphene nanoribbon with a low edge roughness. Here, we use a dry lithography method to fabricate ultraclean and low-roughness graphene nanoribbons, which are then encapsulated in hexagonal boron nitride (hBN). We demonstrate low-loss plasmon propagation with a quality factor up to 35 in the ultraclean nanoribbon waveguide using cryogenic infrared nanoscopy. In addition, we observe both the fundamental and the higher-order plasmonic waveguide modes for the first time. All the plasmon waveguide modes can be tuned through electrostatic gating. The observed tunable plasmon waveguide modes in ultraclean graphene nanoribbons agree well with the finite-difference time-domain (FDTD) simulation results. They are promising for reconfigurable photonic circuits and devices at a subwavelength scale.
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Affiliation(s)
- Wenyu Zhao
- Department of Physics, University of California at Berkeley, Berkeley, California 94720, United States
| | - Hongyuan Li
- Department of Physics, University of California at Berkeley, Berkeley, California 94720, United States
- Graduate Group in Applied Science and Technology, University of California at Berkeley, Berkeley, California 94720, United States
- Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
| | - Xiao Xiao
- Department of Physics, University of California at Berkeley, Berkeley, California 94720, United States
- Department of Physics, Chinese University of Hong Kong, Hong Kong 999077, China
| | - Yue Jiang
- Department of Physics, University of California at Berkeley, Berkeley, California 94720, United States
- Department of Physics, Chinese University of Hong Kong, Hong Kong 999077, China
| | - Kenji Watanabe
- Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Takashi Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Alex Zettl
- Department of Physics, University of California at Berkeley, Berkeley, California 94720, United States
- Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
- Kavli Energy NanoSciences, University of California Berkeley and Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
| | - Feng Wang
- Department of Physics, University of California at Berkeley, Berkeley, California 94720, United States
- Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
- Kavli Energy NanoSciences, University of California Berkeley and Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
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Li P, Chen S, Dai H, Yang Z, Chen Z, Wang Y, Chen Y, Peng W, Shan W, Duan H. Recent advances in focused ion beam nanofabrication for nanostructures and devices: fundamentals and applications. NANOSCALE 2021; 13:1529-1565. [PMID: 33432962 DOI: 10.1039/d0nr07539f] [Citation(s) in RCA: 51] [Impact Index Per Article: 17.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
The past few decades have witnessed growing research interest in developing powerful nanofabrication technologies for three-dimensional (3D) structures and devices to achieve nano-scale and nano-precision manufacturing. Among the various fabrication techniques, focused ion beam (FIB) nanofabrication has been established as a well-suited and promising technique in nearly all fields of nanotechnology for the fabrication of 3D nanostructures and devices because of increasing demands from industry and research. In this article, a series of FIB nanofabrication factors related to the fabrication of 3D nanostructures and devices, including mechanisms, instruments, processes, and typical applications of FIB nanofabrication, are systematically summarized and analyzed in detail. Additionally, current challenges and future development trends of FIB nanofabrication in this field are also given. This work intends to provide guidance for practitioners, researchers, or engineers who wish to learn more about the FIB nanofabrication technology that is driving the revolution in 3D nanostructures and devices.
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Affiliation(s)
- Ping Li
- National Engineering Research Centre for High Efficiency Grinding, College of Mechanical and Vehicle Engineering, Hunan University, Changsha 410082, P. R. China.
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Xiang Y, Amarie S, Cai W, Luo W, Wu W, Ren M, Zhang X, Xu J. Real-space mapping of mid-infrared near-field of Yagi-Uda antenna in the emission mode. OPTICS EXPRESS 2019; 27:5884-5892. [PMID: 30876183 DOI: 10.1364/oe.27.005884] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/23/2018] [Accepted: 01/04/2019] [Indexed: 06/09/2023]
Abstract
By using transmission-mode, scattering-type scanning near-field optical microscopy, we characterize the mid-infrared near-field properties of a Yagi-Uda antenna in the emission mode. The underlying near-field properties, including the near-field dipole-dipole coupling between antenna elements, are clearly observed. Moreover, even though most of the radiation energy is emitted into the substrate, by adopting two detector antennas, we managed to verify the unidirectionality and frequency-selectivity of the Yagi-Uda antenna in the air side. All the experimental results presented in this work are in good qualitative agreement with our numerical simulations. Our work on the Yagi-Uda antenna could help lead to novel methods for mid-infrared material analysis and bio-sensing. It should also be applicable in all-optical processing like radiation routers or a chromatic discriminator.
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