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For: Hadley A, Notthoff C, Mota-Santiago P, Hossain UH, Kirby N, Toimil-Molares ME, Trautmann C, Kluth P. Etched ion tracks in amorphous SiO₂ characterized by small angle x-ray scattering: influence of ion energy and etching conditions. Nanotechnology 2019;30:274001. [PMID: 30884471 DOI: 10.1088/1361-6528/ab10c8] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]

For:	Hadley A, Notthoff C, Mota-Santiago P, Hossain UH, Kirby N, Toimil-Molares ME, Trautmann C, Kluth P. Etched ion tracks in amorphous SiO₂ characterized by small angle x-ray scattering: influence of ion energy and etching conditions. Nanotechnology 2019;30:274001. [PMID: 30884471 DOI: 10.1088/1361-6528/ab10c8] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]

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(The first 100,000 artilces are displayed in RCA.)