High-energy ion (He+, Si++, Ga+, Au++) interactions with PMMA in ion beam lithography

Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

Nano-fabrication techniques have demonstrated their vital importance in technological innovation. However, low-throughput, high-cost and intrinsic resolution limits pose significant restrictions, it is, therefore, paramount to continue improving existing methods as well as developing new techniques to overcome these challenges. This is particularly applicable within the area of biomedical research, which focuses on sensing, increasingly at the point-of-care, as a way to improve patient outcomes. Within this context, this review focuses on the latest advances in the main emerging patterning methods including the two-photon, stereo, electrohydrodynamic, near-field electrospinning-assisted, magneto, magnetorheological drawing, nanoimprint, capillary force, nanosphere, edge, nano transfer printing and block copolymer lithographic technologies for micro- and nanofabrication. Emerging methods enabling structural and chemical nano fabrication are categorised along with prospective chemical and physical patterning techniques. Established lithographic techniques are briefly outlined and the novel lithographic technologies are compared to these, summarising the specific advantages and shortfalls alongside the current lateral resolution limits and the amenability to mass production, evaluated in terms of process scalability and cost. Particular attention is drawn to the potential breakthrough application areas, predominantly within biomedical studies, laying the platform for the tangible paths towards the adoption of alternative developing lithographic technologies or their combination with the established patterning techniques, which depends on the needs of the end-user including, for instance, tolerance of inherent limits, fidelity and reproducibility.

Facile synthesis of silver nanocatalyst decorated Fe3O4@PDA core–shell nanoparticles with enhanced catalytic properties and selectivity

In this work, we have successfully prepared core–shell nanoparticles (Fe₃O₄@PDA) wrapped with Ag using a simple and green synthesis method. Without an external reducing agent, silver nanoparticles (Ag NPs) with good dispersibility were directly reduced and deposited on a polydopamine (PDA) layer. Fe₃O₄@PDA@Ag showed excellent catalytic activity and recyclability for 4-nitrophenol, and also exhibited good catalytic selectivity for organic dyes (MO and MB). This simple and green synthesis method will provide a platform for other catalytic applications.

In this work, we have successfully prepared core–shell nanoparticles (Fe₃O₄@PDA) wrapped with Ag using a simple and green synthesis method.

A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope

The helium ion microscope has emerged as a multifaceted instrument enabling a broad range of applications beyond imaging in which the finely focused helium ion beam is used for a variety of defect engineering, ion implantation, and nanofabrication tasks. Operation of the ion source with neon has extended the reach of this technology even further. This paper reviews the materials modification research that has been enabled by the helium ion microscope since its commercialization in 2007, ranging from fundamental studies of beam-sample effects, to the prototyping of new devices with features in the sub-10 nm domain.

Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams

This work explores a new technique for the out-of-plane patterning of metal thin films prefabricated on the surface of a polymer substrate. This technique is based on an ion-beam-induced material modification in the bulk of the polymer. Effects of subsurface and surface processes on the surface morphology have been studied for three polymer materials: poly(methyl methacrylate), polycarbonate, and polydimethylsiloxane, by using focused ion beam irradiation with He⁺, Ne⁺, and Ga⁺. Thin films of a Pt₆₀Pd₄₀ alloy and of pristine Au were used to compare the patterning of thin films with different microstructures. We show that the height of Pt₆₀Pd₄₀ thin films deposited onto poly(methyl methacrylate) and polycarbonate substrates can be patterned by He⁺ ion beams with ultrahigh precision (nanometers) while preserving in-plane features, at the nanoscale, of the pre-deposited films. Ion irradiation of the Au-coated samples results in delamination, bulging, and perforation of the Au film, which is attributed to the accumulation of gases from radiolysis at the film-substrate interface. The irradiation with Ne⁺ and Ga⁺ ions destroys the films and roughens the surface due to dominating sputtering processes. A very different behavior, resulting in the formation of complex, multiscale 3D patterns, is observed for polydimethylsiloxane samples. The roles of the metal film structure, elastic properties of the polymer substrate, and irradiation-induced mechanical strain in the patterning process are elaborated and discussed.