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Wei Q, Wang H, Ma J, Zhao X, Zhao J. Magneto-transport properties of cubic NiMnAs film epitaxied on GaAs (110) substrate. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2021; 33:315702. [PMID: 34020432 DOI: 10.1088/1361-648x/ac03d4] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/12/2021] [Accepted: 05/21/2021] [Indexed: 06/12/2023]
Abstract
The magneto-transport properties of cubic NiMnAs film epitaxied on the GaAs (110) substrate are investigated. The x-ray diffraction measurements reveal that the NiMnAs (111) crystal plane is parallel to the GaAs (110) crystal plane. The temperature dependence of resistivity at high temperature can be described by a thermal activation model, from which the thermal activation energy is obtained and found to be comparable with many other Heusler alloys. By fitting the temperature dependence of resistivity at low temperature, the coefficient of the quadratic temperature term is determined to be 1.34 × 10-3μΩ cm K-2. This value suggests the possible presence of single-magnon scattering in the NiMnAs film. The negative magnetoresistance is attributed to the suppression of the spin-dependent scattering, which would not take place in a half-metal. The angle dependence of the anisotropic magnetoresistance (AMR) is measured, and the AMR ratios are positive even at low temperature. These magneto-transport properties indicate that the predicted half-metallicity is destroyed in the NiMnAs film. The absence of the half-metallicity may be attributed to the atomic disorder in the NiMnAs lattice, which needs to be confirmed by further experimental and theoretical studies.
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Affiliation(s)
- Qiqi Wei
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, People's Republic of China
- College of Materials Science and Opto-Electronic Technology & CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China
| | - Hailong Wang
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, People's Republic of China
- College of Materials Science and Opto-Electronic Technology & CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China
| | - Jialin Ma
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, People's Republic of China
- College of Materials Science and Opto-Electronic Technology & CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China
| | - Xupeng Zhao
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, People's Republic of China
- College of Materials Science and Opto-Electronic Technology & CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China
| | - Jianhua Zhao
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, People's Republic of China
- College of Materials Science and Opto-Electronic Technology & CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China
- Beijing Academy of Quantum Information Sciences, Beijing 100193, People's Republic of China
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