Atomic-force microscopy on the Si(111)7 x 7 surface

Friction force microscopy of tribochemistry and interfacial ageing for the SiO x /Si/Au system

Friction force microscopy was performed with oxidized or gold-coated silicon tips sliding on Au(111) or oxidized Si(100) surfaces in ultrahigh vacuum. We measured very low friction forces compared to adhesion forces and found a modulation of lateral forces reflecting the atomic structure of the surfaces. Holding the force-microscopy tip stationary for some time did not lead to an increase in static friction, i.e., no contact ageing was observed for these pairs of tip and surface. Passivating layers from tip or surface were removed in order to allow for contact ageing through the development of chemical bonds in the static contact. After removal of the passivating layers, tribochemical reactions resulted in strong friction forces and tip wear. Friction, wear, and the re-passivation by oxides are discussed based on results for the temporal development of friction forces, on images of the scanned area after friction force microscopy experiments, and on electron microscopy of the tips.

NC-AFM Observation of Atomic Scale Structure of Rutile-type TiO2(110) Surface Prepared by Wet Chemical Process

We succeeded in observing the atomic scale structure of a rutile-type TiO2(110) single-crystal surface prepared by the wet chemical method of chemical etching in an acid solution and surface annealing in air. Ultrahigh vacuum noncontact atomic force microscopy (UHV-NC-AFM) was used for observing the atomic scale structures of the surface. The UHV-NC-AFM measurements at 450 K, which is above a desorption temperature of molecularly adsorbed water on the TiO2(110) surface, enabled us to observe the atomic scale structure of the TiO2(110) surface prepared by the wet chemical method. In the UHV-NC-AFM measurements at room temperature (RT), however, the atomic scale structure of the TiO2(110) surface was not observed. The TiO2(110) surface may be covered with molecularly adsorbed water after the surface was prepared by the wet chemical method. The structure of the TiO2(110) surface that was prepared by the wet chemical method was consistent with the (1 x 1) bulk-terminated model of the TiO2(110) surface.

Friction and Adhesion between C60 Single Crystal Surfaces and AFM Tips: Effects of the Orientational Phase Transition

We have investigated the nanotribological properties of C60 single crystal (111) and (100) surfaces around its orientational order-disorder phase transition temperature, approximately 260 K, by atomic force microscopy and frictional force microscopy (AFM/FFM) in high vacuum. Results show that for both surfaces across the phase transition temperature, the friction force and the adhesive force between a C60 coated AFM tip and the C60 crystal surfaces exhibit discontinuous behavior. The friction force within the applied external load range in the low temperature phase is significantly larger than that in the high temperature phase, with no obvious change in the slope of the friction force curves (the friction coefficient) in the low and high temperature phases. The abrupt change in friction was found to be caused mainly by the abrupt change in adhesion, which, in turn, can be qualitatively understood through changes in the van der Waals interaction and the short-range Coulomb interaction associated with the structural changes across the phase transition. Compared to most other degrees of freedom, the rotation of C60 molecules was found to have little effect on friction and is an ineffective energy dissipation channel.

Chain Structures of Surface Hydroxyl Groups Formed via Line Oxygen Vacancies on TiO2(110) Surfaces Studied Using Noncontact Atomic Force Microscopy

Structures of surface hydroxyl groups arranged on a reduced TiO2(110) surface that had line oxygen vacancies were studied using noncontact atomic force microscopy (NC-AFM). NC-AFM results revealed that by increasing the density of oxygen vacancies on the TiO2(110) surface, line oxygen vacancies were formed by removal of oxygen atoms in a bridge oxygen row on the TiO2(110) surface. After the TiO2(110) surface with the line oxygen vacancies was exposed to water, the surface showed hydroxyl chain structures that were composed of hydroxyl groups linearly arranged in a form of two rows on the line oxygen vacancies and on a neighboring bridge oxygen row. In-situ NC-AFM measurements of these surfaces exposed to water at room temperature revealed that hydroxyl chain structures were formed at the line oxygen vacancy. Annealing above 500 K was sufficient to remove the hydroxyl chain structures on the TiO2(110) surface and allowed line oxygen vacancies to reappear on the surface. The line oxygen vacancies are active sites for water dissociation. In conclusion, the formation of the hydroxyl chain structure suggests that the surface hydroxyl groups on a TiO2(110) surface can be controlled by preparing oxygen vacancy structures on the surface.