Cs bonding at the Cs/GaAs(110) interface

Comparison of photoemission characteristics between square and circular wire array GaAs photocathodes

Two types of negative electron affinity gallium arsenide (GaAs) wire array photocathodes were fabricated by reactive ion etching and inductively coupled plasma etching of bulk GaAs material. High density GaAs wire arrays with high periodicity and good morphology were verified using scanning electron microscopy, and photoluminescence spectra confirmed the wire arrays had good crystalline quality. Reflection spectra showed that circular GaAs wire arrays had superior light trapping compared with square ones. However, after Cs/O activation, the square GaAs wire array photocathodes showed enhanced spectral response. The integral sensitivity of the square wire array photocathodes was approximately 2.8 times that of the circular arrays.

Energy distributions of electrons emitted from reflection-mode Cs-covered GaAs photocathodes

By calculating the energy distributions of electrons reaching the photocathode surface and solving the Schrödinger equation for an electron tunneling through the surface potential barrier, we have obtained an equation to calculate the energy distributions of electrons emitted from reflection-mode Cs-covered GaAs photocathodes based on a two-minima diffusion model. According to the equation, we studied the effects of incident photon energies, diffusion lengths, and surface potential barrier on the electron energy distributions. The equation was also used to fit the measured electron energy distribution curves and the cathode performance parameters were obtained from the fitting. The Γ and L peaks in the theoretical curves are in agreement with the peaks in the experimental curves. The fitted barrier thickness 1.7 Å exactly reflects the GaAs-Cs dipole layer thickness.