Evolution of long-range order and composition for radiation-induced precipitate dissolution

Effect of Sequential Helium and Nickel Ion Implantation on the Nano-Indentation Hardness of X750 Alloy

Sequential He+ and Ni+ implantations were performed to investigate their combined effect on the indentation hardness of heat-treated X750 alloy. The microstructure of the ion-implanted region was also characterized with transmission electron microscope (TEM). The X750 alloy displayed a pronounced softening with very low Ni+ implantation levels, ψ = 0.01–1.0 dpa, however it showed a clear increase in hardness when implanted with He+ up to CHe = 5000 appm. Samples subjected to sequential He+ and Ni+ implantations displayed hardness values between those presented by sole He+ or Ni+ implantation suggesting that the effects of ion-induced microstructural damage and helium accumulation on the hardness of this alloy can be considered as independent and additive over the range of conditions studied. This observation is in contradiction to previously reported TEM-based studies, which suggest that accumulated helium slows the dissolution/disordering of the γ′ hardening phase in this alloy. In our study, established theories were applied to assess the contribution of ion-induced defect clustering, γ′ precipitate disordering, and helium bubble accumulation to the hardness of the X750 alloy. It was observed that generation of ion-induced defect clusters and the formation of helium bubbles increased the indentation hardness slightly while the disordering of γ′ precipitates resulted in a dramatic decrease in the total hardness. Ni+ and He+ implantation also had different effects on the depth dependence of the indentation hardness indentation size effect (ISE). The ISE was pronounced in the samples subjected to only Ni+ implantation while it was almost absent in samples subjected to only He+ implantation.

Ni+ and He+ Implantation Effects on the Hardness and Microstructure of Heat-Treated X750 Superalloy

Nickel and Helium ion implantation-induced hardening and microstructural evolution of X750 in the heat-treated (HT) and solution annealed (SA) conditions were investigated using nano-indentation hardness testing and electron microscopy (scanning electron microscopy (SEM) and transmission electron microscopy (TEM)). Irradiation crystal damage up to ψ = 5 dpa was invoked with Ni+ implantation while He+ implantation up to CHe = 5000 appm was performed on samples the HT and SA conditions. The X750 alloy displayed generally increasing hardness with increasing Ni+ implantation damage but a perturbation in the trend occurred when ψ ≤ 0.5 dpa, and the hardness dropped by about 30% and 2% for the HT and the SA samples, respectively. TEM analysis indicated that this softening was associated with disordering and dissolution of the γ′ strengthening phase. The hardening behavior observed at higher implantation damage (ψ = 1 dpa) resulted in reformation of Al/Ti-rich regions within the microstructure phase. The hardness of the X750 increased continuously with increasing implanted He+ up to CHe = 1000 appm. This was associated with the formation of helium bubbles as observed by TEM. Slight drop in hardness in the HT condition at CHe = 5000 appm indicated that high levels of He+ implantation destabilize the γ′ precipitates as was confirmed with TEM observed disappearance of γ′ super-lattice reflections.