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Comprehensive Data via Spectroscopy and Molecular Dynamics of Chemically Treated Graphene Nanoplatelets. DATA 2022. [DOI: 10.3390/data7040038] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/04/2022] Open
Abstract
Graphene nanoplatelets (GnPs) are promising candidates for gas sensing applications because they have a high surface area to volume ratio, high conductivity, and a high temperature stability. The information provided in this data article will cover the surface and structural properties of pure and chemically treated GnPs, specifically with carboxyl, ammonia, nitrogen, oxygen, fluorocarbon, and argon. Molecular dynamics and adsorption calculations are provided alongside characterization data, which was performed with Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD) to determine the functional groups present and effects of those groups on the structural and vibrational properties. Certain features in the observed Raman spectra are attributed to the variations in concentration of the chemically treated GnPs. XRD data show smaller crystallite sizes for chemically treated GnPs that agree with images acquired with scanning electron microscopy. A molecular dynamics simulation is also employed to gain a better understanding of the Raman and adsorption properties of pure GnPs.
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Chowdhury S, Rigosi AF, Hill HM, Vora P, Hight Walker AR, Tavazza F. Computational Methods for Charge Density Waves in 2D Materials. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:504. [PMID: 35159849 PMCID: PMC8839743 DOI: 10.3390/nano12030504] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/15/2021] [Revised: 01/20/2022] [Accepted: 01/26/2022] [Indexed: 11/29/2022]
Abstract
Two-dimensional (2D) materials that exhibit charge density waves (CDWs)-spontaneous reorganization of their electrons into a periodic modulation-have generated many research endeavors in the hopes of employing their exotic properties for various quantum-based technologies. Early investigations surrounding CDWs were mostly focused on bulk materials. However, applications for quantum devices require few-layer materials to fully utilize the emergent phenomena. The CDW field has greatly expanded over the decades, warranting a focus on the computational efforts surrounding them specifically in 2D materials. In this review, we cover ground in the following relevant theory-driven subtopics for TaS2 and TaSe2: summary of general computational techniques and methods, resulting atomic structures, the effect of electron-phonon interaction of the Raman scattering modes, the effects of confinement and dimensionality on the CDW, and we end with a future outlook. Through understanding how the computational methods have enabled incredible advancements in quantum materials, one may anticipate the ever-expanding directions available for continued pursuit as the field brings us through the 21st century.
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Affiliation(s)
- Sugata Chowdhury
- Department of Physics and Astronomy, Howard University, Washington, DC 20059, USA;
- Material Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Albert F. Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA; (A.F.R.); (H.M.H.); (A.R.H.W.)
| | - Heather M. Hill
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA; (A.F.R.); (H.M.H.); (A.R.H.W.)
- Physics Today, American Institute of Physics, College Park, MD 20740, USA
| | - Patrick Vora
- Quantum Science and Engineering Center, George Mason University, Fairfax, VA 22030, USA;
- Department of Physics and Astronomy, George Mason University, Fairfax, VA 22030, USA
| | - Angela R. Hight Walker
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA; (A.F.R.); (H.M.H.); (A.R.H.W.)
| | - Francesca Tavazza
- Material Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA; (A.F.R.); (H.M.H.); (A.R.H.W.)
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Rathore S, Patel DK, Thakur MK, Haider G, Kalbac M, Kruskopf M, Liu CI, Rigosi AF, Elmquist RE, Liang CT, Hong PD. Highly sensitive broadband binary photoresponse in gateless epitaxial graphene on 4H-SiC. CARBON 2021; 184:10.1016/j.carbon.2021.07.098. [PMID: 37200678 PMCID: PMC10190169 DOI: 10.1016/j.carbon.2021.07.098] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/20/2023]
Abstract
Due to weak light-matter interaction, standard chemical vapor deposition (CVD)/exfoliated single-layer graphene-based photodetectors show low photoresponsivity (on the order of mA/W). However, epitaxial graphene (EG) offers a more viable approach for obtaining devices with good photoresponsivity. EG on 4H-SiC also hosts an interfacial buffer layer (IBL), which is the source of electron carriers applicable to quantum optoelectronic devices. We utilize these properties to demonstrate a gate-free, planar EG/4H-SiC-based device that enables us to observe the positive photoresponse for (405-532) nm and negative photoresponse for (632-980) nm laser excitation. The broadband binary photoresponse mainly originates from the energy band alignment of the IBL/EG interface and the highly sensitive work function of the EG. We find that the photoresponsivity of the device is > 10 A/W under 405 nm of power density 7.96 mW/cm2 at 1 V applied bias, which is three orders of magnitude greater than the obtained values of CVD/exfoliated graphene and higher than the required value for practical applications. These results path the way for selective light-triggered logic devices based on EG and can open a new window for broadband photodetection.
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Affiliation(s)
- Shivi Rathore
- Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei, 106335, Taiwan
| | - Dinesh Kumar Patel
- Department of Physics, National Taiwan University, Taipei, 106319, Taiwan
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg MD, 20899, USA
| | - Mukesh Kumar Thakur
- J. Heyrovsky Institute of Physical Chemistry, Czech Academy of Sciences, Prague 8, Czech Republic
| | - Golam Haider
- J. Heyrovsky Institute of Physical Chemistry, Czech Academy of Sciences, Prague 8, Czech Republic
- Corresponding author. (G. Haider)
| | - Martin Kalbac
- J. Heyrovsky Institute of Physical Chemistry, Czech Academy of Sciences, Prague 8, Czech Republic
| | - Mattias Kruskopf
- Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, D-38116, Braunschweig, Germany
| | - Chieh-I Liu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg MD, 20899, USA
- Department of Chemistry and Biochemistry, University of Maryland, College Park, MD, 20742, USA
| | - Albert F. Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg MD, 20899, USA
| | - Randolph E. Elmquist
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg MD, 20899, USA
| | - Chi-Te Liang
- Department of Physics, National Taiwan University, Taipei, 106319, Taiwan
- Corresponding author. (C.-T. Liang)
| | - Po-Da Hong
- Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei, 106335, Taiwan
- Corresponding author. (P.-D. Hong)
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Rigosi AF, Hill HM, Krylyuk S, Nguyen NV, Hight Walker AR, Davydov AV, Newell DB. Dielectric Properties of Nb xW 1-xSe 2 Alloys. JOURNAL OF RESEARCH OF THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY 2019; 124:1-10. [PMID: 34877178 PMCID: PMC7343519 DOI: 10.6028/jres.124.035] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Accepted: 11/25/2019] [Indexed: 06/13/2023]
Abstract
The growth of transition metal dichalcogenide (TMDC) alloys provides an opportunity to experimentally access information elucidating how optical properties change with gradual substitutions in the lattice compared with their pure compositions. In this work, we performed growths of alloyed crystals with stoichiometric compositions between pure forms of NbSe2 and WSe2, followed by an optical analysis of those alloys by utilizing Raman spectroscopy and spectroscopic ellipsometry.
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Affiliation(s)
- Albert F Rigosi
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Heather M Hill
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | | | - Nhan V Nguyen
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | | | - Albert V Davydov
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - David B Newell
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
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Rigosi AF, Patel D, Marzano M, Kruskopf M, Hill HM, Jin H, Hu J, Walker ARH, Ortolano M, Callegaro L, Liang CT, Newell DB. Atypical Quantized Resistances in Millimeter-Scale Epitaxial Graphene p-n Junctions. CARBON 2019; 154:10.1016/j.carbon.2019.08.002. [PMID: 32165760 PMCID: PMC7067286 DOI: 10.1016/j.carbon.2019.08.002] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
We have demonstrated the millimeter-scale fabrication of monolayer epitaxial graphene p-n junction devices using simple ultraviolet photolithography, thereby significantly reducing device processing time compared to that of electron beam lithography typically used for obtaining sharp junctions. This work presents measurements yielding nonconventional, fractional multiples of the typical quantized Hall resistance at ν = 2 (R H ≈ 12906 Ω) that take the form:a b R H . Here, a and b have been observed to take on values such 1, 2, 3, and 5 to form various coefficients of R H. Additionally, we provide a framework for exploring future device configurations using the LTspice circuit simulator as a guide to understand the abundance of available fractions one may be able to measure. These results support the potential for drastically simplifying device processing time and may be used for many other two-dimensional materials.
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Affiliation(s)
- Albert F. Rigosi
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Dinesh Patel
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Martina Marzano
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Department of Electronics and Telecommunications, Politecnico di Torino, Torino 10129, Italy
- Istituto Nazionale di Ricerca Metrologica, Torino 10135, Italy
| | - Mattias Kruskopf
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | - Heather M. Hill
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Hanbyul Jin
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | - Jiuning Hu
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | | | - Massimo Ortolano
- Department of Electronics and Telecommunications, Politecnico di Torino, Torino 10129, Italy
| | - Luca Callegaro
- Istituto Nazionale di Ricerca Metrologica, Torino 10135, Italy
| | - Chi-Te Liang
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - David B. Newell
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
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Hu J, Rigosi AF, Kruskopf M, Yang Y, Wu BY, Tian J, Panna AR, Lee HY, Payagala SU, Jones GR, Kraft ME, Jarrett DG, Watanabe K, Taniguchi T, Elmquist RE, Newell DB. Towards epitaxial graphene p-n junctions as electrically programmable quantum resistance standards. Sci Rep 2018; 8:15018. [PMID: 30301948 PMCID: PMC6177418 DOI: 10.1038/s41598-018-33466-z] [Citation(s) in RCA: 24] [Impact Index Per Article: 3.4] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/13/2018] [Accepted: 09/27/2018] [Indexed: 11/18/2022] Open
Abstract
We report the fabrication and measurement of top gated epitaxial graphene p-n junctions where exfoliated hexagonal boron nitride (h-BN) is used as the gate dielectric. The four-terminal longitudinal resistance across a single junction is well quantized at the von Klitzing constant [Formula: see text] with a relative uncertainty of 10-7. After the exploration of numerous parameter spaces, we summarize the conditions upon which these devices could function as potential resistance standards. Furthermore, we offer designs of programmable electrical resistance standards over six orders of magnitude by using external gating.
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Affiliation(s)
- Jiuning Hu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA.
- Joint Quantum Institute, University of Maryland, College Park, MD, 20742, USA.
| | - Albert F Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA.
| | - Mattias Kruskopf
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD, 20742, USA
| | - Yanfei Yang
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD, 20742, USA
| | - Bi-Yi Wu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Graduate Institute of Applied Physics, National Taiwan University, Taipei, 10617, Taiwan
| | - Jifa Tian
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Department of Physics and Astronomy, and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana, 47907, USA
| | - Alireza R Panna
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - Hsin-Yen Lee
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Theiss Research, La Jolla, CA, 92037, USA
| | - Shamith U Payagala
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - George R Jones
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - Marlin E Kraft
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - Dean G Jarrett
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - Kenji Watanabe
- National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - Takashi Taniguchi
- National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - Randolph E Elmquist
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - David B Newell
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
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Hill HM, Rigosi AF, Krylyuk S, Tian J, Nguyen NV, Davydov AV, Newell DB, Walker ARH. Comprehensive optical characterization of atomically thin NbSe 2. PHYSICAL REVIEW. B 2018; 98:10.1103/PhysRevB.98.165109. [PMID: 30984898 PMCID: PMC6459197 DOI: 10.1103/physrevb.98.165109] [Citation(s) in RCA: 14] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/02/2023]
Abstract
Transition-metal dichalcogenides (TMDCs) have offered experimental access to quantum confinement in one dimension. In recent years, metallic TMDCs like NbSe2 have taken center stage with many of them exhibiting interesting temperature-dependent properties such as charge density waves and superconductivity. In this paper, we perform a comprehensive optical analysis of NbSe2 by utilizing Raman spectroscopy, differential reflectance contrast, and spectroscopic ellipsometry. These analyses, when coupled with Kramers-Kronig analysis, allow us to extract the dielectric functions of bulk and atomically thin NbSe2 and relate them to the resonant behavior of the Raman spectra.
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Affiliation(s)
- Heather M. Hill
- Physical Measurement Laboratory, National Institute of
Standards and Technology, Gaithersburg, Maryland 20899, USA
| | - Albert F. Rigosi
- Physical Measurement Laboratory, National Institute of
Standards and Technology, Gaithersburg, Maryland 20899, USA
| | - Sergiy Krylyuk
- Material Measurement Laboratory, National Institute of
Standards and Technology, Gaithersburg, Maryland 20899, USA
- Theiss Research, Inc., La Jolla, California 92037,
USA
| | - Jifa Tian
- Physical Measurement Laboratory, National Institute of
Standards and Technology, Gaithersburg, Maryland 20899, USA
- Department of Physics and Astronomy, and Birck
Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, USA
| | - Nhan V. Nguyen
- Physical Measurement Laboratory, National Institute of
Standards and Technology, Gaithersburg, Maryland 20899, USA
| | - Albert V. Davydov
- Material Measurement Laboratory, National Institute of
Standards and Technology, Gaithersburg, Maryland 20899, USA
| | - David B. Newell
- Physical Measurement Laboratory, National Institute of
Standards and Technology, Gaithersburg, Maryland 20899, USA
| | - Angela R. Hight Walker
- Physical Measurement Laboratory, National Institute of
Standards and Technology, Gaithersburg, Maryland 20899, USA
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Rigosi AF, Hill HM, Glavin NR, Pookpanratana SJ, Yang Y, Boosalis AG, Hu J, Rice A, Allerman AA, Nguyen NV, Hacker CA, Elmquist RE, Hight Walker AR, Newell DB. Measuring the dielectric and optical response of millimeter-scale amorphous and hexagonal boron nitride films grown on epitaxial graphene. 2D MATERIALS 2018; 5:011011. [PMID: 29545949 PMCID: PMC5846627 DOI: 10.1088/2053-1583/aa9ea3] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/01/2023]
Abstract
Monolayer epitaxial graphene (EG), grown on the Si face of SiC, is an advantageous material for a variety of electronic and optical applications. EG forms as a single crystal over millimeter-scale areas and consequently, the large scale single crystal can be utilized as a template for growth of other materials. In this work, we present the use of EG as a template to form millimeter-scale amorphous and hexagonal boron nitride (a-BN and h-BN) films. The a-BN is formed with pulsed laser deposition and the h-BN is grown with triethylboron (TEB) and NH3 precursors, making it the first metal organic chemical vapor deposition (MOCVD) process of this growth type performed on epitaxial graphene. A variety of optical and non-optical characterization methods are used to determine the optical absorption and dielectric functions of the EG, a-BN, and h-BN within the energy range of 1 eV to 8.5 eV. Furthermore, we report the first ellipsometric observation of high-energy resonant excitons in EG from the 4H polytype of SiC and an analysis on the interactions within the EG and h-BN heterostructure.
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Affiliation(s)
- Albert F. Rigosi
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Heather M. Hill
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Nicholas R. Glavin
- Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH 45433, United States
| | | | - Yanfei Yang
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, United States
| | | | - Jiuning Hu
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Anthony Rice
- Sandia National Laboratories, Albuquerque, NM 87185, United States
| | | | - Nhan V. Nguyen
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Christina A. Hacker
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Randolph E. Elmquist
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Angela R. Hight Walker
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - David B. Newell
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
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