Scaling properties of the shadowing model for sputter deposition

Dynamical scaling behavior in two-dimensional ballistic deposition with shadowing

The dynamical scaling behavior in two-dimensional ballistic deposition with shadowing is studied as a function of the angular distribution of incoming particles and of the underlying lattice structure. Using a dynamical scaling form for the surface box number, results for the scaling of the surface fractal dimension are also presented. Our results indicate that, in addition to the usual self-affine universality class corresponding to vertical deposition, there exist at least two additional universality classes characterized by distinct values of the coarsening and roughening exponents p and beta describing the evolution of the lateral feature size and surface roughness with film thickness, as well as the surface fractal dimension D(f). For the case of a uniform angular distribution corresponding to an anisotropic flux, we find p=beta=1 and D(f) approximately 1.7. However, for ballistic deposition with an isotropic flux (corresponding to a "cosine" angular distribution), we find p approximately 2/3 and D(f) approximately 1.5 while the effective roughening exponent beta approximately 0.52-0.64 was found to be slightly lattice dependent. In both cases, anomalous scaling of the height-height correlation function is also observed. In contrast, vertical deposition leads to a self-affine surface with p=2/3, beta=1/3, and D(f)=1. The asymptotic scaling behavior appears to depend on the behavior of the angular distribution at large angles but does not depend on other details. An analysis that clarifies the relationship between the launch angle distribution used in the simulations and the flux distribution is also presented.