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Sumikura H, Kuramochi E, Taniyama H, Notomi M. Ultrafast spontaneous emission of copper-doped silicon enhanced by an optical nanocavity. Sci Rep 2014; 4:5040. [PMID: 24853336 PMCID: PMC4031467 DOI: 10.1038/srep05040] [Citation(s) in RCA: 23] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/18/2013] [Accepted: 04/24/2014] [Indexed: 11/16/2022] Open
Abstract
Dopants in silicon (Si) have attracted attention in the fields of photonics and quantum optics. However, the optical characteristics are limited by the small spontaneous emission rate of dopants in Si. This study demonstrates a large increase in the spontaneous emission rate of copper isoelectronic centres (Cu-IECs) doped into Si photonic crystal nanocavities. In a cavity with a quality factor (Q) of ~16,000, the photoluminescence (PL) lifetime of the Cu-IECs is 1.1 ns, which is 30 times shorter than the lifetime of a sample without a cavity. The PL decay rate is increased in proportion to Q/Vc (Vc is the cavity mode volume), which indicates the Purcell effect. This is the first demonstration of a cavity-enhanced ultrafast spontaneous emission from dopants in Si, and it may lead to the development of fast and efficient Si light emitters and Si quantum optical devices based on dopants with efficient optical access.
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Affiliation(s)
- Hisashi Sumikura
- 1] NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan [2] NTT Nanophotonics Center, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Eiichi Kuramochi
- 1] NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan [2] NTT Nanophotonics Center, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Hideaki Taniyama
- 1] NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan [2] NTT Nanophotonics Center, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Masaya Notomi
- 1] NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan [2] NTT Nanophotonics Center, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Monoisotopic varieties of silicon and germanium with a high chemical and isotopic purity. Russ Chem Bull 2013. [DOI: 10.1007/s11172-013-0040-2] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/26/2022]
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Shirai K, Yamaguchi H, Yanase A, Katayama-Yoshida H. A new structure of Cu complex in Si and its photoluminescence. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2009; 21:064249. [PMID: 21715951 DOI: 10.1088/0953-8984/21/6/064249] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/31/2023]
Abstract
A recent discovery of complicated isotope shifts of the PL 1014 meV line in Cu-containing silicon, which was made by Thewalt's group, indicates that existing models of Cu pairs are not appropriate for accounting for the luminescence center. A new structural model has been studied. First-principles calculations show that the most probable form of the complex is a four-membered complex which is composed of a substitutional Cu associated with three neighboring interstitial Cu atoms. The symmetry is C(3v). The formation mechanism of this complex is discussed. For interpreting the complicated splitting for the Γ(4) exciton peak, involvement of a non-totally symmetric mode is proposed. The pattern of splitting obtained by this model is almost in agreement with the experiment. Selection rules beyond the usual treatments are necessary to connect a specific exciton peak to the corresponding phonon.
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Affiliation(s)
- K Shirai
- Nanoscience and Nanotechnology Center, ISIR, Osaka University, 8-1, Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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