Intense sub-micrometre focusing of soft X-ray free-electron laser beyond 1016 W cm-2 with an ellipsoidal mirror

Soft-X-ray nanobeams formed by aberration-reduced elliptical mirrors with large numerical aperture

X-ray focusing mirrors often employ the Kirkpatrick-Baez (KB) geometry, which sequentially crosses two elliptic-cylindrical mirrors in grazing-incidence configurations. However, KB mirrors do not satisfy the Abbe sine condition and thus potentially expand the focus size with severe coma aberration. Satisfying the Abbe sine condition complicates mirror shapes or increases the number of ultraprecision mirrors required. The present study shows that the focal length and mirror length of KB mirrors have to be shortened to simultaneously achieve a large numerical aperture and reduced aberration. Such ultracompact KB (ucKB) mirrors are examined using a simulation that combines ray tracing and wave propagation. The focus intensity distributions show that ucKB mirrors suppress the aberration produced by their rotation errors and that they robustly achieve diffraction-limited focusing. The simulation results are confirmed in a synchrotron radiation experiment. ucKB mirrors can be advantageous for soft-X-ray nanoprobes, which require focusing devices to achieve a large numerical aperture.

Sub-nanometer scale depth patterning on sapphire crystal by femtosecond soft x-ray laser pulse irradiation

Damage thresholds and structures on a metal aluminum and an aluminum oxide crystal induced by the soft x-ray free electron laser irradiations were evaluated. Distinctive differences in damage thresholds and structures were observed for these materials. On the aluminum oxide crystal surface, in particular, a novel, to the best of our knowledge, surface processing, which we suggest defining as "peeling," was recognized. Surface structures formed by peeling had extremely shallow patterning of sub-nanometer depth. For the newly observed peeling process, we proposed a scission of chemical bond, i.e., binding energy model, in the crystal.

Soft X-ray ptychography system using a Wolter mirror for achromatic illumination optics

A soft X-ray ptychography system using a Wolter mirror for the illumination optics has been developed. By taking advantage of the achromaticity of the optics, the system is capable of seamlessly imaging at half-period resolution of 50 nm with a broad photon-energy range from 250 eV to 2 keV while maintaining the focal position. Imaging a mammalian cell at various wavelengths was demonstrated, and high-resolution visualization of organelle was achieved. Stereo imaging was also performed with a long working distance of 20 mm. In combination with in-situ/operando and tomographic measurements, this system will be a powerful tool for observing biological and material targets with complex features.

Fabrication of soft x-ray monolithic Wolter mirror based on surface scanning measurement using touch probe

The monolithic Wolter mirror is an ideal optical device for focusing soft x rays to a submicron-sized spot, with the advantages of high efficiency, large acceptance, achromaticity, and robustness to alignment error. The fabrication process for this type of mirror has not been established because of the difficulty in highly accurate figure measurement of free-form surfaces with small radii of curvature and steep profiles. In this study, we employed tactile scanning measurement for surface characterization to fabricate a high-precision Wolter mirror. First, it was demonstrated that the touch probe measurement did not leave scratches on the raw surface of the mirror substrate. Next, the measurement capability of the surface profiler was assessed, and the data analysis conditions were determined. Finally, the Wolter mirror was fabricated through repeated figure correction based on the tactile measurement, and the figure error of the final surface was evaluated. Wave-optical simulations that used this error as reference suggested that the size of the beam focused by the mirror was equivalent to the theoretical value at 1000 eV. The reflected image with uniform intensity distribution obtained at SPring-8 also revealed the effectiveness of the present fabrication approach based on tactile measurement.

Copper electroforming replication process for soft x-ray mirrors

We developed a copper electroforming replication (CER) process to fabricate precise ellipsoidal mirrors for soft x-ray focusing. Some applications of ellipsoidal mirrors in x-ray microscopy require that all components that are close to samples, including the mirrors, are made of non-magnetic materials. In this study, a non-magnetic copper ellipsoidal mirror was fabricated by replicating a figured and super-polished quartz glass mandrel using an electroforming technique. It was found that the CER process has a high replication accuracy of 8 nm. The focusing performance of the mirror was characterized using a soft x-ray free-electron laser with a photon energy of 100 eV. A small focus size of 370 × 400 nm² was achieved with a high reflectivity of 65%.

Independent contribution of optical attenuation length in ultrafast laser-induced structural change

Although laser irradiation with femtosecond pulses is known to generate crystallization and morphological changes, the contribution of optical parameters to material changes is still in discussion. Here, we compare two structures irradiated near Si-L2,3 edges by an extreme ultraviolet femtosecond pulse. Our result implies that, despite the femtosecond irradiation regime, these values of the optical attenuation length between the wavelengths of 10.3-nm and 13.5-nm differ by one order of magnitude. From the structural comparison, the original crystalline state was maintained upon irradiation at 13.5-nm, on the other hand, transition to an amorphous state occurred at 10.3-nm. The difference in optical attenuation length directly influence to the decision of material crystallization or morphological changes, even if the irradiation condition is under the femtosecond regime and same pulse duration. Our result reveals the contribution of optical attenuation length in ultrafast laser-induced structural change.

Metrology of a Focusing Capillary Using Optical Ptychography

The focusing property of an ellipsoidal monocapillary has been characterized using the ptychography method with a 405 nm laser beam. The recovered wavefront gives a 12.5×10.4μm2 focus. The reconstructed phase profile of the focused beam can be used to estimate the height error of the capillary surface. The obtained height error shows a Gaussian distribution with a standard deviation of 1.3 μm. This approach can be used as a quantitative tool for evaluating the inner functional surfaces of reflective optics, complementary to conventional metrology methods.

High accuracy cross-sectional shape analysis by coherent soft x-ray diffraction

When the scatterer size is less than 100 wavelengths, the effect of diffraction is large. The analysis of diffraction is important for 3D shape measurement. However, in soft x rays, shapes suitable for rigorous diffraction analysis have been limited to ellipses and periodic structures. We have developed a method to expand this to any shape (isolated triangle, rectangle, etc.). Experimentally, we measured the respective widths of the cross section of a column consisting of two layers and showed that the resolution was at least a few wavelengths. For this purpose, we have also developed a fast simulation method with a small memory size.

Full-field microscope with twin Wolter mirrors for soft X-ray free-electron lasers

We developed a full-field microscope with twin Wolter mirrors for soft X-ray free-electron lasers. The Wolter mirrors for a condenser and an objective were fabricated using an electroforming process with a precisely figured master mandrel. In the imaging system constructed at SACLA BL1, sub-micrometer spatial resolution was achieved at wavelengths of 10.3 and 3.4 nm. Single-shot bright-field images were acquired with a maximum illumination intensity of 7×10¹⁴ W/cm².