1
|
Audinot JN, Philipp P, De Castro O, Biesemeier A, Hoang QH, Wirtz T. Highest resolution chemical imaging based on secondary ion mass spectrometry performed on the helium ion microscope. REPORTS ON PROGRESS IN PHYSICS. PHYSICAL SOCIETY (GREAT BRITAIN) 2021; 84:105901. [PMID: 34404033 DOI: 10.1088/1361-6633/ac1e32] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/08/2020] [Accepted: 08/17/2021] [Indexed: 06/13/2023]
Abstract
This paper is a review on the combination between Helium Ion Microscopy (HIM) and Secondary Ion Mass Spectrometry (SIMS), which is a recently developed technique that is of particular relevance in the context of the quest for high-resolution high-sensitivity nano-analytical solutions. We start by giving an overview on the HIM-SIMS concept and the underlying fundamental principles of both HIM and SIMS. We then present and discuss instrumental aspects of the HIM and SIMS techniques, highlighting the advantage of the integrated HIM-SIMS instrument. We give an overview on the performance characteristics of the HIM-SIMS technique, which is capable of producing elemental SIMS maps with lateral resolution below 20 nm, approaching the physical resolution limits, while maintaining a sub-nanometric resolution in the secondary electron microscopy mode. In addition, we showcase different strategies and methods allowing to take profit of both capabilities of the HIM-SIMS instrument (high-resolution imaging using secondary electrons and mass filtered secondary sons) in a correlative approach. Since its development HIM-SIMS has been successfully applied to a large variety of scientific and technological topics. Here, we will present and summarise recent applications of nanoscale imaging in materials research, life sciences and geology.
Collapse
Affiliation(s)
- Jean-Nicolas Audinot
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Patrick Philipp
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Olivier De Castro
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Antje Biesemeier
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Quang Hung Hoang
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Tom Wirtz
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| |
Collapse
|
2
|
Bastos CAP, Thom WD, Reilly B, Batalha IL, Burge Rogers ML, McCrone IS, Faria N, Powell JJ. Robust rapid-setting antibacterial liquid bandages. Sci Rep 2020; 10:15067. [PMID: 32934279 PMCID: PMC7492242 DOI: 10.1038/s41598-020-71586-7] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/25/2020] [Accepted: 08/12/2020] [Indexed: 11/09/2022] Open
Abstract
Bandaging is a steadfast but time-consuming component of wound care with limited technical advancements to date. Bandages must be changed and infection risk managed. Rapid-set liquid bandages are efficient alternatives but lack durability or inherent infection control. We show here that antibacterial zinc (Zn) and copper (Cu) species greatly enhance the barrier properties of the natural, waterproof, bio-adhesive polymer, shellac. The material demonstrated marked antibacterial contact properties and, in ex-vivo studies, effectively locked-in pre-applied therapeutics. When challenged in vivo with the polybacterial bovine wound infection 'digital dermatitis', Zn/Cu-shellac adhered rapidly and robustly over pre-applied antibiotic. The bandage self-degraded, appropriately, over 7 days despite extreme conditions (faecal slurry). Treatment was well-tolerated and clinical improvement was observed in animal mobility. This new class of bandage has promise for challenging topical situations in humans and other animals, especially away from controlled, sterile clinical settings where wounds urgently require protection from environmental and bacterial contamination.
Collapse
Affiliation(s)
- Carlos A P Bastos
- Department of Veterinary Medicine, University of Cambridge, Madingley Road, Cambridge, CB3 0ES, UK.
| | - William D Thom
- Department of Veterinary Medicine, University of Cambridge, Madingley Road, Cambridge, CB3 0ES, UK
| | - Beth Reilly
- Department of Veterinary Medicine, University of Cambridge, Madingley Road, Cambridge, CB3 0ES, UK
| | - Iris L Batalha
- Department of Engineering, Nanoscience Centre, 11 J. J. Thomson Avenue, Cambridge, CB3 0FF, UK
| | - Maedee L Burge Rogers
- Department of Veterinary Medicine, University of Cambridge, Madingley Road, Cambridge, CB3 0ES, UK
| | - Ian S McCrone
- Department of Veterinary Medicine, University of Cambridge, Madingley Road, Cambridge, CB3 0ES, UK
| | - Nuno Faria
- Department of Veterinary Medicine, University of Cambridge, Madingley Road, Cambridge, CB3 0ES, UK
| | - Jonathan J Powell
- Department of Veterinary Medicine, University of Cambridge, Madingley Road, Cambridge, CB3 0ES, UK.
| |
Collapse
|
3
|
Wirtz T, De Castro O, Audinot JN, Philipp P. Imaging and Analytics on the Helium Ion Microscope. ANNUAL REVIEW OF ANALYTICAL CHEMISTRY (PALO ALTO, CALIF.) 2019; 12:523-543. [PMID: 30699036 DOI: 10.1146/annurev-anchem-061318-115457] [Citation(s) in RCA: 34] [Impact Index Per Article: 6.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
The helium ion microscope (HIM) has emerged as an instrument of choice for patterning, imaging and, more recently, analytics at the nanoscale. Here, we review secondary electron imaging on the HIM and the various methodologies and hardware components that have been developed to confer analytical capabilities to the HIM. Secondary electron-based imaging can be performed at resolutions down to 0.5 nm with high contrast, with high depth of field, and directly on insulating samples. Analytical methods include secondary electron hyperspectral imaging (SEHI), scanning transmission ion microscopy (STIM), backscattering spectrometry and, in particular, secondary ion mass spectrometry (SIMS). The SIMS system that was specifically designed for the HIM allows the detection of all elements, the differentiation between isotopes, and the detection of trace elements. It provides mass spectra, depth profiles, and 2D or 3D images with lateral resolutions down to 10 nm.
Collapse
Affiliation(s)
- Tom Wirtz
- Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), L-4422 Belvaux, Luxembourg;
| | - Olivier De Castro
- Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), L-4422 Belvaux, Luxembourg;
| | - Jean-Nicolas Audinot
- Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), L-4422 Belvaux, Luxembourg;
| | - Patrick Philipp
- Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), L-4422 Belvaux, Luxembourg;
| |
Collapse
|
4
|
Xia D, McVey S, Huynh C, Kuehn W. Defect Localization and Nanofabrication for Conductive Structures with Voltage Contrast in Helium Ion Microscopy. ACS APPLIED MATERIALS & INTERFACES 2019; 11:5509-5516. [PMID: 30644713 DOI: 10.1021/acsami.8b18083] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
As the dimensions of feature sizes in electronic devices decrease to nanoscale, an easy method for failure analysis and evaluation of processing steps is required. Gallium-focused ion beam (Ga-FIB) or scanning electron microscope is an efficient approach to detect voltage contrast for addressing failure analysis in semiconductor devices and processing. However, Ga-FIB may cause damage or implantation to the surface of the analyzed area, and its resolution is low. Helium ion microscopy (HIM) uses a light ion beam (helium or neon) for imaging and fabrication at nanoscale. With passive voltage contrast (PVC) in HIM images, the defect localization for failure of conductive structures can be rapidly and easily detected with a sufficient voltage contrast. Furthermore, a defect gap as narrow as sub-10 nm can be investigated with HIM imaging. PVC with HIM is an efficient method for defect localization at nanoscale with a minimal damage to the analyzed area. For circuit edit and failure analysis, it may be necessary to intentionally cut the conductive connection. In this circumstance, final results can be easily verified using PVC imaging with HIM. With XeF2 gas assistance, both helium and neon ion beams can be used to perform nanofabrication for metal disconnection. XeF2 gas plays an important role in preventing deposition of conductive materials on etching region and enhancing material removal rates to achieve electrically isolated structures. The etching rate with a neon ion beam is much faster than that of a helium ion beam. PVC in HIM images with controllable operation and dimensions using a helium ion beam with XeF2 gas assistance could also be used to localize a hidden defect for a single-location-defect situation. With neon ion beam irradiation on a defective location, PVC can be used to find the defect locations in the case of a series of defects.
Collapse
Affiliation(s)
- Deying Xia
- Carl Zeiss SMT Inc, PCS Integration Center , One Corporation Way , Peabody , Massachusetts 01960 , United States
| | - Shawn McVey
- Carl Zeiss SMT Inc, PCS Integration Center , One Corporation Way , Peabody , Massachusetts 01960 , United States
| | - Chuong Huynh
- Carl Zeiss SMT Inc, PCS Integration Center , One Corporation Way , Peabody , Massachusetts 01960 , United States
| | - Wilhelm Kuehn
- Carl Zeiss SMT Inc, PCS Integration Center , One Corporation Way , Peabody , Massachusetts 01960 , United States
| |
Collapse
|
5
|
Pöpsel C, Becker J, Jeon N, Döblinger M, Stettner T, Gottschalk YT, Loitsch B, Matich S, Altzschner M, Holleitner AW, Finley JJ, Lauhon LJ, Koblmüller G. He-Ion Microscopy as a High-Resolution Probe for Complex Quantum Heterostructures in Core-Shell Nanowires. NANO LETTERS 2018; 18:3911-3919. [PMID: 29781624 DOI: 10.1021/acs.nanolett.8b01282] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Core-shell semiconductor nanowires (NW) with internal quantum heterostructures are amongst the most complex nanostructured materials to be explored for assessing the ultimate capabilities of diverse ultrahigh-resolution imaging techniques. To probe the structure and composition of these materials in their native environment with minimal damage and sample preparation calls for high-resolution electron or ion microscopy methods, which have not yet been tested on such classes of ultrasmall quantum nanostructures. Here, we demonstrate that scanning helium ion microscopy (SHeIM) provides a powerful and straightforward method to map quantum heterostructures embedded in complex III-V semiconductor NWs with unique material contrast at ∼1 nm resolution. By probing the cross sections of GaAs-Al(Ga)As core-shell NWs with coaxial GaAs quantum wells as well as short-period GaAs/AlAs superlattice (SL) structures in the shell, the Al-rich and Ga-rich layers are accurately discriminated by their image contrast in excellent agreement with correlated, yet destructive, scanning transmission electron microscopy and atom probe tomography analysis. Most interestingly, quantitative He-ion dose-dependent SHeIM analysis of the ternary AlGaAs shell layers and of compositionally nonuniform GaAs/AlAs SLs reveals distinct alloy composition fluctuations in the form of Al-rich clusters with size distributions between ∼1-10 nm. In the GaAs/AlAs SLs the alloy clustering vanishes with increasing SL-period (>5 nm-GaAs/4 nm-AlAs), providing insights into critical size dimensions for atomic intermixing effects in short-period SLs within a NW geometry. The straightforward SHeIM technique therefore provides unique benefits in imaging the tiniest nanoscale features in topography, structure and composition of a multitude of diverse complex semiconductor nanostructures.
Collapse
Affiliation(s)
- Christian Pöpsel
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| | - Jonathan Becker
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| | - Nari Jeon
- Department of Materials Science & Engineering , Northwestern University , Evanston , Illinois 60208 , United States
| | - Markus Döblinger
- Department of Chemistry , Ludwig-Maximilian-Universität München , Butenandtstraße 5-13 , München , 81377 , Germany
| | - Thomas Stettner
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| | - Yeanitza Trujillo Gottschalk
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| | - Bernhard Loitsch
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| | - Sonja Matich
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| | - Marcus Altzschner
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| | - Alexander W Holleitner
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| | - Jonathan J Finley
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| | - Lincoln J Lauhon
- Department of Materials Science & Engineering , Northwestern University , Evanston , Illinois 60208 , United States
| | - Gregor Koblmüller
- Walter Schottky Institut, Physik Department, and Center for Nanotechnology and Nanomaterials , Technische Universität München , Am Coulombwall 4 , Garching , 85748 , Germany
| |
Collapse
|
6
|
Walther T, Jones L. Preface to special issue on Microscopy of Semiconducting Materials 2017 (MSM-XX). J Microsc 2017; 268:221-224. [PMID: 29154503 DOI: 10.1111/jmi.12665] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Thomas Walther
- Dept. Electronic & Electrical Engineering, University of Sheffield
| | - Lewys Jones
- Department of Materials, University of Oxford
| |
Collapse
|