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Feng X, Lin R, Yang S, Xu Y, Zhang T, Chen S, Ji Y, Wang Z, Chen S, Zhu C, Gao Z, Zhao YS. Spatially Resolved Organic Whispering-Gallery-Mode Hetero-Microrings for High-Security Photonic Barcodes. Angew Chem Int Ed Engl 2023; 62:e202310263. [PMID: 37604784 DOI: 10.1002/anie.202310263] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/19/2023] [Revised: 08/14/2023] [Accepted: 08/21/2023] [Indexed: 08/23/2023]
Abstract
Whispering-gallery-mode (WGM) microcavities featuring distinguishable sharp peaks in a broadband exhibit enormous advantages in the field of miniaturized photonic barcodes. However, such kind of barcodes developed hitherto are primarily based on microcavities wherein multiple gain medias were blended into a single matrix, thus resulting in the limited and indistinguishable coding elements. Here, a surface tension assisted heterogeneous assembly strategy is proposed to construct the spatially resolved WGM hetero-microrings with multiple spatial colors along its circular direction. Through precisely regulating the charge-transfer (CT) strength, full-color microrings covering the entire visible range were effectively acquired, which exhibit a series of sharp and recognizable peaks and allow for the effective construction of high-quality photonic barcodes. Notably, the spatially resolved WGM hetero-microrings with multiple coding elements were finally acquired through heterogeneous nucleation and growth controlled by the directional diffusion between the hetero-emulsion droplets, thus remarkably promoting the security strength and coding capacity of the barcodes. The results would be useful to fabricate new types of organic hierarchical hybrid WGM heterostructures for optical information recording and security labels.
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Affiliation(s)
- Xingwei Feng
- School of Materials Science & Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, Shandong Province, China
| | - Ru Lin
- School of Materials Science & Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, Shandong Province, China
| | - Shuo Yang
- School of Materials Science & Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, Shandong Province, China
| | - Yuyu Xu
- School of Materials Science & Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, Shandong Province, China
| | - Tongjin Zhang
- Key Laboratory of photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
| | - Shunwei Chen
- School of Materials Science & Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, Shandong Province, China
| | - Yingke Ji
- Key Laboratory of Light Field Manipulation and Information Acquisition, Ministry of Industry and Information Technology, and Shanxi Key Laboratory of Optical Information Technology, School of Physical Science and Technology, Northwestern Polytechnical University, Xi'an, 710129, China
| | - Zifei Wang
- School of Materials Science & Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, Shandong Province, China
| | - Shiwei Chen
- School of Materials Science & Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, Shandong Province, China
| | - Chaofeng Zhu
- School of Materials Science & Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, Shandong Province, China
| | - Zhenhua Gao
- School of Materials Science & Engineering, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250353, Shandong Province, China
| | - Yong Sheng Zhao
- Key Laboratory of photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing, 100190, China
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Takiguchi M, Zhang G, Sasaki S, Tateno K, John C, Ono M, Sumikura H, Shinya A, Notomi M. Damage protection from focused ion beam process toward nanocavity-implemented compound semiconductor nanowire lasers. NANOTECHNOLOGY 2023; 34:135301. [PMID: 36608329 DOI: 10.1088/1361-6528/acb0d5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/02/2022] [Accepted: 01/06/2023] [Indexed: 06/17/2023]
Abstract
A focused ion beam (FIB) can precisely mill samples and freely form any nanostructure even on surfaces with curvature, like a nanowire surface, which are difficult to implement by using conventional fabrication techniques, e.g. electron beam lithography. Thus, this tool is promising for nanofabrication; however, fabrication damage and contamination are critical issues, which deteriorate optical properties. In this work, we investigated the protective performance of Al2O3against the FIB process (especially by a gallium ion). Nanowires were coated with Al2O3as a hard mask to protect them from damage during FIB nanofabrication. To estimate the protective performance, their emission properties by photoluminescence measurement and time-resolved spectroscopy were compared with and without Al2O3coating conditions. From the results, we confirmed that the Al2O3coating protects the nanowires. In addition, the nanowires also showed lasing behavior even after FIB processing had been carried out to implement nanostructures. This indicates that their optical properties are well maintained. Thus, our study proves the usefulness of FIBs for future nanofabrication.
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Affiliation(s)
- Masato Takiguchi
- Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
- NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Guoqiang Zhang
- Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
- NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Satoshi Sasaki
- NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Kouta Tateno
- Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
- NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Caleb John
- NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Masaaki Ono
- Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
- NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Hisashi Sumikura
- Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
- NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Akihiko Shinya
- Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
- NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
| | - Masaya Notomi
- Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
- NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
- Department of Physics, Tokyo Institute of Technology, 2-12-1-H55 Ookayama, Meguro, Tokyo 152-8550, Japan
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